Waveguide microcavity based on photonic microstructures
A waveguide based microcavity exhibiting a quality factor Q/spl ap/2500 has been realized by incorporating a /spl lambda//4 phase shift into a 1-D photonic microstructure. The microstructure has an overall length of 3 μm, consists of a deeply etched grating with very narrow (75 nm) air-gaps and exhi...
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Veröffentlicht in: | IEEE photonics technology letters 1997-02, Vol.9 (2), p.176-178 |
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creator | Krauss, T.F. Vogele, B. Stanley, C.R. De La Rue, R.M. |
description | A waveguide based microcavity exhibiting a quality factor Q/spl ap/2500 has been realized by incorporating a /spl lambda//4 phase shift into a 1-D photonic microstructure. The microstructure has an overall length of 3 μm, consists of a deeply etched grating with very narrow (75 nm) air-gaps and exhibits a third-order stop band in the 800-900 nm wavelength regime. A comparison between measurement and simulation suggests that there is a thin (approximately 18 nm) skin of oxidized material at the etched semiconductor-air interfaces. |
doi_str_mv | 10.1109/68.553082 |
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The microstructure has an overall length of 3 μm, consists of a deeply etched grating with very narrow (75 nm) air-gaps and exhibits a third-order stop band in the 800-900 nm wavelength regime. A comparison between measurement and simulation suggests that there is a thin (approximately 18 nm) skin of oxidized material at the etched semiconductor-air interfaces.</description><identifier>ISSN: 1041-1135</identifier><identifier>EISSN: 1941-0174</identifier><identifier>DOI: 10.1109/68.553082</identifier><identifier>CODEN: IPTLEL</identifier><language>eng</language><publisher>IEEE</publisher><subject>Etching ; Gratings ; Microcavities ; Microstructure ; Optical materials ; Optical waveguides ; Semiconductor materials ; Semiconductor waveguides ; Surface waves ; Vertical cavity surface emitting lasers</subject><ispartof>IEEE photonics technology letters, 1997-02, Vol.9 (2), p.176-178</ispartof><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c277t-dc827f87190995cd0f83a7611c943d147da3c407b9790fe7f963adc3616110a33</citedby><cites>FETCH-LOGICAL-c277t-dc827f87190995cd0f83a7611c943d147da3c407b9790fe7f963adc3616110a33</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/553082$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,780,784,796,27915,27916,54749</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/553082$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Krauss, T.F.</creatorcontrib><creatorcontrib>Vogele, B.</creatorcontrib><creatorcontrib>Stanley, C.R.</creatorcontrib><creatorcontrib>De La Rue, R.M.</creatorcontrib><title>Waveguide microcavity based on photonic microstructures</title><title>IEEE photonics technology letters</title><addtitle>LPT</addtitle><description>A waveguide based microcavity exhibiting a quality factor Q/spl ap/2500 has been realized by incorporating a /spl lambda//4 phase shift into a 1-D photonic microstructure. The microstructure has an overall length of 3 μm, consists of a deeply etched grating with very narrow (75 nm) air-gaps and exhibits a third-order stop band in the 800-900 nm wavelength regime. A comparison between measurement and simulation suggests that there is a thin (approximately 18 nm) skin of oxidized material at the etched semiconductor-air interfaces.</description><subject>Etching</subject><subject>Gratings</subject><subject>Microcavities</subject><subject>Microstructure</subject><subject>Optical materials</subject><subject>Optical waveguides</subject><subject>Semiconductor materials</subject><subject>Semiconductor waveguides</subject><subject>Surface waves</subject><subject>Vertical cavity surface emitting lasers</subject><issn>1041-1135</issn><issn>1941-0174</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1997</creationdate><recordtype>article</recordtype><recordid>eNo90E1LAzEQBuAgCtbqwaunPQkets5skp3kKMUvKHhRPIY0yWqk7dZkt9B_75YtnuaFeRiGl7FrhBki6PtazaTkoKoTNkEtsAQkcTpkGDIil-fsIucfABSSiwmjT7sLX330oVhHl1pnd7HbF0ubgy_aTbH9brt2E924zV3qXdenkC_ZWWNXOVwd55R9PD2-z1_Kxdvz6_xhUbqKqCu9UxU1ilCD1tJ5aBS3VCM6LbhHQd5yJ4CWmjQ0gRpdc-sdr3EwYDmfstvx7ja1v33InVnH7MJqZTeh7bOpFElBEgZ4N8LDmzmFxmxTXNu0NwjmUI2plRmrGezNaGMI4d8dl382XV2j</recordid><startdate>199702</startdate><enddate>199702</enddate><creator>Krauss, T.F.</creator><creator>Vogele, B.</creator><creator>Stanley, C.R.</creator><creator>De La Rue, R.M.</creator><general>IEEE</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>199702</creationdate><title>Waveguide microcavity based on photonic microstructures</title><author>Krauss, T.F. ; Vogele, B. ; Stanley, C.R. ; De La Rue, R.M.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c277t-dc827f87190995cd0f83a7611c943d147da3c407b9790fe7f963adc3616110a33</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1997</creationdate><topic>Etching</topic><topic>Gratings</topic><topic>Microcavities</topic><topic>Microstructure</topic><topic>Optical materials</topic><topic>Optical waveguides</topic><topic>Semiconductor materials</topic><topic>Semiconductor waveguides</topic><topic>Surface waves</topic><topic>Vertical cavity surface emitting lasers</topic><toplevel>online_resources</toplevel><creatorcontrib>Krauss, T.F.</creatorcontrib><creatorcontrib>Vogele, B.</creatorcontrib><creatorcontrib>Stanley, C.R.</creatorcontrib><creatorcontrib>De La Rue, R.M.</creatorcontrib><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>IEEE photonics technology letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Krauss, T.F.</au><au>Vogele, B.</au><au>Stanley, C.R.</au><au>De La Rue, R.M.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Waveguide microcavity based on photonic microstructures</atitle><jtitle>IEEE photonics technology letters</jtitle><stitle>LPT</stitle><date>1997-02</date><risdate>1997</risdate><volume>9</volume><issue>2</issue><spage>176</spage><epage>178</epage><pages>176-178</pages><issn>1041-1135</issn><eissn>1941-0174</eissn><coden>IPTLEL</coden><abstract>A waveguide based microcavity exhibiting a quality factor Q/spl ap/2500 has been realized by incorporating a /spl lambda//4 phase shift into a 1-D photonic microstructure. The microstructure has an overall length of 3 μm, consists of a deeply etched grating with very narrow (75 nm) air-gaps and exhibits a third-order stop band in the 800-900 nm wavelength regime. A comparison between measurement and simulation suggests that there is a thin (approximately 18 nm) skin of oxidized material at the etched semiconductor-air interfaces.</abstract><pub>IEEE</pub><doi>10.1109/68.553082</doi><tpages>3</tpages></addata></record> |
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subjects | Etching Gratings Microcavities Microstructure Optical materials Optical waveguides Semiconductor materials Semiconductor waveguides Surface waves Vertical cavity surface emitting lasers |
title | Waveguide microcavity based on photonic microstructures |
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