Submicron-trackwidth inductive/MR composite head

To explore the possibility for ultra-high areal density recording, submicron-trackwidth inductive-write/magnetoresistive-(MR)-read composite heads were fabricated. The focused ion beam etching technique was applied to fabricate a approximately 1- mu m-wide write-track completely aligned to the read-...

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Veröffentlicht in:IEEE transactions on magnetics 1991-11, Vol.27 (6), p.4678-4683
Hauptverfasser: Takano, H., Fukuoka, H., Suzuki, M., Shiiki, K., Kitada, M.
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container_end_page 4683
container_issue 6
container_start_page 4678
container_title IEEE transactions on magnetics
container_volume 27
creator Takano, H.
Fukuoka, H.
Suzuki, M.
Shiiki, K.
Kitada, M.
description To explore the possibility for ultra-high areal density recording, submicron-trackwidth inductive-write/magnetoresistive-(MR)-read composite heads were fabricated. The focused ion beam etching technique was applied to fabricate a approximately 1- mu m-wide write-track completely aligned to the read-region of the MR sensor. The write head using multilayered Fe-based alloy pole pieces with a saturation magnetization of 2.0 T revealed sufficient writability and excellent frequency response. A shunt-biased MR sensor having a narrow gap-length operated at a high current density over 3*10/sup 7/ A/cm/sup 2/ is developed to reproduce a sufficient signal amplitude at high linear-density regions. Recording tests were carried out on a thin-film medium with a head-medium clearance of 0.05 mu m. The output voltage per micron of trackwidth over 400 mu V with symmetrical pulses, and a -6-dB rolloff density of around 90 kFCI were measured. The design procedure, fabrication method, and recording performances of the submicron-trackwidth inductive/MR composite heads which can attain 2 gigabits recording are discussed.< >
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The focused ion beam etching technique was applied to fabricate a approximately 1- mu m-wide write-track completely aligned to the read-region of the MR sensor. The write head using multilayered Fe-based alloy pole pieces with a saturation magnetization of 2.0 T revealed sufficient writability and excellent frequency response. A shunt-biased MR sensor having a narrow gap-length operated at a high current density over 3*10/sup 7/ A/cm/sup 2/ is developed to reproduce a sufficient signal amplitude at high linear-density regions. Recording tests were carried out on a thin-film medium with a head-medium clearance of 0.05 mu m. The output voltage per micron of trackwidth over 400 mu V with symmetrical pulses, and a -6-dB rolloff density of around 90 kFCI were measured. 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subjects Applied sciences
Current density
Disk recording
Electronics
Etching
Exact sciences and technology
Frequency response
Ion beams
Magnetic heads
Magnetic sensors
Magnetoresistance
Miscellaneous
Pulse measurements
Saturation magnetization
Storage and reproduction of information
title Submicron-trackwidth inductive/MR composite head
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