Optimization of Ti 2 O 3 thin films by magnetron sputtering and study of their photoelectric performance
In this study, Ti 2 O 3 thin films were successfully produced using magnetron sputtering. Through orthogonal gradient experiments, the impact of substrate temperature, sputtering vacuum, RF power, and sputtering duration on surface morphology, roughness, physical structure, and resistivity was inves...
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Veröffentlicht in: | International journal of applied ceramic technology 2025-01, Vol.22 (1) |
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Hauptverfasser: | , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
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