Operating Features of Assisted Hollow Electrode Discharge During Electron-Beam Evaporation of Aluminum in Oxygen in the Fore-Vacuum Pressure Range

We give the characteristics of a hollow electrode discharge in oxygen in the presence of plasma created by an electron beam in the vicinity of the hollow entrance. Electron beam evaporates aluminum, which deposits onto substrate, placed in hollow electrode. Discharge in hollow electrode produced its...

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Veröffentlicht in:	IEEE transactions on plasma science 2024-07, Vol.52 (7), p.2766-2769
Hauptverfasser:	Burdovitsin, Viktor A., Kiki, Lionel J. Ngon A, Oks, Efim M.
Format:	Artikel
Sprache:	eng
Schlagworte:	Aluminum Aluminum oxide films Discharges (electric) electron beam Electron beams hollow electrode discharge Ionization Particle beams Plasmas reactive evaporation Substrates
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