Junction Temperature Measurement of InAs Quantum-Dot Laser Diodes by Utilizing Voltage-Temperature Method

Junction temperature of InAs quantum-dot laser diodes (LDs) is measured by utilizing a forward voltage- temperature method. Although the forward voltage decrease with junction temperature increment is low, the linear relation between forward voltage and temperature clearly occurs. It is found that S...

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Veröffentlicht in:IEEE photonics technology letters 2008-08, Vol.20 (16), p.1354-1356
Hauptverfasser: Jeong, Jung Hwa, Kim, Kyoung Chan, Lee, Jung Il, Kim, Hyun Jae, Han, Il Ki
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Kim, Kyoung Chan
Lee, Jung Il
Kim, Hyun Jae
Han, Il Ki
description Junction temperature of InAs quantum-dot laser diodes (LDs) is measured by utilizing a forward voltage- temperature method. Although the forward voltage decrease with junction temperature increment is low, the linear relation between forward voltage and temperature clearly occurs. It is found that SiN x is more useful than SiO 2 to keep junction temperature low. Injection current to shift the lasing wavelength from ground to excited state is increased over 200 mA by using SiN x instead of SiO 2 as the insulating layer. As a result, ground state optical power is doubled.
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subjects Diodes
Forward voltage-temperature ( V\hbox{-}T ) method
High speed optical techniques
Insulation
junction temperature
Land surface temperature
Plasma temperature
Quantum dot lasers
quantum-dot (QD) laser diodes (LDs)
Silicon compounds
Stationary state
Temperature measurement
Voltage
title Junction Temperature Measurement of InAs Quantum-Dot Laser Diodes by Utilizing Voltage-Temperature Method
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