A Defect Tolerance Scheme for Nanotechnology Circuits

Lithography-based integrated circuit fabrication is rapidly approaching its limit in terms of feature size. The current alternative is nanotechnology-based fabrication, which relies on self-assembly of nanotubes or nanowires. Such a process is subject to a high defect rate, which can be tolerated us...

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Veröffentlicht in:IEEE transactions on circuits and systems. I, Regular papers Regular papers, 2007-11, Vol.54 (11), p.2402-2409
Hauptverfasser: Al-Yamani, A.A., Ramsundar, S., Pradhan, D.K.
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Ramsundar, S.
Pradhan, D.K.
description Lithography-based integrated circuit fabrication is rapidly approaching its limit in terms of feature size. The current alternative is nanotechnology-based fabrication, which relies on self-assembly of nanotubes or nanowires. Such a process is subject to a high defect rate, which can be tolerated using carefully crafted defect tolerance techniques. This paper presents an algorithm for reconfiguration-based defect tolerance in nanotechnology switches. The algorithm offers an average switch density improvement of 50% to 100% to most recently published techniques. The algorithm is also consistent in improving the yield through minimizing false rejects as the results show over a large sample. The improvement percentage varies depending on the manufactured switch size and the desired defect-free size with the improvement in efficiency directly proportional to the size of the switch.
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fullrecord <record><control><sourceid>proquest_RIE</sourceid><recordid>TN_cdi_crossref_primary_10_1109_TCSI_2007_907875</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>4383231</ieee_id><sourcerecordid>896204700</sourcerecordid><originalsourceid>FETCH-LOGICAL-c353t-d8aa34e1696d185f5758faaf0b1ece37ea9ed445b422435731a806c479df93893</originalsourceid><addsrcrecordid>eNp9kD1PwzAQhi0EEqWwI7FEDDCl2LEd22MVvipVMLTMluucaao0LnYy9N-TKIiBgelueN5Xdw9C1wTPCMHqYV2sFrMMYzFTWEjBT9CEcC5TLHF-OuxMpZJm8hxdxLjDOFOYkgni8-QRHNg2WfsagmksJCu7hT0kzofkzTS-BbttfO0_j0lRBdtVbbxEZ87UEa5-5hR9PD-ti9d0-f6yKObL1FJO27SUxlAGJFd5SSR3XHDpjHF4Q8ACFWAUlIzxDcsyRrmgxPTXWiZU6RSVik7R_dh7CP6rg9jqfRUt1LVpwHdRS5VnmAmMe_LuX5IyprgQWQ_e_gF3vgtN_4WWOVO5zIXoITxCNvgYAzh9CNXehKMmWA-69aBbD7r1qLuP3IyRCgB-cUZ755TQbxjxeVo</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>864968677</pqid></control><display><type>article</type><title>A Defect Tolerance Scheme for Nanotechnology Circuits</title><source>IEEE Electronic Library (IEL)</source><creator>Al-Yamani, A.A. ; Ramsundar, S. ; Pradhan, D.K.</creator><creatorcontrib>Al-Yamani, A.A. ; Ramsundar, S. ; Pradhan, D.K.</creatorcontrib><description>Lithography-based integrated circuit fabrication is rapidly approaching its limit in terms of feature size. The current alternative is nanotechnology-based fabrication, which relies on self-assembly of nanotubes or nanowires. Such a process is subject to a high defect rate, which can be tolerated using carefully crafted defect tolerance techniques. This paper presents an algorithm for reconfiguration-based defect tolerance in nanotechnology switches. The algorithm offers an average switch density improvement of 50% to 100% to most recently published techniques. The algorithm is also consistent in improving the yield through minimizing false rejects as the results show over a large sample. The improvement percentage varies depending on the manufactured switch size and the desired defect-free size with the improvement in efficiency directly proportional to the size of the switch.</description><identifier>ISSN: 1549-8328</identifier><identifier>EISSN: 1558-0806</identifier><identifier>DOI: 10.1109/TCSI.2007.907875</identifier><identifier>CODEN: ITCSCH</identifier><language>eng</language><publisher>New York: IEEE</publisher><subject>Algorithms ; Circuits ; Cross bar switches ; defect tolerance ; Defects ; Fabrication ; Fault tolerance ; Frequency estimation ; Manufacturing ; Nanostructure ; Nanotechnology ; Nanowires ; reliability ; Self assembly ; Silicon ; Switches ; Tolerances</subject><ispartof>IEEE transactions on circuits and systems. I, Regular papers, 2007-11, Vol.54 (11), p.2402-2409</ispartof><rights>Copyright The Institute of Electrical and Electronics Engineers, Inc. (IEEE) 2007</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c353t-d8aa34e1696d185f5758faaf0b1ece37ea9ed445b422435731a806c479df93893</citedby><cites>FETCH-LOGICAL-c353t-d8aa34e1696d185f5758faaf0b1ece37ea9ed445b422435731a806c479df93893</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/4383231$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>315,782,786,798,27931,27932,54765</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/4383231$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Al-Yamani, A.A.</creatorcontrib><creatorcontrib>Ramsundar, S.</creatorcontrib><creatorcontrib>Pradhan, D.K.</creatorcontrib><title>A Defect Tolerance Scheme for Nanotechnology Circuits</title><title>IEEE transactions on circuits and systems. I, Regular papers</title><addtitle>TCSI</addtitle><description>Lithography-based integrated circuit fabrication is rapidly approaching its limit in terms of feature size. The current alternative is nanotechnology-based fabrication, which relies on self-assembly of nanotubes or nanowires. Such a process is subject to a high defect rate, which can be tolerated using carefully crafted defect tolerance techniques. This paper presents an algorithm for reconfiguration-based defect tolerance in nanotechnology switches. The algorithm offers an average switch density improvement of 50% to 100% to most recently published techniques. The algorithm is also consistent in improving the yield through minimizing false rejects as the results show over a large sample. The improvement percentage varies depending on the manufactured switch size and the desired defect-free size with the improvement in efficiency directly proportional to the size of the switch.</description><subject>Algorithms</subject><subject>Circuits</subject><subject>Cross bar switches</subject><subject>defect tolerance</subject><subject>Defects</subject><subject>Fabrication</subject><subject>Fault tolerance</subject><subject>Frequency estimation</subject><subject>Manufacturing</subject><subject>Nanostructure</subject><subject>Nanotechnology</subject><subject>Nanowires</subject><subject>reliability</subject><subject>Self assembly</subject><subject>Silicon</subject><subject>Switches</subject><subject>Tolerances</subject><issn>1549-8328</issn><issn>1558-0806</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2007</creationdate><recordtype>article</recordtype><sourceid>RIE</sourceid><recordid>eNp9kD1PwzAQhi0EEqWwI7FEDDCl2LEd22MVvipVMLTMluucaao0LnYy9N-TKIiBgelueN5Xdw9C1wTPCMHqYV2sFrMMYzFTWEjBT9CEcC5TLHF-OuxMpZJm8hxdxLjDOFOYkgni8-QRHNg2WfsagmksJCu7hT0kzofkzTS-BbttfO0_j0lRBdtVbbxEZ87UEa5-5hR9PD-ti9d0-f6yKObL1FJO27SUxlAGJFd5SSR3XHDpjHF4Q8ACFWAUlIzxDcsyRrmgxPTXWiZU6RSVik7R_dh7CP6rg9jqfRUt1LVpwHdRS5VnmAmMe_LuX5IyprgQWQ_e_gF3vgtN_4WWOVO5zIXoITxCNvgYAzh9CNXehKMmWA-69aBbD7r1qLuP3IyRCgB-cUZ755TQbxjxeVo</recordid><startdate>20071101</startdate><enddate>20071101</enddate><creator>Al-Yamani, A.A.</creator><creator>Ramsundar, S.</creator><creator>Pradhan, D.K.</creator><general>IEEE</general><general>The Institute of Electrical and Electronics Engineers, Inc. (IEEE)</general><scope>97E</scope><scope>RIA</scope><scope>RIE</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>8FD</scope><scope>L7M</scope><scope>F28</scope><scope>FR3</scope></search><sort><creationdate>20071101</creationdate><title>A Defect Tolerance Scheme for Nanotechnology Circuits</title><author>Al-Yamani, A.A. ; Ramsundar, S. ; Pradhan, D.K.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c353t-d8aa34e1696d185f5758faaf0b1ece37ea9ed445b422435731a806c479df93893</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2007</creationdate><topic>Algorithms</topic><topic>Circuits</topic><topic>Cross bar switches</topic><topic>defect tolerance</topic><topic>Defects</topic><topic>Fabrication</topic><topic>Fault tolerance</topic><topic>Frequency estimation</topic><topic>Manufacturing</topic><topic>Nanostructure</topic><topic>Nanotechnology</topic><topic>Nanowires</topic><topic>reliability</topic><topic>Self assembly</topic><topic>Silicon</topic><topic>Switches</topic><topic>Tolerances</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Al-Yamani, A.A.</creatorcontrib><creatorcontrib>Ramsundar, S.</creatorcontrib><creatorcontrib>Pradhan, D.K.</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 2005-present</collection><collection>IEEE All-Society Periodicals Package (ASPP) 1998-Present</collection><collection>IEEE Electronic Library (IEL)</collection><collection>CrossRef</collection><collection>Electronics &amp; Communications Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>ANTE: Abstracts in New Technology &amp; Engineering</collection><collection>Engineering Research Database</collection><jtitle>IEEE transactions on circuits and systems. I, Regular papers</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Al-Yamani, A.A.</au><au>Ramsundar, S.</au><au>Pradhan, D.K.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>A Defect Tolerance Scheme for Nanotechnology Circuits</atitle><jtitle>IEEE transactions on circuits and systems. I, Regular papers</jtitle><stitle>TCSI</stitle><date>2007-11-01</date><risdate>2007</risdate><volume>54</volume><issue>11</issue><spage>2402</spage><epage>2409</epage><pages>2402-2409</pages><issn>1549-8328</issn><eissn>1558-0806</eissn><coden>ITCSCH</coden><abstract>Lithography-based integrated circuit fabrication is rapidly approaching its limit in terms of feature size. The current alternative is nanotechnology-based fabrication, which relies on self-assembly of nanotubes or nanowires. Such a process is subject to a high defect rate, which can be tolerated using carefully crafted defect tolerance techniques. This paper presents an algorithm for reconfiguration-based defect tolerance in nanotechnology switches. The algorithm offers an average switch density improvement of 50% to 100% to most recently published techniques. The algorithm is also consistent in improving the yield through minimizing false rejects as the results show over a large sample. The improvement percentage varies depending on the manufactured switch size and the desired defect-free size with the improvement in efficiency directly proportional to the size of the switch.</abstract><cop>New York</cop><pub>IEEE</pub><doi>10.1109/TCSI.2007.907875</doi><tpages>8</tpages></addata></record>
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subjects Algorithms
Circuits
Cross bar switches
defect tolerance
Defects
Fabrication
Fault tolerance
Frequency estimation
Manufacturing
Nanostructure
Nanotechnology
Nanowires
reliability
Self assembly
Silicon
Switches
Tolerances
title A Defect Tolerance Scheme for Nanotechnology Circuits
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-04T01%3A01%3A28IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_RIE&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=A%20Defect%20Tolerance%20Scheme%20for%20Nanotechnology%20Circuits&rft.jtitle=IEEE%20transactions%20on%20circuits%20and%20systems.%20I,%20Regular%20papers&rft.au=Al-Yamani,%20A.A.&rft.date=2007-11-01&rft.volume=54&rft.issue=11&rft.spage=2402&rft.epage=2409&rft.pages=2402-2409&rft.issn=1549-8328&rft.eissn=1558-0806&rft.coden=ITCSCH&rft_id=info:doi/10.1109/TCSI.2007.907875&rft_dat=%3Cproquest_RIE%3E896204700%3C/proquest_RIE%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=864968677&rft_id=info:pmid/&rft_ieee_id=4383231&rfr_iscdi=true