Formation of Hump Effect Due to Top-Gate Bias Stress in Organic Thin-Film Transistors

This study investigated the reliability of top-gate p-type organic thin-film transistors in vacuum under positive bias stress-induced and positive bias illumination stress-induced instability degradation. The manufacturing process suggested that sidewall dielectric insulating layers are thin. In add...

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Veröffentlicht in:IEEE electron device letters 2019-12, Vol.40 (12), p.1941-1944
Hauptverfasser: Chen, Hong-Chih, Tsao, Yu-Ching, Chu, An-Kuo, Huang, Hui-Chun, Lai, Wei-Chih, Chen, Guan-Fu, Huang, Shin-Ping, Chang, Ting-Chang, Chen, Po-Hsun, Chen, Jian-Jie, Kuo, Chuan-Wei, Zhou, Kuan-Ju, Hung, Yang-Hao
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Sprache:eng
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