The multi-peak point phenomenon of broadband microwave reflection caused by inhomogeneous plasma

During spacecraft re-entry, the challenge of measuring plasma sheath parameters directly contributes to difficulties in addressing communication blackout. In this work, we have discovered a phenomenon of multiple peaks in reflection data caused by the inhomogeneous plasma. Simulation results show th...

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Veröffentlicht in:	Plasma science & technology 2024-07, Vol.26 (7), p.75001
Hauptverfasser:	YANG, Min, QI, Kaixuan, YANG, Jiuwen, JIA, Sa, LIU, Haoyan, CHEN, Yanyang, LI, Jin, (李小平), Xiaoping LI
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Sprache:	eng
Schlagworte:	inhomogeneous plasma microwave reflection plasma sheath
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creator	YANG, Min QI, Kaixuan YANG, Jiuwen JIA, Sa LIU, Haoyan CHEN, Yanyang LI, Jin (李小平), Xiaoping LI
description	During spacecraft re-entry, the challenge of measuring plasma sheath parameters directly contributes to difficulties in addressing communication blackout. In this work, we have discovered a phenomenon of multiple peaks in reflection data caused by the inhomogeneous plasma. Simulation results show that the multi-peak points fade away as the characteristic frequency is approached, resembling a series of gradually decreasing peaks. The positions and quantities of these points are positively correlated with electron density, yet they show no relation to collision frequency. This phenomenon is of significant reference value for future studies on the spatial distribution of plasmas, particularly for using microwave reflection signals in diagnosing the plasma sheath.
doi_str_mv	10.1088/2058-6272/ad34ba
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In this work, we have discovered a phenomenon of multiple peaks in reflection data caused by the inhomogeneous plasma. Simulation results show that the multi-peak points fade away as the characteristic frequency is approached, resembling a series of gradually decreasing peaks. The positions and quantities of these points are positively correlated with electron density, yet they show no relation to collision frequency. 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This phenomenon is of significant reference value for future studies on the spatial distribution of plasmas, particularly for using microwave reflection signals in diagnosing the plasma sheath.</description><subject>inhomogeneous plasma</subject><subject>microwave reflection</subject><subject>plasma sheath</subject><issn>1009-0630</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2024</creationdate><recordtype>article</recordtype><recordid>eNp1kDtPwzAUhT2ARCnsjP4BhPqZOCOqeEmVWLIbP26oS2JHcQLqvydVWRmu7nLO0acPoTtKHihRasOIVEXJKrYxngtrLtCKElIXpOTkCl3nfCBEilrxFfpo9oD7uZtCMYD5wkMKccLDHmLql4s4tdiOyXhrosd9cGP6Md-AR2g7cFNYEs7MGTy2RxziPvXpEyKkOeOhM7k3N-iyNV2G27-_Rs3zU7N9LXbvL2_bx13hGOdTUdZcMdGCLSV3zLPS1sJDLZ21rhJUel-VFByvBK9axqinILkUSjhVc0L4GpHz7AKY80KnhzH0ZjxqSvRJij5J0Scp-ixlqdyfKyEN-pDmMS58_8d_AWD2Zwo</recordid><startdate>20240701</startdate><enddate>20240701</enddate><creator>YANG, Min</creator><creator>QI, Kaixuan</creator><creator>YANG, Jiuwen</creator><creator>JIA, Sa</creator><creator>LIU, Haoyan</creator><creator>CHEN, Yanyang</creator><creator>LI, Jin</creator><creator>(李小平), Xiaoping LI</creator><general>Plasma Science and Technology</general><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20240701</creationdate><title>The multi-peak point phenomenon of broadband microwave reflection caused by inhomogeneous plasma</title><author>YANG, Min ; QI, Kaixuan ; YANG, Jiuwen ; JIA, Sa ; LIU, Haoyan ; CHEN, Yanyang ; LI, Jin ; (李小平), Xiaoping LI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c233t-693824feb653c2d26b94de95cbbc7415dd761ec37437f221d1e535484c893003</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2024</creationdate><topic>inhomogeneous plasma</topic><topic>microwave reflection</topic><topic>plasma sheath</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>YANG, Min</creatorcontrib><creatorcontrib>QI, Kaixuan</creatorcontrib><creatorcontrib>YANG, Jiuwen</creatorcontrib><creatorcontrib>JIA, Sa</creatorcontrib><creatorcontrib>LIU, Haoyan</creatorcontrib><creatorcontrib>CHEN, Yanyang</creatorcontrib><creatorcontrib>LI, Jin</creatorcontrib><creatorcontrib>(李小平), Xiaoping LI</creatorcontrib><collection>CrossRef</collection><jtitle>Plasma science & technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>YANG, Min</au><au>QI, Kaixuan</au><au>YANG, Jiuwen</au><au>JIA, Sa</au><au>LIU, Haoyan</au><au>CHEN, Yanyang</au><au>LI, Jin</au><au>(李小平), Xiaoping LI</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>The multi-peak point phenomenon of broadband microwave reflection caused by inhomogeneous plasma</atitle><jtitle>Plasma science & technology</jtitle><addtitle>Plasma Sci. 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title	The multi-peak point phenomenon of broadband microwave reflection caused by inhomogeneous plasma
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