Development of electromagnetic lenses for multielectron beam lithography system

High-throughput electron-beam (EB) lithography systems require high current. However, beam blur increases because of the individual Coulomb interaction among the electron beams. Isolating the electron beam into 4–16 perfectly independent beamlets is effective. As for the electromagnetic lens, many o...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2002-11, Vol.20 (6), p.2726-2729
Hauptverfasser: Haraguchi, T., Sakazaki, T., Hamaguchi, S., Yasuda, H.
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 2729
container_issue 6
container_start_page 2726
container_title Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
container_volume 20
creator Haraguchi, T.
Sakazaki, T.
Hamaguchi, S.
Yasuda, H.
description High-throughput electron-beam (EB) lithography systems require high current. However, beam blur increases because of the individual Coulomb interaction among the electron beams. Isolating the electron beam into 4–16 perfectly independent beamlets is effective. As for the electromagnetic lens, many openings in the parallel flat plates can form the compound eye lens. This lens is called the lotus root lens (LRL). Simulations and experiments with the LRL were carried out. In the case of LRL of 4×4 openings with a 22 mm pitch, the uniformity of magnetic field along the axis was within 0.2%. The basic lens function between two openings separated by 44 mm in the LRL with 21 openings in the conventional column qualitatively evaluated. The LRL should be a potential platform for a multicolumn cell system that provides a multibeam direct-writing system that utilizes variable-shaped beam or character projection as unit-column optics.
doi_str_mv 10.1116/1.1524981
format Article
fullrecord <record><control><sourceid>scitation_cross</sourceid><recordid>TN_cdi_crossref_primary_10_1116_1_1524981</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>scitation_primary_10_1116_1_1524981</sourcerecordid><originalsourceid>FETCH-LOGICAL-c326t-f7323cb353f94682cd7b793bbd36d6ffb25fb80f12f0683e6b49c0ad8f41013f3</originalsourceid><addsrcrecordid>eNp90MFLwzAUBvAgCtbpwf8gV4XOvKRN26NMp8JgFwVvJUnztkrblCQO9t87WdGD4Ol98H58h4-Qa2BzAJB3MIecZ1UJJyQ5JJaWuSxOScIKkaUc4P2cXITwwRiTuRAJWT_Yne3c2NshUofUdtZE73q1GWxsDe3sEGyg6DztP7vYTv-Baqt62rVx6zZejds9DfsQbX9JzlB1wV5Nd0belo-vi-d0tX56WdyvUiO4jCkWggujRS6wymTJTVPoohJaN0I2ElHzHHXJEDgyWQordVYZppoSM2AgUMzIzbHXeBeCt1iPvu2V39fA6u8laqinJQ729miDaaOKrRt-8M75X1iPDf6H_zZ_AXwGblw</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Development of electromagnetic lenses for multielectron beam lithography system</title><source>AIP Journals Complete</source><creator>Haraguchi, T. ; Sakazaki, T. ; Hamaguchi, S. ; Yasuda, H.</creator><creatorcontrib>Haraguchi, T. ; Sakazaki, T. ; Hamaguchi, S. ; Yasuda, H.</creatorcontrib><description>High-throughput electron-beam (EB) lithography systems require high current. However, beam blur increases because of the individual Coulomb interaction among the electron beams. Isolating the electron beam into 4–16 perfectly independent beamlets is effective. As for the electromagnetic lens, many openings in the parallel flat plates can form the compound eye lens. This lens is called the lotus root lens (LRL). Simulations and experiments with the LRL were carried out. In the case of LRL of 4×4 openings with a 22 mm pitch, the uniformity of magnetic field along the axis was within 0.2%. The basic lens function between two openings separated by 44 mm in the LRL with 21 openings in the conventional column qualitatively evaluated. The LRL should be a potential platform for a multicolumn cell system that provides a multibeam direct-writing system that utilizes variable-shaped beam or character projection as unit-column optics.</description><identifier>ISSN: 0734-211X</identifier><identifier>ISSN: 1071-1023</identifier><identifier>EISSN: 1520-8567</identifier><identifier>DOI: 10.1116/1.1524981</identifier><identifier>CODEN: JVTBD9</identifier><language>eng</language><ispartof>Journal of Vacuum Science &amp; Technology B: Microelectronics and Nanometer Structures, 2002-11, Vol.20 (6), p.2726-2729</ispartof><rights>American Vacuum Society</rights><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c326t-f7323cb353f94682cd7b793bbd36d6ffb25fb80f12f0683e6b49c0ad8f41013f3</citedby><cites>FETCH-LOGICAL-c326t-f7323cb353f94682cd7b793bbd36d6ffb25fb80f12f0683e6b49c0ad8f41013f3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>309,310,314,780,784,789,790,794,4512,23930,23931,25140,27924,27925</link.rule.ids></links><search><creatorcontrib>Haraguchi, T.</creatorcontrib><creatorcontrib>Sakazaki, T.</creatorcontrib><creatorcontrib>Hamaguchi, S.</creatorcontrib><creatorcontrib>Yasuda, H.</creatorcontrib><title>Development of electromagnetic lenses for multielectron beam lithography system</title><title>Journal of Vacuum Science &amp; Technology B: Microelectronics and Nanometer Structures</title><description>High-throughput electron-beam (EB) lithography systems require high current. However, beam blur increases because of the individual Coulomb interaction among the electron beams. Isolating the electron beam into 4–16 perfectly independent beamlets is effective. As for the electromagnetic lens, many openings in the parallel flat plates can form the compound eye lens. This lens is called the lotus root lens (LRL). Simulations and experiments with the LRL were carried out. In the case of LRL of 4×4 openings with a 22 mm pitch, the uniformity of magnetic field along the axis was within 0.2%. The basic lens function between two openings separated by 44 mm in the LRL with 21 openings in the conventional column qualitatively evaluated. The LRL should be a potential platform for a multicolumn cell system that provides a multibeam direct-writing system that utilizes variable-shaped beam or character projection as unit-column optics.</description><issn>0734-211X</issn><issn>1071-1023</issn><issn>1520-8567</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2002</creationdate><recordtype>article</recordtype><recordid>eNp90MFLwzAUBvAgCtbpwf8gV4XOvKRN26NMp8JgFwVvJUnztkrblCQO9t87WdGD4Ol98H58h4-Qa2BzAJB3MIecZ1UJJyQ5JJaWuSxOScIKkaUc4P2cXITwwRiTuRAJWT_Yne3c2NshUofUdtZE73q1GWxsDe3sEGyg6DztP7vYTv-Baqt62rVx6zZejds9DfsQbX9JzlB1wV5Nd0belo-vi-d0tX56WdyvUiO4jCkWggujRS6wymTJTVPoohJaN0I2ElHzHHXJEDgyWQordVYZppoSM2AgUMzIzbHXeBeCt1iPvu2V39fA6u8laqinJQ729miDaaOKrRt-8M75X1iPDf6H_zZ_AXwGblw</recordid><startdate>20021101</startdate><enddate>20021101</enddate><creator>Haraguchi, T.</creator><creator>Sakazaki, T.</creator><creator>Hamaguchi, S.</creator><creator>Yasuda, H.</creator><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20021101</creationdate><title>Development of electromagnetic lenses for multielectron beam lithography system</title><author>Haraguchi, T. ; Sakazaki, T. ; Hamaguchi, S. ; Yasuda, H.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c326t-f7323cb353f94682cd7b793bbd36d6ffb25fb80f12f0683e6b49c0ad8f41013f3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2002</creationdate><toplevel>online_resources</toplevel><creatorcontrib>Haraguchi, T.</creatorcontrib><creatorcontrib>Sakazaki, T.</creatorcontrib><creatorcontrib>Hamaguchi, S.</creatorcontrib><creatorcontrib>Yasuda, H.</creatorcontrib><collection>CrossRef</collection><jtitle>Journal of Vacuum Science &amp; Technology B: Microelectronics and Nanometer Structures</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Haraguchi, T.</au><au>Sakazaki, T.</au><au>Hamaguchi, S.</au><au>Yasuda, H.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Development of electromagnetic lenses for multielectron beam lithography system</atitle><jtitle>Journal of Vacuum Science &amp; Technology B: Microelectronics and Nanometer Structures</jtitle><date>2002-11-01</date><risdate>2002</risdate><volume>20</volume><issue>6</issue><spage>2726</spage><epage>2729</epage><pages>2726-2729</pages><issn>0734-211X</issn><issn>1071-1023</issn><eissn>1520-8567</eissn><coden>JVTBD9</coden><abstract>High-throughput electron-beam (EB) lithography systems require high current. However, beam blur increases because of the individual Coulomb interaction among the electron beams. Isolating the electron beam into 4–16 perfectly independent beamlets is effective. As for the electromagnetic lens, many openings in the parallel flat plates can form the compound eye lens. This lens is called the lotus root lens (LRL). Simulations and experiments with the LRL were carried out. In the case of LRL of 4×4 openings with a 22 mm pitch, the uniformity of magnetic field along the axis was within 0.2%. The basic lens function between two openings separated by 44 mm in the LRL with 21 openings in the conventional column qualitatively evaluated. The LRL should be a potential platform for a multicolumn cell system that provides a multibeam direct-writing system that utilizes variable-shaped beam or character projection as unit-column optics.</abstract><doi>10.1116/1.1524981</doi><tpages>4</tpages></addata></record>
fulltext fulltext
identifier ISSN: 0734-211X
ispartof Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2002-11, Vol.20 (6), p.2726-2729
issn 0734-211X
1071-1023
1520-8567
language eng
recordid cdi_crossref_primary_10_1116_1_1524981
source AIP Journals Complete
title Development of electromagnetic lenses for multielectron beam lithography system
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-25T11%3A39%3A42IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-scitation_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Development%20of%20electromagnetic%20lenses%20for%20multielectron%20beam%20lithography%20system&rft.jtitle=Journal%20of%20Vacuum%20Science%20&%20Technology%20B:%20Microelectronics%20and%20Nanometer%20Structures&rft.au=Haraguchi,%20T.&rft.date=2002-11-01&rft.volume=20&rft.issue=6&rft.spage=2726&rft.epage=2729&rft.pages=2726-2729&rft.issn=0734-211X&rft.eissn=1520-8567&rft.coden=JVTBD9&rft_id=info:doi/10.1116/1.1524981&rft_dat=%3Cscitation_cross%3Escitation_primary_10_1116_1_1524981%3C/scitation_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true