Surge Current and Avalanche Ruggedness of 1.2-kV Vertical GaN p-n Diodes

This letter reports the avalanche and surge current ruggedness of the industry's first 1.2-kV-class vertical GaN p-n diodes fabricated on 100-mm GaN substrates. The 1.2-kV vertical GaN p-n diodes with a 1.39-mm 2 device area and an avalanche breakdown voltage of 1589 V show a critical avalanche...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:IEEE transactions on power electronics 2021-10, Vol.36 (10), p.10959-10964
Hauptverfasser: Liu, Jingcun, Zhang, Ruizhe, Xiao, Ming, Pidaparthi, Subhash, Cui, Hao, Edwards, Andrew, Baubutr, Lek, Drowley, Cliff, Zhang, Yuhao
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:This letter reports the avalanche and surge current ruggedness of the industry's first 1.2-kV-class vertical GaN p-n diodes fabricated on 100-mm GaN substrates. The 1.2-kV vertical GaN p-n diodes with a 1.39-mm 2 device area and an avalanche breakdown voltage of 1589 V show a critical avalanche energy density of 7.6 J/cm 2 in unclamped inductive switching tests, as well as a critical surge current of 54 A and a critical surge energy density of 180 J/cm 2 in 10-ms surge current tests. All these values are the highest reported in vertical GaN devices and comparable to those of commercial SiC p-n diodes and merged p-n Schottky diodes. These GaN p-n diodes show significantly smaller reverse recovery compared to SiC p-n diodes, revealing less conductivity modulation in n-GaN. The negative temperature coefficient of differential on-resistance and the anticlockwise surge I-V locus are believed to be due to the increased acceptor ionization in p-GaN and the decreased contact resistance at high temperatures. These results suggest a high ruggedness of GaN p-n junctions with small bipolar currents and fast switching capabilities. As the first electrothermal ruggedness data for industry's vertical GaN devices, these results provide key new insights for the development of vertical GaN devices as well as their application spaces.
ISSN:0885-8993
1941-0107
DOI:10.1109/TPEL.2021.3067019