Optical Fiber-Based Confocal and Interferometric System for Measuring the Depth and Diameter of Through Silicon Vias

To measure the depth and diameter of through silicon vias simultaneously, a novel method based on spectral-domain interferometer and confocal microscope is proposed and realized. Most parts of the measurement system are constructed with optical fiber components for flexible configuration and easy al...

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Veröffentlicht in:Journal of lightwave technology 2016-12, Vol.34 (23), p.5462-5466
Hauptverfasser: Ahn, Heulbi, Park, Jungjae, Kim, Jong-Ahn, Jin, Jonghan
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Park, Jungjae
Kim, Jong-Ahn
Jin, Jonghan
description To measure the depth and diameter of through silicon vias simultaneously, a novel method based on spectral-domain interferometer and confocal microscope is proposed and realized. Most parts of the measurement system are constructed with optical fiber components for flexible configuration and easy alignment. According to the measurement results and performance evaluation, the mean values of the diameter and depth were 6.07 μm and 48.255 μm with the expanded uncertainties of 0.20 μm (k = 2) and 37 nm (k = 2), respectively.
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subjects Confocal microscopy
depth measurement
diameter measurement
Interference
Interferometers
Optical fibers
Optical interferometry
Optical reflection
Optical variables measurement
Semiconductor device measurement
Semiconductor devices
Through-silicon vias
title Optical Fiber-Based Confocal and Interferometric System for Measuring the Depth and Diameter of Through Silicon Vias
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