Amorphous silicon pixel layers with cesium iodide converters for medical radiography

We describe the properties of evaporated layers of cesium iodide (thallium activated) deposited on substrates that enable easy coupling to amorphous silicon pixel arrays. The CsI(Tl) layers range in thickness from 65 to 220 /spl mu/m. We used the two-boat evaporator system to deposit CsI(Tl) layers....

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Veröffentlicht in:	IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States) 1994-08, Vol.41 (4), p.903-909
Hauptverfasser:	Jing, T., Goodman, C.A., Drewery, J., Cho, G., Hong, W.S., Lee, H., Kaplan, S.N., Mireshghi, A., Perez-Mendez, V., Wildermuth, D.
Format:	Artikel
Sprache:	eng
Schlagworte:	Amorphous silicon Annealing Biological and medical sciences BIOMEDICAL RADIOGRAPHY DESIGN DIAGNOSTIC TECHNIQUES Electrodes IMAGE INTENSIFIERS IMAGE PROCESSING Investigative techniques, diagnostic techniques (general aspects) Medical sciences MEDICINE Microstructure Miscellaneous. Technology NUCLEAR MEDICINE Optical arrays OPTIMIZATION P-i-n diodes PROCESSING Radiodiagnosis. Nmr imagery. Nmr spectrometry RADIOLOGY RADIOLOGY AND NUCLEAR MEDICINE RESOLUTION 550602 > Medicine-- External Radiation in Diagnostics-- (1980-) Solid scintillation detectors SPATIAL RESOLUTION Substrates Temperature X-ray detection
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