Impact of the Ohmic Electrode on the Endurance of Oxide-Based Resistive Switching Memory

As one of the key aspects in the reliability of redox-based resistive switching memories (ReRAMs), maximizing their endurance is of high relevance for industrial applications. The major limitation regarding endurance is considered the excessive generation of oxygen vacancies during cycling, which ev...

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Veröffentlicht in:IEEE transactions on electron devices 2021-03, Vol.68 (3), p.1024-1030
Hauptverfasser: Wiefels, Stefan, Von Witzleben, Moritz, Huttemann, Michael, Bottger, Ulrich, Waser, Rainer, Menzel, Stephan
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container_end_page 1030
container_issue 3
container_start_page 1024
container_title IEEE transactions on electron devices
container_volume 68
creator Wiefels, Stefan
Von Witzleben, Moritz
Huttemann, Michael
Bottger, Ulrich
Waser, Rainer
Menzel, Stephan
description As one of the key aspects in the reliability of redox-based resistive switching memories (ReRAMs), maximizing their endurance is of high relevance for industrial applications. The major limitation regarding endurance is considered the excessive generation of oxygen vacancies during cycling, which eventually leads to irreversible RESET failures. Thus, the endurance could be increased by using combinations of switching oxide and ohmic electrode (OE) metal that provides a high barrier for the generation of oxygen vacancies [defect formation energy (DFE)]. In this work, we present a sophisticated programming algorithm that aims to maximize the endurance within reasonable measurement time. Using this algorithm, we compare ReRAM devices with four different OE metals and confirm the theoretically predicted trend. Thus, our work provides valuable information for device engineering toward higher endurance.
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fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_crossref_primary_10_1109_TED_2021_3049765</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>9325922</ieee_id><sourcerecordid>2493601941</sourcerecordid><originalsourceid>FETCH-LOGICAL-c333t-ffd4425e57c8d993ce459d4272e6ad4feffa58f8221406d71400fa66d53aaa773</originalsourceid><addsrcrecordid>eNo9kEtLAzEQgIMoWKt3wcuC56157-aoddVCpaAVvIWQTGxKd7cmW7X_3q0tXmaY4ZsHH0KXBI8IwepmXt2PKKZkxDBXhRRHaECEKHIluTxGA4xJmStWslN0ltKyLyXndIDeJ_Xa2C5rfdYtIJst6mCzagW2i62DrG3-2lXjNtE0Fnbc7Cc4yO9MApe9QAqpC1-QvX6Hzi5C85E9Q93G7Tk68WaV4OKQh-jtoZqPn_Lp7HEyvp3mljHW5d67_g8BorClU4pZ4EI5TgsK0jjuwXsjSl9SSjiWrugj9kZKJ5gxpijYEF3v965j-7mB1Ollu4lNf1JTrpjERHHSU3hP2dimFMHrdQy1iVtNsN75070_vfOnD_76kav9SACAf1wxKhSl7Bdpnmsj</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2493601941</pqid></control><display><type>article</type><title>Impact of the Ohmic Electrode on the Endurance of Oxide-Based Resistive Switching Memory</title><source>IEEE Electronic Library (IEL)</source><creator>Wiefels, Stefan ; Von Witzleben, Moritz ; Huttemann, Michael ; Bottger, Ulrich ; Waser, Rainer ; Menzel, Stephan</creator><creatorcontrib>Wiefels, Stefan ; Von Witzleben, Moritz ; Huttemann, Michael ; Bottger, Ulrich ; Waser, Rainer ; Menzel, Stephan</creatorcontrib><description>As one of the key aspects in the reliability of redox-based resistive switching memories (ReRAMs), maximizing their endurance is of high relevance for industrial applications. The major limitation regarding endurance is considered the excessive generation of oxygen vacancies during cycling, which eventually leads to irreversible RESET failures. Thus, the endurance could be increased by using combinations of switching oxide and ohmic electrode (OE) metal that provides a high barrier for the generation of oxygen vacancies [defect formation energy (DFE)]. In this work, we present a sophisticated programming algorithm that aims to maximize the endurance within reasonable measurement time. Using this algorithm, we compare ReRAM devices with four different OE metals and confirm the theoretically predicted trend. Thus, our work provides valuable information for device engineering toward higher endurance.</description><identifier>ISSN: 0018-9383</identifier><identifier>EISSN: 1557-9646</identifier><identifier>DOI: 10.1109/TED.2021.3049765</identifier><identifier>CODEN: IETDAI</identifier><language>eng</language><publisher>New York: IEEE</publisher><subject>Algorithms ; Chemicals ; Defect formation energy (DFE) ; Electric potential ; Electrodes ; endurance ; endurance algorithm ; Fatigue tests ; Free energy ; Hafnium ; Heat of formation ; Industrial applications ; OxRAM ; redox-based resistive switching memory (ReRAM) ; Reliability ; Reliability aspects ; Switches ; Switching ; Vacancies ; valence change mechanism (VCM) ; Zirconium</subject><ispartof>IEEE transactions on electron devices, 2021-03, Vol.68 (3), p.1024-1030</ispartof><rights>Copyright The Institute of Electrical and Electronics Engineers, Inc. (IEEE) 2021</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c333t-ffd4425e57c8d993ce459d4272e6ad4feffa58f8221406d71400fa66d53aaa773</citedby><cites>FETCH-LOGICAL-c333t-ffd4425e57c8d993ce459d4272e6ad4feffa58f8221406d71400fa66d53aaa773</cites><orcidid>0000-0002-9080-8980 ; 0000-0002-1350-7092 ; 0000-0002-4258-2673 ; 0000-0003-2820-9677</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/9325922$$EHTML$$P50$$Gieee$$Hfree_for_read</linktohtml><link.rule.ids>314,780,784,796,27924,27925,54758</link.rule.ids></links><search><creatorcontrib>Wiefels, Stefan</creatorcontrib><creatorcontrib>Von Witzleben, Moritz</creatorcontrib><creatorcontrib>Huttemann, Michael</creatorcontrib><creatorcontrib>Bottger, Ulrich</creatorcontrib><creatorcontrib>Waser, Rainer</creatorcontrib><creatorcontrib>Menzel, Stephan</creatorcontrib><title>Impact of the Ohmic Electrode on the Endurance of Oxide-Based Resistive Switching Memory</title><title>IEEE transactions on electron devices</title><addtitle>TED</addtitle><description>As one of the key aspects in the reliability of redox-based resistive switching memories (ReRAMs), maximizing their endurance is of high relevance for industrial applications. The major limitation regarding endurance is considered the excessive generation of oxygen vacancies during cycling, which eventually leads to irreversible RESET failures. Thus, the endurance could be increased by using combinations of switching oxide and ohmic electrode (OE) metal that provides a high barrier for the generation of oxygen vacancies [defect formation energy (DFE)]. In this work, we present a sophisticated programming algorithm that aims to maximize the endurance within reasonable measurement time. Using this algorithm, we compare ReRAM devices with four different OE metals and confirm the theoretically predicted trend. Thus, our work provides valuable information for device engineering toward higher endurance.</description><subject>Algorithms</subject><subject>Chemicals</subject><subject>Defect formation energy (DFE)</subject><subject>Electric potential</subject><subject>Electrodes</subject><subject>endurance</subject><subject>endurance algorithm</subject><subject>Fatigue tests</subject><subject>Free energy</subject><subject>Hafnium</subject><subject>Heat of formation</subject><subject>Industrial applications</subject><subject>OxRAM</subject><subject>redox-based resistive switching memory (ReRAM)</subject><subject>Reliability</subject><subject>Reliability aspects</subject><subject>Switches</subject><subject>Switching</subject><subject>Vacancies</subject><subject>valence change mechanism (VCM)</subject><subject>Zirconium</subject><issn>0018-9383</issn><issn>1557-9646</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2021</creationdate><recordtype>article</recordtype><sourceid>ESBDL</sourceid><sourceid>RIE</sourceid><recordid>eNo9kEtLAzEQgIMoWKt3wcuC56157-aoddVCpaAVvIWQTGxKd7cmW7X_3q0tXmaY4ZsHH0KXBI8IwepmXt2PKKZkxDBXhRRHaECEKHIluTxGA4xJmStWslN0ltKyLyXndIDeJ_Xa2C5rfdYtIJst6mCzagW2i62DrG3-2lXjNtE0Fnbc7Cc4yO9MApe9QAqpC1-QvX6Hzi5C85E9Q93G7Tk68WaV4OKQh-jtoZqPn_Lp7HEyvp3mljHW5d67_g8BorClU4pZ4EI5TgsK0jjuwXsjSl9SSjiWrugj9kZKJ5gxpijYEF3v965j-7mB1Ollu4lNf1JTrpjERHHSU3hP2dimFMHrdQy1iVtNsN75070_vfOnD_76kav9SACAf1wxKhSl7Bdpnmsj</recordid><startdate>20210301</startdate><enddate>20210301</enddate><creator>Wiefels, Stefan</creator><creator>Von Witzleben, Moritz</creator><creator>Huttemann, Michael</creator><creator>Bottger, Ulrich</creator><creator>Waser, Rainer</creator><creator>Menzel, Stephan</creator><general>IEEE</general><general>The Institute of Electrical and Electronics Engineers, Inc. (IEEE)</general><scope>97E</scope><scope>ESBDL</scope><scope>RIA</scope><scope>RIE</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>8FD</scope><scope>L7M</scope><orcidid>https://orcid.org/0000-0002-9080-8980</orcidid><orcidid>https://orcid.org/0000-0002-1350-7092</orcidid><orcidid>https://orcid.org/0000-0002-4258-2673</orcidid><orcidid>https://orcid.org/0000-0003-2820-9677</orcidid></search><sort><creationdate>20210301</creationdate><title>Impact of the Ohmic Electrode on the Endurance of Oxide-Based Resistive Switching Memory</title><author>Wiefels, Stefan ; Von Witzleben, Moritz ; Huttemann, Michael ; Bottger, Ulrich ; Waser, Rainer ; Menzel, Stephan</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c333t-ffd4425e57c8d993ce459d4272e6ad4feffa58f8221406d71400fa66d53aaa773</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2021</creationdate><topic>Algorithms</topic><topic>Chemicals</topic><topic>Defect formation energy (DFE)</topic><topic>Electric potential</topic><topic>Electrodes</topic><topic>endurance</topic><topic>endurance algorithm</topic><topic>Fatigue tests</topic><topic>Free energy</topic><topic>Hafnium</topic><topic>Heat of formation</topic><topic>Industrial applications</topic><topic>OxRAM</topic><topic>redox-based resistive switching memory (ReRAM)</topic><topic>Reliability</topic><topic>Reliability aspects</topic><topic>Switches</topic><topic>Switching</topic><topic>Vacancies</topic><topic>valence change mechanism (VCM)</topic><topic>Zirconium</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Wiefels, Stefan</creatorcontrib><creatorcontrib>Von Witzleben, Moritz</creatorcontrib><creatorcontrib>Huttemann, Michael</creatorcontrib><creatorcontrib>Bottger, Ulrich</creatorcontrib><creatorcontrib>Waser, Rainer</creatorcontrib><creatorcontrib>Menzel, Stephan</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 2005-present</collection><collection>IEEE Open Access Journals</collection><collection>IEEE All-Society Periodicals Package (ASPP) 1998–Present</collection><collection>IEEE Electronic Library (IEL)</collection><collection>CrossRef</collection><collection>Electronics &amp; Communications Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>IEEE transactions on electron devices</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Wiefels, Stefan</au><au>Von Witzleben, Moritz</au><au>Huttemann, Michael</au><au>Bottger, Ulrich</au><au>Waser, Rainer</au><au>Menzel, Stephan</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Impact of the Ohmic Electrode on the Endurance of Oxide-Based Resistive Switching Memory</atitle><jtitle>IEEE transactions on electron devices</jtitle><stitle>TED</stitle><date>2021-03-01</date><risdate>2021</risdate><volume>68</volume><issue>3</issue><spage>1024</spage><epage>1030</epage><pages>1024-1030</pages><issn>0018-9383</issn><eissn>1557-9646</eissn><coden>IETDAI</coden><abstract>As one of the key aspects in the reliability of redox-based resistive switching memories (ReRAMs), maximizing their endurance is of high relevance for industrial applications. The major limitation regarding endurance is considered the excessive generation of oxygen vacancies during cycling, which eventually leads to irreversible RESET failures. Thus, the endurance could be increased by using combinations of switching oxide and ohmic electrode (OE) metal that provides a high barrier for the generation of oxygen vacancies [defect formation energy (DFE)]. In this work, we present a sophisticated programming algorithm that aims to maximize the endurance within reasonable measurement time. Using this algorithm, we compare ReRAM devices with four different OE metals and confirm the theoretically predicted trend. Thus, our work provides valuable information for device engineering toward higher endurance.</abstract><cop>New York</cop><pub>IEEE</pub><doi>10.1109/TED.2021.3049765</doi><tpages>7</tpages><orcidid>https://orcid.org/0000-0002-9080-8980</orcidid><orcidid>https://orcid.org/0000-0002-1350-7092</orcidid><orcidid>https://orcid.org/0000-0002-4258-2673</orcidid><orcidid>https://orcid.org/0000-0003-2820-9677</orcidid><oa>free_for_read</oa></addata></record>
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source IEEE Electronic Library (IEL)
subjects Algorithms
Chemicals
Defect formation energy (DFE)
Electric potential
Electrodes
endurance
endurance algorithm
Fatigue tests
Free energy
Hafnium
Heat of formation
Industrial applications
OxRAM
redox-based resistive switching memory (ReRAM)
Reliability
Reliability aspects
Switches
Switching
Vacancies
valence change mechanism (VCM)
Zirconium
title Impact of the Ohmic Electrode on the Endurance of Oxide-Based Resistive Switching Memory
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-03T23%3A42%3A01IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Impact%20of%20the%20Ohmic%20Electrode%20on%20the%20Endurance%20of%20Oxide-Based%20Resistive%20Switching%20Memory&rft.jtitle=IEEE%20transactions%20on%20electron%20devices&rft.au=Wiefels,%20Stefan&rft.date=2021-03-01&rft.volume=68&rft.issue=3&rft.spage=1024&rft.epage=1030&rft.pages=1024-1030&rft.issn=0018-9383&rft.eissn=1557-9646&rft.coden=IETDAI&rft_id=info:doi/10.1109/TED.2021.3049765&rft_dat=%3Cproquest_cross%3E2493601941%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=2493601941&rft_id=info:pmid/&rft_ieee_id=9325922&rfr_iscdi=true