Zero-Balance Method for Evaluation of Sealed Cavity Pressure Down to Single Digit Pa Using Thin Silicon Diaphragm

The sealed cavity pressure of a micro-package often becomes the determining factor of the performance of an encapsulated micro-electro mechanical system (MEMS). In this study, a sealed cavity pressure evaluation method for a micro-package using a thin diaphragm is studied comprehensively. The sealed...

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Veröffentlicht in:Journal of microelectromechanical systems 2020-06, Vol.29 (3), p.418-426
Hauptverfasser: Farisi, Muhammad Salman Al, Hirano, Hideki, Tanaka, Shuji
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container_end_page 426
container_issue 3
container_start_page 418
container_title Journal of microelectromechanical systems
container_volume 29
creator Farisi, Muhammad Salman Al
Hirano, Hideki
Tanaka, Shuji
description The sealed cavity pressure of a micro-package often becomes the determining factor of the performance of an encapsulated micro-electro mechanical system (MEMS). In this study, a sealed cavity pressure evaluation method for a micro-package using a thin diaphragm is studied comprehensively. The sealed cavity pressure is identical to the surrounding pressure when the diaphragm separating both volumes becomes flat, i.e. zero-balance method. The zero-balance method has advantages to other techniques in terms of fabrication process simplicity and pressure evaluation range. Two approaches are introduced to reduce the impact of the residual stress, which typically exists in the conventionally used silicon-on-insulator (SOI) diaphragm. The introduction of a stress compensation layer was able to reduce the impact of the residual stress of SOI-based diaphragms. However, a significant hysteresis is developed on the diaphragm, which limits the precise measurement of a sealed cavity. On the other hand the residual stress can be avoided by the usage of intentionally tensile stressed boron doped Si diaphragm, which is produced by alkaline wet etching. Using such a diaphragm, a sealed cavity pressure of several Pa can be measured with a single digit Pa accuracy. [2020-0014]
doi_str_mv 10.1109/JMEMS.2020.2984229
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fullrecord <record><control><sourceid>proquest_RIE</sourceid><recordid>TN_cdi_crossref_primary_10_1109_JMEMS_2020_2984229</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>9062343</ieee_id><sourcerecordid>2409377091</sourcerecordid><originalsourceid>FETCH-LOGICAL-c361t-31fe741814935ae13733f3295f81499ab9af069b48e2cb3ead5ba94e8b55a7d03</originalsourceid><addsrcrecordid>eNo9kFtPwkAQhRujiYj-AX3ZxOfi3nrZRwW8BSIJ8OJLMy1TWFK6sNti-PcuQnyamTNzziRfENwz2mOMqqfP8XA87XHKaY-rVHKuLoIOU5KFlEXppe9plIQJi5Lr4Ma5NaVMyjTuBLtvtCZ8gQrqAskYm5VZkNJYMtxD1UKjTU1MSaYIFS5IH_a6OZCJRedai2RgfmrSGDLV9bLyo17qhkyAzJ0XyGyla7-qdOFDBhq2KwvLzW1wVULl8O5cu8H8dTjrv4ejr7eP_vMoLETMmlCwEhPJUiaViACZSIQoBVdReZQU5ApKGqtcpsiLXCAsohyUxDSPIkgWVHSDx1Pu1ppdi67J1qa1tX-ZcUmVSBKqmL_ip6vCGucsltnW6g3YQ8ZodkSb_aHNjmizM1pvejiZNCL-GxSNuZBC_AJWtnS4</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2409377091</pqid></control><display><type>article</type><title>Zero-Balance Method for Evaluation of Sealed Cavity Pressure Down to Single Digit Pa Using Thin Silicon Diaphragm</title><source>IEEE Electronic Library (IEL)</source><creator>Farisi, Muhammad Salman Al ; Hirano, Hideki ; Tanaka, Shuji</creator><creatorcontrib>Farisi, Muhammad Salman Al ; Hirano, Hideki ; Tanaka, Shuji</creatorcontrib><description>The sealed cavity pressure of a micro-package often becomes the determining factor of the performance of an encapsulated micro-electro mechanical system (MEMS). In this study, a sealed cavity pressure evaluation method for a micro-package using a thin diaphragm is studied comprehensively. The sealed cavity pressure is identical to the surrounding pressure when the diaphragm separating both volumes becomes flat, i.e. zero-balance method. The zero-balance method has advantages to other techniques in terms of fabrication process simplicity and pressure evaluation range. Two approaches are introduced to reduce the impact of the residual stress, which typically exists in the conventionally used silicon-on-insulator (SOI) diaphragm. The introduction of a stress compensation layer was able to reduce the impact of the residual stress of SOI-based diaphragms. However, a significant hysteresis is developed on the diaphragm, which limits the precise measurement of a sealed cavity. On the other hand the residual stress can be avoided by the usage of intentionally tensile stressed boron doped Si diaphragm, which is produced by alkaline wet etching. Using such a diaphragm, a sealed cavity pressure of several Pa can be measured with a single digit Pa accuracy. [2020-0014]</description><identifier>ISSN: 1057-7157</identifier><identifier>EISSN: 1941-0158</identifier><identifier>DOI: 10.1109/JMEMS.2020.2984229</identifier><identifier>CODEN: JMIYET</identifier><language>eng</language><publisher>New York: IEEE</publisher><subject>Atmosphere ; Atmospheric measurements ; Boron ; Cavity resonators ; Diaphragms (mechanics) ; evaluation system ; Fabrication ; Injection molding ; Mechanical systems ; MEMS packaging ; micro-electro mechanical system ; Microelectromechanical systems ; Micromechanical devices ; Pressure measurement ; Residual stress ; sealed cavity pressure ; Silicon ; SOI (semiconductors) ; vacuum sealing ; Zero-balance method</subject><ispartof>Journal of microelectromechanical systems, 2020-06, Vol.29 (3), p.418-426</ispartof><rights>Copyright The Institute of Electrical and Electronics Engineers, Inc. (IEEE) 2020</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c361t-31fe741814935ae13733f3295f81499ab9af069b48e2cb3ead5ba94e8b55a7d03</citedby><cites>FETCH-LOGICAL-c361t-31fe741814935ae13733f3295f81499ab9af069b48e2cb3ead5ba94e8b55a7d03</cites><orcidid>0000-0003-4870-9337 ; 0000-0002-1908-430X</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/9062343$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,780,784,796,27924,27925,54758</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/9062343$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Farisi, Muhammad Salman Al</creatorcontrib><creatorcontrib>Hirano, Hideki</creatorcontrib><creatorcontrib>Tanaka, Shuji</creatorcontrib><title>Zero-Balance Method for Evaluation of Sealed Cavity Pressure Down to Single Digit Pa Using Thin Silicon Diaphragm</title><title>Journal of microelectromechanical systems</title><addtitle>JMEMS</addtitle><description>The sealed cavity pressure of a micro-package often becomes the determining factor of the performance of an encapsulated micro-electro mechanical system (MEMS). In this study, a sealed cavity pressure evaluation method for a micro-package using a thin diaphragm is studied comprehensively. The sealed cavity pressure is identical to the surrounding pressure when the diaphragm separating both volumes becomes flat, i.e. zero-balance method. The zero-balance method has advantages to other techniques in terms of fabrication process simplicity and pressure evaluation range. Two approaches are introduced to reduce the impact of the residual stress, which typically exists in the conventionally used silicon-on-insulator (SOI) diaphragm. The introduction of a stress compensation layer was able to reduce the impact of the residual stress of SOI-based diaphragms. However, a significant hysteresis is developed on the diaphragm, which limits the precise measurement of a sealed cavity. On the other hand the residual stress can be avoided by the usage of intentionally tensile stressed boron doped Si diaphragm, which is produced by alkaline wet etching. Using such a diaphragm, a sealed cavity pressure of several Pa can be measured with a single digit Pa accuracy. [2020-0014]</description><subject>Atmosphere</subject><subject>Atmospheric measurements</subject><subject>Boron</subject><subject>Cavity resonators</subject><subject>Diaphragms (mechanics)</subject><subject>evaluation system</subject><subject>Fabrication</subject><subject>Injection molding</subject><subject>Mechanical systems</subject><subject>MEMS packaging</subject><subject>micro-electro mechanical system</subject><subject>Microelectromechanical systems</subject><subject>Micromechanical devices</subject><subject>Pressure measurement</subject><subject>Residual stress</subject><subject>sealed cavity pressure</subject><subject>Silicon</subject><subject>SOI (semiconductors)</subject><subject>vacuum sealing</subject><subject>Zero-balance method</subject><issn>1057-7157</issn><issn>1941-0158</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2020</creationdate><recordtype>article</recordtype><sourceid>RIE</sourceid><recordid>eNo9kFtPwkAQhRujiYj-AX3ZxOfi3nrZRwW8BSIJ8OJLMy1TWFK6sNti-PcuQnyamTNzziRfENwz2mOMqqfP8XA87XHKaY-rVHKuLoIOU5KFlEXppe9plIQJi5Lr4Ma5NaVMyjTuBLtvtCZ8gQrqAskYm5VZkNJYMtxD1UKjTU1MSaYIFS5IH_a6OZCJRedai2RgfmrSGDLV9bLyo17qhkyAzJ0XyGyla7-qdOFDBhq2KwvLzW1wVULl8O5cu8H8dTjrv4ejr7eP_vMoLETMmlCwEhPJUiaViACZSIQoBVdReZQU5ApKGqtcpsiLXCAsohyUxDSPIkgWVHSDx1Pu1ppdi67J1qa1tX-ZcUmVSBKqmL_ip6vCGucsltnW6g3YQ8ZodkSb_aHNjmizM1pvejiZNCL-GxSNuZBC_AJWtnS4</recordid><startdate>20200601</startdate><enddate>20200601</enddate><creator>Farisi, Muhammad Salman Al</creator><creator>Hirano, Hideki</creator><creator>Tanaka, Shuji</creator><general>IEEE</general><general>The Institute of Electrical and Electronics Engineers, Inc. (IEEE)</general><scope>97E</scope><scope>RIA</scope><scope>RIE</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7TB</scope><scope>7U5</scope><scope>8FD</scope><scope>FR3</scope><scope>L7M</scope><orcidid>https://orcid.org/0000-0003-4870-9337</orcidid><orcidid>https://orcid.org/0000-0002-1908-430X</orcidid></search><sort><creationdate>20200601</creationdate><title>Zero-Balance Method for Evaluation of Sealed Cavity Pressure Down to Single Digit Pa Using Thin Silicon Diaphragm</title><author>Farisi, Muhammad Salman Al ; Hirano, Hideki ; Tanaka, Shuji</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c361t-31fe741814935ae13733f3295f81499ab9af069b48e2cb3ead5ba94e8b55a7d03</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2020</creationdate><topic>Atmosphere</topic><topic>Atmospheric measurements</topic><topic>Boron</topic><topic>Cavity resonators</topic><topic>Diaphragms (mechanics)</topic><topic>evaluation system</topic><topic>Fabrication</topic><topic>Injection molding</topic><topic>Mechanical systems</topic><topic>MEMS packaging</topic><topic>micro-electro mechanical system</topic><topic>Microelectromechanical systems</topic><topic>Micromechanical devices</topic><topic>Pressure measurement</topic><topic>Residual stress</topic><topic>sealed cavity pressure</topic><topic>Silicon</topic><topic>SOI (semiconductors)</topic><topic>vacuum sealing</topic><topic>Zero-balance method</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Farisi, Muhammad Salman Al</creatorcontrib><creatorcontrib>Hirano, Hideki</creatorcontrib><creatorcontrib>Tanaka, Shuji</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 2005-present</collection><collection>IEEE All-Society Periodicals Package (ASPP) 1998-Present</collection><collection>IEEE Electronic Library (IEL)</collection><collection>CrossRef</collection><collection>Electronics &amp; Communications Abstracts</collection><collection>Mechanical &amp; Transportation Engineering Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Engineering Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Journal of microelectromechanical systems</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Farisi, Muhammad Salman Al</au><au>Hirano, Hideki</au><au>Tanaka, Shuji</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Zero-Balance Method for Evaluation of Sealed Cavity Pressure Down to Single Digit Pa Using Thin Silicon Diaphragm</atitle><jtitle>Journal of microelectromechanical systems</jtitle><stitle>JMEMS</stitle><date>2020-06-01</date><risdate>2020</risdate><volume>29</volume><issue>3</issue><spage>418</spage><epage>426</epage><pages>418-426</pages><issn>1057-7157</issn><eissn>1941-0158</eissn><coden>JMIYET</coden><abstract>The sealed cavity pressure of a micro-package often becomes the determining factor of the performance of an encapsulated micro-electro mechanical system (MEMS). In this study, a sealed cavity pressure evaluation method for a micro-package using a thin diaphragm is studied comprehensively. The sealed cavity pressure is identical to the surrounding pressure when the diaphragm separating both volumes becomes flat, i.e. zero-balance method. The zero-balance method has advantages to other techniques in terms of fabrication process simplicity and pressure evaluation range. Two approaches are introduced to reduce the impact of the residual stress, which typically exists in the conventionally used silicon-on-insulator (SOI) diaphragm. The introduction of a stress compensation layer was able to reduce the impact of the residual stress of SOI-based diaphragms. However, a significant hysteresis is developed on the diaphragm, which limits the precise measurement of a sealed cavity. On the other hand the residual stress can be avoided by the usage of intentionally tensile stressed boron doped Si diaphragm, which is produced by alkaline wet etching. Using such a diaphragm, a sealed cavity pressure of several Pa can be measured with a single digit Pa accuracy. [2020-0014]</abstract><cop>New York</cop><pub>IEEE</pub><doi>10.1109/JMEMS.2020.2984229</doi><tpages>9</tpages><orcidid>https://orcid.org/0000-0003-4870-9337</orcidid><orcidid>https://orcid.org/0000-0002-1908-430X</orcidid></addata></record>
fulltext fulltext_linktorsrc
identifier ISSN: 1057-7157
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1941-0158
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source IEEE Electronic Library (IEL)
subjects Atmosphere
Atmospheric measurements
Boron
Cavity resonators
Diaphragms (mechanics)
evaluation system
Fabrication
Injection molding
Mechanical systems
MEMS packaging
micro-electro mechanical system
Microelectromechanical systems
Micromechanical devices
Pressure measurement
Residual stress
sealed cavity pressure
Silicon
SOI (semiconductors)
vacuum sealing
Zero-balance method
title Zero-Balance Method for Evaluation of Sealed Cavity Pressure Down to Single Digit Pa Using Thin Silicon Diaphragm
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-06T10%3A36%3A30IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_RIE&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Zero-Balance%20Method%20for%20Evaluation%20of%20Sealed%20Cavity%20Pressure%20Down%20to%20Single%20Digit%20Pa%20Using%20Thin%20Silicon%20Diaphragm&rft.jtitle=Journal%20of%20microelectromechanical%20systems&rft.au=Farisi,%20Muhammad%20Salman%20Al&rft.date=2020-06-01&rft.volume=29&rft.issue=3&rft.spage=418&rft.epage=426&rft.pages=418-426&rft.issn=1057-7157&rft.eissn=1941-0158&rft.coden=JMIYET&rft_id=info:doi/10.1109/JMEMS.2020.2984229&rft_dat=%3Cproquest_RIE%3E2409377091%3C/proquest_RIE%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=2409377091&rft_id=info:pmid/&rft_ieee_id=9062343&rfr_iscdi=true