Pulsed Hollow Cathode Discharge with Nanosecond Risetime
This paper reports the operation of a cylindrical hollow cathode discharge with current risetimes of a few nanoseconds at current densities at the entrance of the cathode in the range of 50-560A · cm-2 and at voltages of 280-850 V. Time-dependent measurements of the impedance of the discharge are pr...
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| Veröffentlicht in: | IEEE Trans. Plasma Sci.; (United States) 1984-01, Vol.12 (4), p.271-274, Article 271 |
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| container_end_page | 274 |
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| container_issue | 4 |
| container_start_page | 271 |
| container_title | IEEE Trans. Plasma Sci.; (United States) |
| container_volume | 12 |
| creator | Schaefer, Gerhard Husoy, Per O. Schoenbach, Karl H. Kromphole, Hermann |
| description | This paper reports the operation of a cylindrical hollow cathode discharge with current risetimes of a few nanoseconds at current densities at the entrance of the cathode in the range of 50-560A · cm-2 and at voltages of 280-850 V. Time-dependent measurements of the impedance of the discharge are presented. They allow for the evaluation of discharge quantities such as risetime, delay time, discharge voltage, and current, depending on the operation parameters as applied voltage, pressure, and preionization. The power density in the active region of the hollow cathode exceeded 200 kW · cm-3. |
| doi_str_mv | 10.1109/TPS.1984.4316338 |
| format | Article |
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Time-dependent measurements of the impedance of the discharge are presented. They allow for the evaluation of discharge quantities such as risetime, delay time, discharge voltage, and current, depending on the operation parameters as applied voltage, pressure, and preionization. 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Plasma Sci.; (United States), 1984-01, Vol.12 (4), p.271-274, Article 271</ispartof><rights>1985 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c317t-b7c431dc3e08ccd7189ad9ac4bd4b4d339d582eff47ad344940f4b8af732877d3</citedby><cites>FETCH-LOGICAL-c317t-b7c431dc3e08ccd7189ad9ac4bd4b4d339d582eff47ad344940f4b8af732877d3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/4316338$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,780,784,796,885,27924,27925,54758</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/4316338$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=8927220$$DView record in Pascal Francis$$Hfree_for_read</backlink><backlink>$$Uhttps://www.osti.gov/biblio/5892552$$D View this record in Osti.gov$$Hfree_for_read</backlink></links><search><creatorcontrib>Schaefer, Gerhard</creatorcontrib><creatorcontrib>Husoy, Per O.</creatorcontrib><creatorcontrib>Schoenbach, Karl H.</creatorcontrib><creatorcontrib>Kromphole, Hermann</creatorcontrib><creatorcontrib>Texas Tech University, Lubbock</creatorcontrib><title>Pulsed Hollow Cathode Discharge with Nanosecond Risetime</title><title>IEEE Trans. Plasma Sci.; (United States)</title><addtitle>TPS</addtitle><description>This paper reports the operation of a cylindrical hollow cathode discharge with current risetimes of a few nanoseconds at current densities at the entrance of the cathode in the range of 50-560A · cm-2 and at voltages of 280-850 V. Time-dependent measurements of the impedance of the discharge are presented. They allow for the evaluation of discharge quantities such as risetime, delay time, discharge voltage, and current, depending on the operation parameters as applied voltage, pressure, and preionization. The power density in the active region of the hollow cathode exceeded 200 kW · cm-3.</description><subject>420800 - Engineering- Electronic Circuits & Devices- (-1989)</subject><subject>CATHODES</subject><subject>CURRENT DENSITY</subject><subject>CURRENTS</subject><subject>Delay</subject><subject>ELECTRIC CURRENTS</subject><subject>ELECTRIC DISCHARGES</subject><subject>ELECTRIC IMPEDANCE</subject><subject>ELECTRIC POTENTIAL</subject><subject>ELECTRODES</subject><subject>ENGINEERING</subject><subject>Exact sciences and technology</subject><subject>Gas lasers</subject><subject>Gases</subject><subject>HOLLOW CATHODES</subject><subject>IMPEDANCE</subject><subject>Laser excitation</subject><subject>OPERATION</subject><subject>Partial discharges</subject><subject>Physics</subject><subject>Physics of gases, plasmas and electric discharges</subject><subject>Physics of plasmas and electric discharges</subject><subject>POWER DENSITY</subject><subject>PRESSURE DEPENDENCE</subject><subject>PULSE RISE TIME</subject><subject>Surface emitting lasers</subject><subject>TIME DEPENDENCE</subject><subject>TIMING PROPERTIES</subject><subject>Voltage</subject><issn>0093-3813</issn><issn>1939-9375</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1984</creationdate><recordtype>article</recordtype><recordid>eNp9kM9LwzAYhoMoOKd3wUsRr51Jv3RJjjJ_TBg6dJ5DmqQ20jWjiQz_ezM6PXjw9B2-93l4eRE6J3hCCBbXq-XrhAhOJxTIFIAfoBERIHIBrDxEI4wF5MAJHKOTED4wJrTExQjx5WcbrMnmvm39Npup2Hhjs1sXdKP6d5ttXWyyJ9X5YLXvTPbigo1ubU_RUa0Sera_Y_R2f7eazfPF88Pj7GaRayAs5hXTqZDRYDHX2jDChTJCaVoZWlEDIEzJC1vXlCkDlAqKa1pxVTMoOGMGxuhy8PoQnQzaRaub1KSzOsqSi6IsixTCQ0j3PoTe1nLTu7XqvyTBcjePTPPI3TxyP09CrgZko4JWbd2rTrvwyyUxKwqcYtM_5tRARee72CvX_ue_GEBnrf3V_ny_AYHqfq4</recordid><startdate>19840101</startdate><enddate>19840101</enddate><creator>Schaefer, Gerhard</creator><creator>Husoy, Per O.</creator><creator>Schoenbach, Karl H.</creator><creator>Kromphole, Hermann</creator><general>IEEE</general><general>Institute of Electrical and Electronics Engineers</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>OTOTI</scope></search><sort><creationdate>19840101</creationdate><title>Pulsed Hollow Cathode Discharge with Nanosecond Risetime</title><author>Schaefer, Gerhard ; Husoy, Per O. ; Schoenbach, Karl H. ; Kromphole, Hermann</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c317t-b7c431dc3e08ccd7189ad9ac4bd4b4d339d582eff47ad344940f4b8af732877d3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1984</creationdate><topic>420800 - Engineering- Electronic Circuits & Devices- (-1989)</topic><topic>CATHODES</topic><topic>CURRENT DENSITY</topic><topic>CURRENTS</topic><topic>Delay</topic><topic>ELECTRIC CURRENTS</topic><topic>ELECTRIC DISCHARGES</topic><topic>ELECTRIC IMPEDANCE</topic><topic>ELECTRIC POTENTIAL</topic><topic>ELECTRODES</topic><topic>ENGINEERING</topic><topic>Exact sciences and technology</topic><topic>Gas lasers</topic><topic>Gases</topic><topic>HOLLOW CATHODES</topic><topic>IMPEDANCE</topic><topic>Laser excitation</topic><topic>OPERATION</topic><topic>Partial discharges</topic><topic>Physics</topic><topic>Physics of gases, plasmas and electric discharges</topic><topic>Physics of plasmas and electric discharges</topic><topic>POWER DENSITY</topic><topic>PRESSURE DEPENDENCE</topic><topic>PULSE RISE TIME</topic><topic>Surface emitting lasers</topic><topic>TIME DEPENDENCE</topic><topic>TIMING PROPERTIES</topic><topic>Voltage</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Schaefer, Gerhard</creatorcontrib><creatorcontrib>Husoy, Per O.</creatorcontrib><creatorcontrib>Schoenbach, Karl H.</creatorcontrib><creatorcontrib>Kromphole, Hermann</creatorcontrib><creatorcontrib>Texas Tech University, Lubbock</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>OSTI.GOV</collection><jtitle>IEEE Trans. Plasma Sci.; (United States)</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Schaefer, Gerhard</au><au>Husoy, Per O.</au><au>Schoenbach, Karl H.</au><au>Kromphole, Hermann</au><aucorp>Texas Tech University, Lubbock</aucorp><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Pulsed Hollow Cathode Discharge with Nanosecond Risetime</atitle><jtitle>IEEE Trans. Plasma Sci.; (United States)</jtitle><stitle>TPS</stitle><date>1984-01-01</date><risdate>1984</risdate><volume>12</volume><issue>4</issue><spage>271</spage><epage>274</epage><pages>271-274</pages><artnum>271</artnum><issn>0093-3813</issn><eissn>1939-9375</eissn><coden>ITPSBD</coden><abstract>This paper reports the operation of a cylindrical hollow cathode discharge with current risetimes of a few nanoseconds at current densities at the entrance of the cathode in the range of 50-560A · cm-2 and at voltages of 280-850 V. Time-dependent measurements of the impedance of the discharge are presented. They allow for the evaluation of discharge quantities such as risetime, delay time, discharge voltage, and current, depending on the operation parameters as applied voltage, pressure, and preionization. The power density in the active region of the hollow cathode exceeded 200 kW · cm-3.</abstract><cop>New York, NY</cop><pub>IEEE</pub><doi>10.1109/TPS.1984.4316338</doi><tpages>4</tpages></addata></record> |
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| identifier | ISSN: 0093-3813 |
| ispartof | IEEE Trans. Plasma Sci.; (United States), 1984-01, Vol.12 (4), p.271-274, Article 271 |
| issn | 0093-3813 1939-9375 |
| language | eng |
| recordid | cdi_crossref_primary_10_1109_TPS_1984_4316338 |
| source | IEEE Electronic Library (IEL) |
| subjects | 420800 - Engineering- Electronic Circuits & Devices- (-1989) CATHODES CURRENT DENSITY CURRENTS Delay ELECTRIC CURRENTS ELECTRIC DISCHARGES ELECTRIC IMPEDANCE ELECTRIC POTENTIAL ELECTRODES ENGINEERING Exact sciences and technology Gas lasers Gases HOLLOW CATHODES IMPEDANCE Laser excitation OPERATION Partial discharges Physics Physics of gases, plasmas and electric discharges Physics of plasmas and electric discharges POWER DENSITY PRESSURE DEPENDENCE PULSE RISE TIME Surface emitting lasers TIME DEPENDENCE TIMING PROPERTIES Voltage |
| title | Pulsed Hollow Cathode Discharge with Nanosecond Risetime |
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