Buried Boron Doped Layer for CVD Diamond Photo-Thermionic Cathodes

A buried boron (B) doped layer has been fabricated by ion implantation into the bulk structure of a chemical vapor deposition (CVD) diamond film engineered to act as a photo-thermionic cathode for high-temperature solar cells. The boron layer implantation is a fundamental step in order to obtain an...

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Veröffentlicht in:	IEEE transactions on nanotechnology 2016-11, Vol.15 (6), p.862-866
Hauptverfasser:	Bellucci, A., Girolami, M., Calvani, P., Michaelson, S., Hofmann, A., Carcelen, V., Trucchi, D. M.
Format:	Artikel
Sprache:	eng
Schlagworte:	Annealing Boron Cathodes Chemical vapor deposition CVD Diamond Diamond Diamonds energy conversion high-temperature solar cell Ion beams Ion implantation Kinetic energy Optical films Optical properties photon-enhanced thermionic emission Photonic band gap Photovoltaic cells Quantum efficiency Solar cells solar concentration
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