Effect of residual gas on structural, electrical and mechanical properties of niobium films deposited by magnetron sputtering deposition

Effect of residual gas on structural, electrical and mechanical properties of niobium films deposited by magnetron sputtering deposition

Magnetron sputtering is an important method in the superconducting thin films deposition. The residual gas inside the vacuum chamber will directly affect the quality of the superconducting films. In this paper, niobium films are deposited by magnetron sputtering under different chamber residual gas...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Materials research express 2018-04, Vol.5 (4), p.46410
Hauptverfasser: Wang, Lanruo, Zhong, Yuan, Li, Jinjin, Cao, Wenhui, Zhong, Qing, Wang, Xueshen, Li, Xu
Format: Artikel
Sprache:eng
Schlagworte:
magnetron sputtering
niobium film
residual gas analysis
ultra-high vacuum system
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue 4
container_start_page 46410
container_title Materials research express
container_volume 5
creator Wang, Lanruo
Zhong, Yuan
Li, Jinjin
Cao, Wenhui
Zhong, Qing
Wang, Xueshen
Li, Xu
description Magnetron sputtering is an important method in the superconducting thin films deposition. The residual gas inside the vacuum chamber will directly affect the quality of the superconducting films. In this paper, niobium films are deposited by magnetron sputtering under different chamber residual gas conditions. The influence of baking and sputtering process on residual gas are studied as well. Surface morphology, electrical and mechanical properties of the films are analysed. The residual gas analysis result before the sputtering process could be regarded as a reference condition to achieve high quality superconducting thin films.
doi_str_mv 10.1088/2053-1591/aab8c1
format Article
fullrecord <record><control><sourceid>iop_cross</sourceid><recordid>TN_cdi_crossref_primary_10_1088_2053_1591_aab8c1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>mrxaab8c1</sourcerecordid><originalsourceid>FETCH-LOGICAL-c311t-4178bc3ec75c398f875260ab76cfcc8f75e8e6d3293e5e2a9e0f6a03412168093</originalsourceid><addsrcrecordid>eNp9kD9PwzAQxS0EElXpzuiJqaF2nD_OiKpCkSqxwGw5zrm4SuzIdiT6DfjYJBQQA2K6O997T-cfQteU3FLC-SolOUtoXtGVlDVX9AzNfp7Of_WXaBHCgRCSlhXL02KG3jdag4rYaewhmGaQLd7LgJ3FIfpBxcHLdomhHUXeqHErbYM7UK_Sfo69dz34aCBMGda42gwd1qbtAm6gd8FEaHB9xJ3cW4h-Cu6HGMEbu_9WGGev0IWWbYDFV52jl_vN83qb7J4eHtd3u0QxSmOS0ZLXioEqc8Uqrnk5foPIuiyUVorrMgcORcPSikEOqayA6EISltGUFpxUbI7IKVd5F4IHLXpvOumPghIxwRQTLTHREieYo2V5shjXi4MbvB0P_E9-84e8828iF5kgWZGN1r7R7APOGIZn</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Effect of residual gas on structural, electrical and mechanical properties of niobium films deposited by magnetron sputtering deposition</title><source>IOP Publishing Journals</source><source>IOPscience extra</source><source>Institute of Physics (IOP) Journals - HEAL-Link</source><creator>Wang, Lanruo ; Zhong, Yuan ; Li, Jinjin ; Cao, Wenhui ; Zhong, Qing ; Wang, Xueshen ; Li, Xu</creator><creatorcontrib>Wang, Lanruo ; Zhong, Yuan ; Li, Jinjin ; Cao, Wenhui ; Zhong, Qing ; Wang, Xueshen ; Li, Xu</creatorcontrib><description>Magnetron sputtering is an important method in the superconducting thin films deposition. The residual gas inside the vacuum chamber will directly affect the quality of the superconducting films. In this paper, niobium films are deposited by magnetron sputtering under different chamber residual gas conditions. The influence of baking and sputtering process on residual gas are studied as well. Surface morphology, electrical and mechanical properties of the films are analysed. The residual gas analysis result before the sputtering process could be regarded as a reference condition to achieve high quality superconducting thin films.</description><identifier>ISSN: 2053-1591</identifier><identifier>EISSN: 2053-1591</identifier><identifier>DOI: 10.1088/2053-1591/aab8c1</identifier><language>eng</language><publisher>IOP Publishing</publisher><subject>magnetron sputtering ; niobium film ; residual gas analysis ; ultra-high vacuum system</subject><ispartof>Materials research express, 2018-04, Vol.5 (4), p.46410</ispartof><rights>2018 IOP Publishing Ltd</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c311t-4178bc3ec75c398f875260ab76cfcc8f75e8e6d3293e5e2a9e0f6a03412168093</citedby><cites>FETCH-LOGICAL-c311t-4178bc3ec75c398f875260ab76cfcc8f75e8e6d3293e5e2a9e0f6a03412168093</cites><orcidid>0000-0002-6984-8013</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://iopscience.iop.org/article/10.1088/2053-1591/aab8c1/pdf$$EPDF$$P50$$Giop$$H</linktopdf><link.rule.ids>314,776,780,27901,27902,38845,53815,53821,53868</link.rule.ids></links><search><creatorcontrib>Wang, Lanruo</creatorcontrib><creatorcontrib>Zhong, Yuan</creatorcontrib><creatorcontrib>Li, Jinjin</creatorcontrib><creatorcontrib>Cao, Wenhui</creatorcontrib><creatorcontrib>Zhong, Qing</creatorcontrib><creatorcontrib>Wang, Xueshen</creatorcontrib><creatorcontrib>Li, Xu</creatorcontrib><title>Effect of residual gas on structural, electrical and mechanical properties of niobium films deposited by magnetron sputtering deposition</title><title>Materials research express</title><addtitle>MRX</addtitle><addtitle>Mater. Res. Express</addtitle><description>Magnetron sputtering is an important method in the superconducting thin films deposition. The residual gas inside the vacuum chamber will directly affect the quality of the superconducting films. In this paper, niobium films are deposited by magnetron sputtering under different chamber residual gas conditions. The influence of baking and sputtering process on residual gas are studied as well. Surface morphology, electrical and mechanical properties of the films are analysed. The residual gas analysis result before the sputtering process could be regarded as a reference condition to achieve high quality superconducting thin films.</description><subject>magnetron sputtering</subject><subject>niobium film</subject><subject>residual gas analysis</subject><subject>ultra-high vacuum system</subject><issn>2053-1591</issn><issn>2053-1591</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2018</creationdate><recordtype>article</recordtype><recordid>eNp9kD9PwzAQxS0EElXpzuiJqaF2nD_OiKpCkSqxwGw5zrm4SuzIdiT6DfjYJBQQA2K6O997T-cfQteU3FLC-SolOUtoXtGVlDVX9AzNfp7Of_WXaBHCgRCSlhXL02KG3jdag4rYaewhmGaQLd7LgJ3FIfpBxcHLdomhHUXeqHErbYM7UK_Sfo69dz34aCBMGda42gwd1qbtAm6gd8FEaHB9xJ3cW4h-Cu6HGMEbu_9WGGev0IWWbYDFV52jl_vN83qb7J4eHtd3u0QxSmOS0ZLXioEqc8Uqrnk5foPIuiyUVorrMgcORcPSikEOqayA6EISltGUFpxUbI7IKVd5F4IHLXpvOumPghIxwRQTLTHREieYo2V5shjXi4MbvB0P_E9-84e8828iF5kgWZGN1r7R7APOGIZn</recordid><startdate>20180418</startdate><enddate>20180418</enddate><creator>Wang, Lanruo</creator><creator>Zhong, Yuan</creator><creator>Li, Jinjin</creator><creator>Cao, Wenhui</creator><creator>Zhong, Qing</creator><creator>Wang, Xueshen</creator><creator>Li, Xu</creator><general>IOP Publishing</general><scope>AAYXX</scope><scope>CITATION</scope><orcidid>https://orcid.org/0000-0002-6984-8013</orcidid></search><sort><creationdate>20180418</creationdate><title>Effect of residual gas on structural, electrical and mechanical properties of niobium films deposited by magnetron sputtering deposition</title><author>Wang, Lanruo ; Zhong, Yuan ; Li, Jinjin ; Cao, Wenhui ; Zhong, Qing ; Wang, Xueshen ; Li, Xu</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c311t-4178bc3ec75c398f875260ab76cfcc8f75e8e6d3293e5e2a9e0f6a03412168093</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2018</creationdate><topic>magnetron sputtering</topic><topic>niobium film</topic><topic>residual gas analysis</topic><topic>ultra-high vacuum system</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Wang, Lanruo</creatorcontrib><creatorcontrib>Zhong, Yuan</creatorcontrib><creatorcontrib>Li, Jinjin</creatorcontrib><creatorcontrib>Cao, Wenhui</creatorcontrib><creatorcontrib>Zhong, Qing</creatorcontrib><creatorcontrib>Wang, Xueshen</creatorcontrib><creatorcontrib>Li, Xu</creatorcontrib><collection>CrossRef</collection><jtitle>Materials research express</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Wang, Lanruo</au><au>Zhong, Yuan</au><au>Li, Jinjin</au><au>Cao, Wenhui</au><au>Zhong, Qing</au><au>Wang, Xueshen</au><au>Li, Xu</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Effect of residual gas on structural, electrical and mechanical properties of niobium films deposited by magnetron sputtering deposition</atitle><jtitle>Materials research express</jtitle><stitle>MRX</stitle><addtitle>Mater. Res. Express</addtitle><date>2018-04-18</date><risdate>2018</risdate><volume>5</volume><issue>4</issue><spage>46410</spage><pages>46410-</pages><issn>2053-1591</issn><eissn>2053-1591</eissn><abstract>Magnetron sputtering is an important method in the superconducting thin films deposition. The residual gas inside the vacuum chamber will directly affect the quality of the superconducting films. In this paper, niobium films are deposited by magnetron sputtering under different chamber residual gas conditions. The influence of baking and sputtering process on residual gas are studied as well. Surface morphology, electrical and mechanical properties of the films are analysed. The residual gas analysis result before the sputtering process could be regarded as a reference condition to achieve high quality superconducting thin films.</abstract><pub>IOP Publishing</pub><doi>10.1088/2053-1591/aab8c1</doi><tpages>8</tpages><orcidid>https://orcid.org/0000-0002-6984-8013</orcidid></addata></record>
fulltext fulltext
identifier ISSN: 2053-1591
ispartof Materials research express, 2018-04, Vol.5 (4), p.46410
issn 2053-1591
2053-1591
language eng
recordid cdi_crossref_primary_10_1088_2053_1591_aab8c1
source IOP Publishing Journals; IOPscience extra; Institute of Physics (IOP) Journals - HEAL-Link
subjects magnetron sputtering
niobium film
residual gas analysis
ultra-high vacuum system
title Effect of residual gas on structural, electrical and mechanical properties of niobium films deposited by magnetron sputtering deposition
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-03T07%3A28%3A03IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-iop_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Effect%20of%20residual%20gas%20on%20structural,%20electrical%20and%20mechanical%20properties%20of%20niobium%20films%20deposited%20by%20magnetron%20sputtering%20deposition&rft.jtitle=Materials%20research%20express&rft.au=Wang,%20Lanruo&rft.date=2018-04-18&rft.volume=5&rft.issue=4&rft.spage=46410&rft.pages=46410-&rft.issn=2053-1591&rft.eissn=2053-1591&rft_id=info:doi/10.1088/2053-1591/aab8c1&rft_dat=%3Ciop_cross%3Emrxaab8c1%3C/iop_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true