Terahertz dielectric properties of Fe 3 O 4 thin films deposited on Si (100) substrate

Fe 3 O 4 is considered to be a promising material for terahertz spintronic applications as well as for stealth technology. However, the optical properties of Fe 3 O 4 in the thin film form at terahertz frequencies are not reported in literature. In this article, we present the frequency and temperat...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Semiconductor science and technology 2024-02, Vol.39 (2), p.25009
Hauptverfasser: Khandelwal, Ashish, Sharath Chandra, L S, Sharma, Shilpam, Sagdeo, Archna, Choudhary, R J, Chattopadhyay, M K
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue 2
container_start_page 25009
container_title Semiconductor science and technology
container_volume 39
creator Khandelwal, Ashish
Sharath Chandra, L S
Sharma, Shilpam
Sagdeo, Archna
Choudhary, R J
Chattopadhyay, M K
description Fe 3 O 4 is considered to be a promising material for terahertz spintronic applications as well as for stealth technology. However, the optical properties of Fe 3 O 4 in the thin film form at terahertz frequencies are not reported in literature. In this article, we present the frequency and temperature dependence of dielectric permittivity ( ε 1 ) and optical conductivity ( σ 1 ) of Fe 3 O 4 films deposited on Si substrate. The σ 1 of these films show absorption peaks related to charge localization and shallow impurities. It is also observed that the Fe 2 O 3 /Fe 3 O 4 composite films have large σ 1 and ε 1 indicating their potential use for stealth technology applications. The overall optical properties are found to depend strongly on the microstructure and defects, such as, the grain size and the presence of grain boundaries, anti-phase boundaries, strain disorder due to lattice mismatch and/or the Fe +2 /Fe +3 ratio.
doi_str_mv 10.1088/1361-6641/ad1cca
format Article
fullrecord <record><control><sourceid>crossref</sourceid><recordid>TN_cdi_crossref_primary_10_1088_1361_6641_ad1cca</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_1088_1361_6641_ad1cca</sourcerecordid><originalsourceid>FETCH-crossref_primary_10_1088_1361_6641_ad1cca3</originalsourceid><addsrcrecordid>eNqdzkFrwkAQhuFFKpiqd49zbA_RmSSE3EXprYeK12XdTHAlumFmPbS_3oaW_oCePnjhg8eYFeGasGk2VNaU13VFG9eS925isr_0ZDIs6ianoipm5ln1gkjUlJiZ44HFnVnSF7SBe_ZJgodB4vDdAivEDvYMJbxDBekcbtCF_qrQ8hA1JG4h3uAjwAshvoLeT5rEJV6Yaed65eXvzg3ud4ftW-4lqgp3dpBwdfJpCe3otyPWjlj74y__cXkAxexN4A</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Terahertz dielectric properties of Fe 3 O 4 thin films deposited on Si (100) substrate</title><source>IOP Publishing Journals</source><source>Institute of Physics (IOP) Journals - HEAL-Link</source><creator>Khandelwal, Ashish ; Sharath Chandra, L S ; Sharma, Shilpam ; Sagdeo, Archna ; Choudhary, R J ; Chattopadhyay, M K</creator><creatorcontrib>Khandelwal, Ashish ; Sharath Chandra, L S ; Sharma, Shilpam ; Sagdeo, Archna ; Choudhary, R J ; Chattopadhyay, M K</creatorcontrib><description>Fe 3 O 4 is considered to be a promising material for terahertz spintronic applications as well as for stealth technology. However, the optical properties of Fe 3 O 4 in the thin film form at terahertz frequencies are not reported in literature. In this article, we present the frequency and temperature dependence of dielectric permittivity ( ε 1 ) and optical conductivity ( σ 1 ) of Fe 3 O 4 films deposited on Si substrate. The σ 1 of these films show absorption peaks related to charge localization and shallow impurities. It is also observed that the Fe 2 O 3 /Fe 3 O 4 composite films have large σ 1 and ε 1 indicating their potential use for stealth technology applications. The overall optical properties are found to depend strongly on the microstructure and defects, such as, the grain size and the presence of grain boundaries, anti-phase boundaries, strain disorder due to lattice mismatch and/or the Fe +2 /Fe +3 ratio.</description><identifier>ISSN: 0268-1242</identifier><identifier>EISSN: 1361-6641</identifier><identifier>DOI: 10.1088/1361-6641/ad1cca</identifier><language>eng</language><ispartof>Semiconductor science and technology, 2024-02, Vol.39 (2), p.25009</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><cites>FETCH-crossref_primary_10_1088_1361_6641_ad1cca3</cites><orcidid>0000-0002-1176-4490 ; 0000-0001-8687-8188 ; 0000-0001-9961-1650 ; 0000-0001-7199-0433 ; 0000-0002-1253-6035</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,27901,27902</link.rule.ids></links><search><creatorcontrib>Khandelwal, Ashish</creatorcontrib><creatorcontrib>Sharath Chandra, L S</creatorcontrib><creatorcontrib>Sharma, Shilpam</creatorcontrib><creatorcontrib>Sagdeo, Archna</creatorcontrib><creatorcontrib>Choudhary, R J</creatorcontrib><creatorcontrib>Chattopadhyay, M K</creatorcontrib><title>Terahertz dielectric properties of Fe 3 O 4 thin films deposited on Si (100) substrate</title><title>Semiconductor science and technology</title><description>Fe 3 O 4 is considered to be a promising material for terahertz spintronic applications as well as for stealth technology. However, the optical properties of Fe 3 O 4 in the thin film form at terahertz frequencies are not reported in literature. In this article, we present the frequency and temperature dependence of dielectric permittivity ( ε 1 ) and optical conductivity ( σ 1 ) of Fe 3 O 4 films deposited on Si substrate. The σ 1 of these films show absorption peaks related to charge localization and shallow impurities. It is also observed that the Fe 2 O 3 /Fe 3 O 4 composite films have large σ 1 and ε 1 indicating their potential use for stealth technology applications. The overall optical properties are found to depend strongly on the microstructure and defects, such as, the grain size and the presence of grain boundaries, anti-phase boundaries, strain disorder due to lattice mismatch and/or the Fe +2 /Fe +3 ratio.</description><issn>0268-1242</issn><issn>1361-6641</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2024</creationdate><recordtype>article</recordtype><recordid>eNqdzkFrwkAQhuFFKpiqd49zbA_RmSSE3EXprYeK12XdTHAlumFmPbS_3oaW_oCePnjhg8eYFeGasGk2VNaU13VFG9eS925isr_0ZDIs6ianoipm5ln1gkjUlJiZ44HFnVnSF7SBe_ZJgodB4vDdAivEDvYMJbxDBekcbtCF_qrQ8hA1JG4h3uAjwAshvoLeT5rEJV6Yaed65eXvzg3ud4ftW-4lqgp3dpBwdfJpCe3otyPWjlj74y__cXkAxexN4A</recordid><startdate>20240201</startdate><enddate>20240201</enddate><creator>Khandelwal, Ashish</creator><creator>Sharath Chandra, L S</creator><creator>Sharma, Shilpam</creator><creator>Sagdeo, Archna</creator><creator>Choudhary, R J</creator><creator>Chattopadhyay, M K</creator><scope>AAYXX</scope><scope>CITATION</scope><orcidid>https://orcid.org/0000-0002-1176-4490</orcidid><orcidid>https://orcid.org/0000-0001-8687-8188</orcidid><orcidid>https://orcid.org/0000-0001-9961-1650</orcidid><orcidid>https://orcid.org/0000-0001-7199-0433</orcidid><orcidid>https://orcid.org/0000-0002-1253-6035</orcidid></search><sort><creationdate>20240201</creationdate><title>Terahertz dielectric properties of Fe 3 O 4 thin films deposited on Si (100) substrate</title><author>Khandelwal, Ashish ; Sharath Chandra, L S ; Sharma, Shilpam ; Sagdeo, Archna ; Choudhary, R J ; Chattopadhyay, M K</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-crossref_primary_10_1088_1361_6641_ad1cca3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2024</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Khandelwal, Ashish</creatorcontrib><creatorcontrib>Sharath Chandra, L S</creatorcontrib><creatorcontrib>Sharma, Shilpam</creatorcontrib><creatorcontrib>Sagdeo, Archna</creatorcontrib><creatorcontrib>Choudhary, R J</creatorcontrib><creatorcontrib>Chattopadhyay, M K</creatorcontrib><collection>CrossRef</collection><jtitle>Semiconductor science and technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Khandelwal, Ashish</au><au>Sharath Chandra, L S</au><au>Sharma, Shilpam</au><au>Sagdeo, Archna</au><au>Choudhary, R J</au><au>Chattopadhyay, M K</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Terahertz dielectric properties of Fe 3 O 4 thin films deposited on Si (100) substrate</atitle><jtitle>Semiconductor science and technology</jtitle><date>2024-02-01</date><risdate>2024</risdate><volume>39</volume><issue>2</issue><spage>25009</spage><pages>25009-</pages><issn>0268-1242</issn><eissn>1361-6641</eissn><abstract>Fe 3 O 4 is considered to be a promising material for terahertz spintronic applications as well as for stealth technology. However, the optical properties of Fe 3 O 4 in the thin film form at terahertz frequencies are not reported in literature. In this article, we present the frequency and temperature dependence of dielectric permittivity ( ε 1 ) and optical conductivity ( σ 1 ) of Fe 3 O 4 films deposited on Si substrate. The σ 1 of these films show absorption peaks related to charge localization and shallow impurities. It is also observed that the Fe 2 O 3 /Fe 3 O 4 composite films have large σ 1 and ε 1 indicating their potential use for stealth technology applications. The overall optical properties are found to depend strongly on the microstructure and defects, such as, the grain size and the presence of grain boundaries, anti-phase boundaries, strain disorder due to lattice mismatch and/or the Fe +2 /Fe +3 ratio.</abstract><doi>10.1088/1361-6641/ad1cca</doi><orcidid>https://orcid.org/0000-0002-1176-4490</orcidid><orcidid>https://orcid.org/0000-0001-8687-8188</orcidid><orcidid>https://orcid.org/0000-0001-9961-1650</orcidid><orcidid>https://orcid.org/0000-0001-7199-0433</orcidid><orcidid>https://orcid.org/0000-0002-1253-6035</orcidid></addata></record>
fulltext fulltext
identifier ISSN: 0268-1242
ispartof Semiconductor science and technology, 2024-02, Vol.39 (2), p.25009
issn 0268-1242
1361-6641
language eng
recordid cdi_crossref_primary_10_1088_1361_6641_ad1cca
source IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link
title Terahertz dielectric properties of Fe 3 O 4 thin films deposited on Si (100) substrate
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-05T11%3A27%3A27IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-crossref&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Terahertz%20dielectric%20properties%20of%20Fe%203%20O%204%20thin%20films%20deposited%20on%20Si%20(100)%20substrate&rft.jtitle=Semiconductor%20science%20and%20technology&rft.au=Khandelwal,%20Ashish&rft.date=2024-02-01&rft.volume=39&rft.issue=2&rft.spage=25009&rft.pages=25009-&rft.issn=0268-1242&rft.eissn=1361-6641&rft_id=info:doi/10.1088/1361-6641/ad1cca&rft_dat=%3Ccrossref%3E10_1088_1361_6641_ad1cca%3C/crossref%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true