Junction Temperature Measurement of InAs Quantum-Dot Laser Diodes by Utilizing Voltage-Temperature Method
Junction temperature of InAs quantum-dot laser diodes (LDs) is measured by utilizing a forward voltage- temperature method. Although the forward voltage decrease with junction temperature increment is low, the linear relation between forward voltage and temperature clearly occurs. It is found that S...
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Veröffentlicht in: | IEEE photonics technology letters 2008-08, Vol.20 (16), p.1354-1356 |
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description | Junction temperature of InAs quantum-dot laser diodes (LDs) is measured by utilizing a forward voltage- temperature method. Although the forward voltage decrease with junction temperature increment is low, the linear relation between forward voltage and temperature clearly occurs. It is found that SiN x is more useful than SiO 2 to keep junction temperature low. Injection current to shift the lasing wavelength from ground to excited state is increased over 200 mA by using SiN x instead of SiO 2 as the insulating layer. As a result, ground state optical power is doubled. |
doi_str_mv | 10.1109/LPT.2008.926802 |
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Although the forward voltage decrease with junction temperature increment is low, the linear relation between forward voltage and temperature clearly occurs. It is found that SiN x is more useful than SiO 2 to keep junction temperature low. Injection current to shift the lasing wavelength from ground to excited state is increased over 200 mA by using SiN x instead of SiO 2 as the insulating layer. As a result, ground state optical power is doubled.</description><identifier>ISSN: 1041-1135</identifier><identifier>EISSN: 1941-0174</identifier><identifier>DOI: 10.1109/LPT.2008.926802</identifier><identifier>CODEN: IPTLEL</identifier><language>eng</language><publisher>New York: IEEE</publisher><subject>Diodes ; Forward voltage-temperature ( V\hbox{-}T ) method ; High speed optical techniques ; Insulation ; junction temperature ; Land surface temperature ; Plasma temperature ; Quantum dot lasers ; quantum-dot (QD) laser diodes (LDs) ; Silicon compounds ; Stationary state ; Temperature measurement ; Voltage</subject><ispartof>IEEE photonics technology letters, 2008-08, Vol.20 (16), p.1354-1356</ispartof><rights>Copyright The Institute of Electrical and Electronics Engineers, Inc. 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Although the forward voltage decrease with junction temperature increment is low, the linear relation between forward voltage and temperature clearly occurs. It is found that SiN x is more useful than SiO 2 to keep junction temperature low. Injection current to shift the lasing wavelength from ground to excited state is increased over 200 mA by using SiN x instead of SiO 2 as the insulating layer. As a result, ground state optical power is doubled.</description><subject>Diodes</subject><subject>Forward voltage-temperature ( V\hbox{-}T ) method</subject><subject>High speed optical techniques</subject><subject>Insulation</subject><subject>junction temperature</subject><subject>Land surface temperature</subject><subject>Plasma temperature</subject><subject>Quantum dot lasers</subject><subject>quantum-dot (QD) laser diodes (LDs)</subject><subject>Silicon compounds</subject><subject>Stationary state</subject><subject>Temperature measurement</subject><subject>Voltage</subject><issn>1041-1135</issn><issn>1941-0174</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2008</creationdate><recordtype>article</recordtype><sourceid>RIE</sourceid><recordid>eNpdkDtPwzAUhSMEElCYGVgsBraU60fieKzKW0WA1LJaTnpTjJK42M5Qfj2pipBgumf4ztHVlyRnFMaUgrqavczHDKAYK5YXwPaSI6oETYFKsT9kGDKlPDtMjkP4AKAi4-IosY99V0XrOjLHdo3exN4jeUIThttiF4mryUM3CeS1N13s2_TaRTIzAT25tm6JgZQbsoi2sV-2W5E310SzwvTvWnx3y5PkoDZNwNOfO0oWtzfz6X06e757mE5macW4iKmRKCCrQRZZTYVcVkaVJSiqgAEtuMFSMSNLmdVCiFrSZTFAkrOS13nOpeCj5HK3u_bus8cQdWtDhU1jOnR90FxkACLbghf_wA_X-274TRc5UwXPFRugqx1UeReCx1qvvW2N32gKeutdD9711rveeR8a57uGRcRfWmRScSr4NwaJfiY</recordid><startdate>20080815</startdate><enddate>20080815</enddate><creator>Jeong, Jung Hwa</creator><creator>Kim, Kyoung Chan</creator><creator>Lee, Jung Il</creator><creator>Kim, Hyun Jae</creator><creator>Han, Il Ki</creator><general>IEEE</general><general>The Institute of Electrical and Electronics Engineers, Inc. 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Although the forward voltage decrease with junction temperature increment is low, the linear relation between forward voltage and temperature clearly occurs. It is found that SiN x is more useful than SiO 2 to keep junction temperature low. Injection current to shift the lasing wavelength from ground to excited state is increased over 200 mA by using SiN x instead of SiO 2 as the insulating layer. As a result, ground state optical power is doubled.</abstract><cop>New York</cop><pub>IEEE</pub><doi>10.1109/LPT.2008.926802</doi><tpages>3</tpages></addata></record> |
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subjects | Diodes Forward voltage-temperature ( V\hbox{-}T ) method High speed optical techniques Insulation junction temperature Land surface temperature Plasma temperature Quantum dot lasers quantum-dot (QD) laser diodes (LDs) Silicon compounds Stationary state Temperature measurement Voltage |
title | Junction Temperature Measurement of InAs Quantum-Dot Laser Diodes by Utilizing Voltage-Temperature Method |
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