Zero-Balance Method for Evaluation of Sealed Cavity Pressure Down to Single Digit Pa Using Thin Silicon Diaphragm
The sealed cavity pressure of a micro-package often becomes the determining factor of the performance of an encapsulated micro-electro mechanical system (MEMS). In this study, a sealed cavity pressure evaluation method for a micro-package using a thin diaphragm is studied comprehensively. The sealed...
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Veröffentlicht in: | Journal of microelectromechanical systems 2020-06, Vol.29 (3), p.418-426 |
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creator | Farisi, Muhammad Salman Al Hirano, Hideki Tanaka, Shuji |
description | The sealed cavity pressure of a micro-package often becomes the determining factor of the performance of an encapsulated micro-electro mechanical system (MEMS). In this study, a sealed cavity pressure evaluation method for a micro-package using a thin diaphragm is studied comprehensively. The sealed cavity pressure is identical to the surrounding pressure when the diaphragm separating both volumes becomes flat, i.e. zero-balance method. The zero-balance method has advantages to other techniques in terms of fabrication process simplicity and pressure evaluation range. Two approaches are introduced to reduce the impact of the residual stress, which typically exists in the conventionally used silicon-on-insulator (SOI) diaphragm. The introduction of a stress compensation layer was able to reduce the impact of the residual stress of SOI-based diaphragms. However, a significant hysteresis is developed on the diaphragm, which limits the precise measurement of a sealed cavity. On the other hand the residual stress can be avoided by the usage of intentionally tensile stressed boron doped Si diaphragm, which is produced by alkaline wet etching. Using such a diaphragm, a sealed cavity pressure of several Pa can be measured with a single digit Pa accuracy. [2020-0014] |
doi_str_mv | 10.1109/JMEMS.2020.2984229 |
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In this study, a sealed cavity pressure evaluation method for a micro-package using a thin diaphragm is studied comprehensively. The sealed cavity pressure is identical to the surrounding pressure when the diaphragm separating both volumes becomes flat, i.e. zero-balance method. The zero-balance method has advantages to other techniques in terms of fabrication process simplicity and pressure evaluation range. Two approaches are introduced to reduce the impact of the residual stress, which typically exists in the conventionally used silicon-on-insulator (SOI) diaphragm. The introduction of a stress compensation layer was able to reduce the impact of the residual stress of SOI-based diaphragms. However, a significant hysteresis is developed on the diaphragm, which limits the precise measurement of a sealed cavity. On the other hand the residual stress can be avoided by the usage of intentionally tensile stressed boron doped Si diaphragm, which is produced by alkaline wet etching. Using such a diaphragm, a sealed cavity pressure of several Pa can be measured with a single digit Pa accuracy. [2020-0014]</description><identifier>ISSN: 1057-7157</identifier><identifier>EISSN: 1941-0158</identifier><identifier>DOI: 10.1109/JMEMS.2020.2984229</identifier><identifier>CODEN: JMIYET</identifier><language>eng</language><publisher>New York: IEEE</publisher><subject>Atmosphere ; Atmospheric measurements ; Boron ; Cavity resonators ; Diaphragms (mechanics) ; evaluation system ; Fabrication ; Injection molding ; Mechanical systems ; MEMS packaging ; micro-electro mechanical system ; Microelectromechanical systems ; Micromechanical devices ; Pressure measurement ; Residual stress ; sealed cavity pressure ; Silicon ; SOI (semiconductors) ; vacuum sealing ; Zero-balance method</subject><ispartof>Journal of microelectromechanical systems, 2020-06, Vol.29 (3), p.418-426</ispartof><rights>Copyright The Institute of Electrical and Electronics Engineers, Inc. (IEEE) 2020</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c361t-31fe741814935ae13733f3295f81499ab9af069b48e2cb3ead5ba94e8b55a7d03</citedby><cites>FETCH-LOGICAL-c361t-31fe741814935ae13733f3295f81499ab9af069b48e2cb3ead5ba94e8b55a7d03</cites><orcidid>0000-0003-4870-9337 ; 0000-0002-1908-430X</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/9062343$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,780,784,796,27924,27925,54758</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/9062343$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Farisi, Muhammad Salman Al</creatorcontrib><creatorcontrib>Hirano, Hideki</creatorcontrib><creatorcontrib>Tanaka, Shuji</creatorcontrib><title>Zero-Balance Method for Evaluation of Sealed Cavity Pressure Down to Single Digit Pa Using Thin Silicon Diaphragm</title><title>Journal of microelectromechanical systems</title><addtitle>JMEMS</addtitle><description>The sealed cavity pressure of a micro-package often becomes the determining factor of the performance of an encapsulated micro-electro mechanical system (MEMS). In this study, a sealed cavity pressure evaluation method for a micro-package using a thin diaphragm is studied comprehensively. The sealed cavity pressure is identical to the surrounding pressure when the diaphragm separating both volumes becomes flat, i.e. zero-balance method. The zero-balance method has advantages to other techniques in terms of fabrication process simplicity and pressure evaluation range. Two approaches are introduced to reduce the impact of the residual stress, which typically exists in the conventionally used silicon-on-insulator (SOI) diaphragm. The introduction of a stress compensation layer was able to reduce the impact of the residual stress of SOI-based diaphragms. However, a significant hysteresis is developed on the diaphragm, which limits the precise measurement of a sealed cavity. On the other hand the residual stress can be avoided by the usage of intentionally tensile stressed boron doped Si diaphragm, which is produced by alkaline wet etching. Using such a diaphragm, a sealed cavity pressure of several Pa can be measured with a single digit Pa accuracy. [2020-0014]</description><subject>Atmosphere</subject><subject>Atmospheric measurements</subject><subject>Boron</subject><subject>Cavity resonators</subject><subject>Diaphragms (mechanics)</subject><subject>evaluation system</subject><subject>Fabrication</subject><subject>Injection molding</subject><subject>Mechanical systems</subject><subject>MEMS packaging</subject><subject>micro-electro mechanical system</subject><subject>Microelectromechanical systems</subject><subject>Micromechanical devices</subject><subject>Pressure measurement</subject><subject>Residual stress</subject><subject>sealed cavity pressure</subject><subject>Silicon</subject><subject>SOI (semiconductors)</subject><subject>vacuum sealing</subject><subject>Zero-balance method</subject><issn>1057-7157</issn><issn>1941-0158</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2020</creationdate><recordtype>article</recordtype><sourceid>RIE</sourceid><recordid>eNo9kFtPwkAQhRujiYj-AX3ZxOfi3nrZRwW8BSIJ8OJLMy1TWFK6sNti-PcuQnyamTNzziRfENwz2mOMqqfP8XA87XHKaY-rVHKuLoIOU5KFlEXppe9plIQJi5Lr4Ma5NaVMyjTuBLtvtCZ8gQrqAskYm5VZkNJYMtxD1UKjTU1MSaYIFS5IH_a6OZCJRedai2RgfmrSGDLV9bLyo17qhkyAzJ0XyGyla7-qdOFDBhq2KwvLzW1wVULl8O5cu8H8dTjrv4ejr7eP_vMoLETMmlCwEhPJUiaViACZSIQoBVdReZQU5ApKGqtcpsiLXCAsohyUxDSPIkgWVHSDx1Pu1ppdi67J1qa1tX-ZcUmVSBKqmL_ip6vCGucsltnW6g3YQ8ZodkSb_aHNjmizM1pvejiZNCL-GxSNuZBC_AJWtnS4</recordid><startdate>20200601</startdate><enddate>20200601</enddate><creator>Farisi, Muhammad Salman Al</creator><creator>Hirano, Hideki</creator><creator>Tanaka, Shuji</creator><general>IEEE</general><general>The Institute of Electrical and Electronics Engineers, Inc. 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In this study, a sealed cavity pressure evaluation method for a micro-package using a thin diaphragm is studied comprehensively. The sealed cavity pressure is identical to the surrounding pressure when the diaphragm separating both volumes becomes flat, i.e. zero-balance method. The zero-balance method has advantages to other techniques in terms of fabrication process simplicity and pressure evaluation range. Two approaches are introduced to reduce the impact of the residual stress, which typically exists in the conventionally used silicon-on-insulator (SOI) diaphragm. The introduction of a stress compensation layer was able to reduce the impact of the residual stress of SOI-based diaphragms. However, a significant hysteresis is developed on the diaphragm, which limits the precise measurement of a sealed cavity. On the other hand the residual stress can be avoided by the usage of intentionally tensile stressed boron doped Si diaphragm, which is produced by alkaline wet etching. Using such a diaphragm, a sealed cavity pressure of several Pa can be measured with a single digit Pa accuracy. [2020-0014]</abstract><cop>New York</cop><pub>IEEE</pub><doi>10.1109/JMEMS.2020.2984229</doi><tpages>9</tpages><orcidid>https://orcid.org/0000-0003-4870-9337</orcidid><orcidid>https://orcid.org/0000-0002-1908-430X</orcidid></addata></record> |
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subjects | Atmosphere Atmospheric measurements Boron Cavity resonators Diaphragms (mechanics) evaluation system Fabrication Injection molding Mechanical systems MEMS packaging micro-electro mechanical system Microelectromechanical systems Micromechanical devices Pressure measurement Residual stress sealed cavity pressure Silicon SOI (semiconductors) vacuum sealing Zero-balance method |
title | Zero-Balance Method for Evaluation of Sealed Cavity Pressure Down to Single Digit Pa Using Thin Silicon Diaphragm |
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