Variation
Variation afflicts the design, manufacture, and operation of integrated circuits. Techniques and tools are needed in three areas to address variation: statistical metrology, advanced process control, and design for manufacturability. First, statistical metrology seeks to characterize and model varia...
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| Veröffentlicht in: | IEEE transactions on semiconductor manufacturing 2008-02, Vol.21 (1), p.63-71 |
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| container_title | IEEE transactions on semiconductor manufacturing |
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| creator | Boning, D.S. Balakrishnan, K. Hong Cai Drego, N. Farahanchi, A. Gettings, K.M. Lim Daihyun Somani, A. Taylor, H. Truque, D. Xie Xiaolin |
| description | Variation afflicts the design, manufacture, and operation of integrated circuits. Techniques and tools are needed in three areas to address variation: statistical metrology, advanced process control, and design for manufacturability. First, statistical metrology seeks to characterize and model variations and their sources. Advanced metrology helps to understand geometric and material property variations, while variation test structures and test circuits enable study of the impact of specific or aggregate variations on performance. Second, advanced process control attempts to reduce process variation through sensing and feedback/feedforward control during fabrication. Third, design for manufacturability (DFM) seeks methods to improve performance and yield given process and environmental variation, through robust design, increased regularity, and other approaches. Finally, linkages between these areas, particularly between statistical metrology and DFM, will be important and empowering. |
| doi_str_mv | 10.1109/TSM.2007.913194 |
| format | Article |
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Techniques and tools are needed in three areas to address variation: statistical metrology, advanced process control, and design for manufacturability. First, statistical metrology seeks to characterize and model variations and their sources. Advanced metrology helps to understand geometric and material property variations, while variation test structures and test circuits enable study of the impact of specific or aggregate variations on performance. Second, advanced process control attempts to reduce process variation through sensing and feedback/feedforward control during fabrication. Third, design for manufacturability (DFM) seeks methods to improve performance and yield given process and environmental variation, through robust design, increased regularity, and other approaches. Finally, linkages between these areas, particularly between statistical metrology and DFM, will be important and empowering.</description><identifier>ISSN: 0894-6507</identifier><identifier>EISSN: 1558-2345</identifier><identifier>DOI: 10.1109/TSM.2007.913194</identifier><identifier>CODEN: ITSMED</identifier><language>eng</language><publisher>New York, NY: IEEE</publisher><subject>Aggregates ; Applied sciences ; Circuit testing ; Circuits ; Control systems ; Design for manufacturability ; Design for manufacturability (DFM) ; Design for manufacture ; Design. Technologies. Operation analysis. Testing ; Electronics ; Exact sciences and technology ; Integrated circuit manufacture ; Integrated circuits ; Manufacturing processes ; Material properties ; Materials ; Materials testing ; Metrology ; Process control ; Process design ; Regularity ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices ; Semiconductors ; statistical process control ; Testing, measurement, noise and reliability ; variation ; yield</subject><ispartof>IEEE transactions on semiconductor manufacturing, 2008-02, Vol.21 (1), p.63-71</ispartof><rights>2008 INIST-CNRS</rights><rights>Copyright The Institute of Electrical and Electronics Engineers, Inc. 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Techniques and tools are needed in three areas to address variation: statistical metrology, advanced process control, and design for manufacturability. First, statistical metrology seeks to characterize and model variations and their sources. Advanced metrology helps to understand geometric and material property variations, while variation test structures and test circuits enable study of the impact of specific or aggregate variations on performance. Second, advanced process control attempts to reduce process variation through sensing and feedback/feedforward control during fabrication. Third, design for manufacturability (DFM) seeks methods to improve performance and yield given process and environmental variation, through robust design, increased regularity, and other approaches. Finally, linkages between these areas, particularly between statistical metrology and DFM, will be important and empowering.</description><subject>Aggregates</subject><subject>Applied sciences</subject><subject>Circuit testing</subject><subject>Circuits</subject><subject>Control systems</subject><subject>Design for manufacturability</subject><subject>Design for manufacturability (DFM)</subject><subject>Design for manufacture</subject><subject>Design. Technologies. Operation analysis. Testing</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>Integrated circuit manufacture</subject><subject>Integrated circuits</subject><subject>Manufacturing processes</subject><subject>Material properties</subject><subject>Materials</subject><subject>Materials testing</subject><subject>Metrology</subject><subject>Process control</subject><subject>Process design</subject><subject>Regularity</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><subject>Semiconductors</subject><subject>statistical process control</subject><subject>Testing, measurement, noise and reliability</subject><subject>variation</subject><subject>yield</subject><issn>0894-6507</issn><issn>1558-2345</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2008</creationdate><recordtype>article</recordtype><sourceid>RIE</sourceid><recordid>eNqF0D1PwzAQBmALgUQozAxsSMCU1s6dv0ZU8SUVMVBYLcdxpFRpUux24N_jKFUHBpg83HOvzi8hl4xOGaN6tnx_nRaUyqlmwDQekYxxrvICkB-TjCqNueBUnpKzGFeUMkQtM5J92tDYbdN35-Sktm30F_t3Qj4eH5bz53zx9vQyv1_kDhlsc68LpIXggiEXUHrLKwfcg6rBagRRCO9Qg6scirIGdApdVdnKg_W-LBEm5G7M3YT-a-fj1qyb6Hzb2s73u2g0hXQnl_RfqWRyirNB3v4pAVFyoWSC17_gqt-FLv3XaFYUUik6pM1G5EIfY_C12YRmbcO3YdQMXZvUtRm6NmPXaeNmH2ujs20dbOeaeFhLlEumRHJXo2u894cxpusKLeEHTCmDxQ</recordid><startdate>20080201</startdate><enddate>20080201</enddate><creator>Boning, D.S.</creator><creator>Balakrishnan, K.</creator><creator>Hong Cai</creator><creator>Drego, N.</creator><creator>Farahanchi, A.</creator><creator>Gettings, K.M.</creator><creator>Lim Daihyun</creator><creator>Somani, A.</creator><creator>Taylor, H.</creator><creator>Truque, D.</creator><creator>Xie Xiaolin</creator><general>IEEE</general><general>Institute of Electrical and Electronics Engineers</general><general>The Institute of Electrical and Electronics Engineers, Inc. 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Technologies. Operation analysis. Testing</topic><topic>Electronics</topic><topic>Exact sciences and technology</topic><topic>Integrated circuit manufacture</topic><topic>Integrated circuits</topic><topic>Manufacturing processes</topic><topic>Material properties</topic><topic>Materials</topic><topic>Materials testing</topic><topic>Metrology</topic><topic>Process control</topic><topic>Process design</topic><topic>Regularity</topic><topic>Semiconductor electronics. Microelectronics. Optoelectronics. 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Techniques and tools are needed in three areas to address variation: statistical metrology, advanced process control, and design for manufacturability. First, statistical metrology seeks to characterize and model variations and their sources. Advanced metrology helps to understand geometric and material property variations, while variation test structures and test circuits enable study of the impact of specific or aggregate variations on performance. Second, advanced process control attempts to reduce process variation through sensing and feedback/feedforward control during fabrication. Third, design for manufacturability (DFM) seeks methods to improve performance and yield given process and environmental variation, through robust design, increased regularity, and other approaches. 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| source | IEEE Electronic Library (IEL) |
| subjects | Aggregates Applied sciences Circuit testing Circuits Control systems Design for manufacturability Design for manufacturability (DFM) Design for manufacture Design. Technologies. Operation analysis. Testing Electronics Exact sciences and technology Integrated circuit manufacture Integrated circuits Manufacturing processes Material properties Materials Materials testing Metrology Process control Process design Regularity Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Semiconductors statistical process control Testing, measurement, noise and reliability variation yield |
| title | Variation |
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