Low-Voltage Gas Field Ionization Tunneling Sensor Using Silicon Nanostructures

In this paper, we report the design and characteristics of a field-ionization gas sensor based on freestanding silicon nano structures. Silicon nanostructures fabricated using a three-step chemical/electrochemical technique on silicon wafer were placed between two parallel plates separated by a smal...

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Veröffentlicht in:IEEE sensors journal 2018-08, Vol.18 (15), p.6092-6096
Hauptverfasser: Sohi, Parsoua Abedini, Kahrizi, Mojtaba
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Kahrizi, Mojtaba
description In this paper, we report the design and characteristics of a field-ionization gas sensor based on freestanding silicon nano structures. Silicon nanostructures fabricated using a three-step chemical/electrochemical technique on silicon wafer were placed between two parallel plates separated by a small gap. The sensor works based on the field ionization tunneling effect. For the first time, it is shown that silicon nanostructures can be used for the purpose. The device was tested for Ar, N 2 , O 2 , and He gases in a pressure range of 0.01
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subjects Electric fields
Gas detectors
Gas ionization sensors
Ionization
low voltage breakdown
Sensor phenomena and characterization
Silicon
silicon nanowires
Tunneling
tunneling breakdown
tunneling current
title Low-Voltage Gas Field Ionization Tunneling Sensor Using Silicon Nanostructures
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