Metastable argon atom kinetics in a low-pressure capacitively coupled radio frequency discharge
The kinetics of excited atoms in a low-pressure argon capacitively coupled plasma source are investigated by an extended particle-in-cell/Monte Carlo Collisions simulation code coupled with a diffusion-reaction-radiation code which considers a large number of excited states of Ar atoms. The spatial...
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| Veröffentlicht in: | Plasma sources science & technology 2023-06, Vol.32 (6), p.65002 |
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| creator | Donkó, Zoltán Hartmann, Peter Korolov, Ihor Schulenberg, David Rohr, Stefan Rauf, Shahid Schulze, Julian |
| description | The kinetics of excited atoms in a low-pressure argon capacitively coupled plasma source are investigated by an extended particle-in-cell/Monte Carlo Collisions simulation code coupled with a diffusion-reaction-radiation code which considers a large number of excited states of Ar atoms. The spatial density distribution of Ar atoms in the 1s
5
state within the electrode gap and the gas temperature are also determined experimentally using tunable diode laser absorption spectroscopy. Processes involving the excited states, especially the four lower-lying 1s states are found to have significant effects on the ionization balance of the discharge. The level of agreement achieved between the computational and experimental results indicates that the discharge model is reasonably accurate and the computations based on this model allow the identification of the populating and de-populating processes of the excited states. |
| doi_str_mv | 10.1088/1361-6595/acd6b5 |
| format | Article |
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5
state within the electrode gap and the gas temperature are also determined experimentally using tunable diode laser absorption spectroscopy. Processes involving the excited states, especially the four lower-lying 1s states are found to have significant effects on the ionization balance of the discharge. The level of agreement achieved between the computational and experimental results indicates that the discharge model is reasonably accurate and the computations based on this model allow the identification of the populating and de-populating processes of the excited states.</description><identifier>ISSN: 0963-0252</identifier><identifier>EISSN: 1361-6595</identifier><identifier>DOI: 10.1088/1361-6595/acd6b5</identifier><identifier>CODEN: PSTEEU</identifier><language>eng</language><publisher>IOP Publishing</publisher><subject>CCP ; metastable atoms ; PIC/MCC-fluid hybrid simulation ; TDLAS measurement</subject><ispartof>Plasma sources science & technology, 2023-06, Vol.32 (6), p.65002</ispartof><rights>2023 The Author(s). Published by IOP Publishing Ltd</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c355t-2db33518958bc6b9f9d81e9ee5d962f8ab5655585e9d355fc233de0972c759a93</citedby><cites>FETCH-LOGICAL-c355t-2db33518958bc6b9f9d81e9ee5d962f8ab5655585e9d355fc233de0972c759a93</cites><orcidid>0000-0002-4086-8678 ; 0000-0003-2384-1243 ; 0000-0003-1369-6150 ; 0000-0001-7929-5734 ; 0000-0003-3572-1310 ; 0000-0001-5689-6115</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://iopscience.iop.org/article/10.1088/1361-6595/acd6b5/pdf$$EPDF$$P50$$Giop$$Hfree_for_read</linktopdf><link.rule.ids>314,776,780,27901,27902,53821,53868</link.rule.ids></links><search><creatorcontrib>Donkó, Zoltán</creatorcontrib><creatorcontrib>Hartmann, Peter</creatorcontrib><creatorcontrib>Korolov, Ihor</creatorcontrib><creatorcontrib>Schulenberg, David</creatorcontrib><creatorcontrib>Rohr, Stefan</creatorcontrib><creatorcontrib>Rauf, Shahid</creatorcontrib><creatorcontrib>Schulze, Julian</creatorcontrib><title>Metastable argon atom kinetics in a low-pressure capacitively coupled radio frequency discharge</title><title>Plasma sources science & technology</title><addtitle>PSST</addtitle><addtitle>Plasma Sources Sci. Technol</addtitle><description>The kinetics of excited atoms in a low-pressure argon capacitively coupled plasma source are investigated by an extended particle-in-cell/Monte Carlo Collisions simulation code coupled with a diffusion-reaction-radiation code which considers a large number of excited states of Ar atoms. The spatial density distribution of Ar atoms in the 1s
5
state within the electrode gap and the gas temperature are also determined experimentally using tunable diode laser absorption spectroscopy. Processes involving the excited states, especially the four lower-lying 1s states are found to have significant effects on the ionization balance of the discharge. The level of agreement achieved between the computational and experimental results indicates that the discharge model is reasonably accurate and the computations based on this model allow the identification of the populating and de-populating processes of the excited states.</description><subject>CCP</subject><subject>metastable atoms</subject><subject>PIC/MCC-fluid hybrid simulation</subject><subject>TDLAS measurement</subject><issn>0963-0252</issn><issn>1361-6595</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2023</creationdate><recordtype>article</recordtype><sourceid>O3W</sourceid><recordid>eNp1kEtLAzEUhYMoWKt7l1m6cGwe3DRZSvEFFTe6DpnkjqZOmzGZUfrvnVJxpasLh_MdLh8h55xdcab1jEvFKwUGZs4HVcMBmfxGh2TCjJIVEyCOyUkpK8Y412I-IfYRe1d6V7dIXX5NG-r6tKbvcYN99IXGMaBt-qq6jKUMGal3nfOxj5_YbqlPQ9dioNmFmGiT8WPAjd_SEIt_G_fwlBw1ri149nOn5OX25nlxXy2f7h4W18vKS4C-EqGWErg2oGuvatOYoDkaRAhGiUa7GhQAaEATRqDxQsqAzMyFn4NxRk4J2-_6nErJ2Ngux7XLW8uZ3QmyOxt2Z8PuBY3IxR6JqbOrNOTN-KDtSumtFFZZpoAxYbvQjNXLP6r_Ln8DRjV3FQ</recordid><startdate>20230601</startdate><enddate>20230601</enddate><creator>Donkó, Zoltán</creator><creator>Hartmann, Peter</creator><creator>Korolov, Ihor</creator><creator>Schulenberg, David</creator><creator>Rohr, Stefan</creator><creator>Rauf, Shahid</creator><creator>Schulze, Julian</creator><general>IOP Publishing</general><scope>O3W</scope><scope>TSCCA</scope><scope>AAYXX</scope><scope>CITATION</scope><orcidid>https://orcid.org/0000-0002-4086-8678</orcidid><orcidid>https://orcid.org/0000-0003-2384-1243</orcidid><orcidid>https://orcid.org/0000-0003-1369-6150</orcidid><orcidid>https://orcid.org/0000-0001-7929-5734</orcidid><orcidid>https://orcid.org/0000-0003-3572-1310</orcidid><orcidid>https://orcid.org/0000-0001-5689-6115</orcidid></search><sort><creationdate>20230601</creationdate><title>Metastable argon atom kinetics in a low-pressure capacitively coupled radio frequency discharge</title><author>Donkó, Zoltán ; Hartmann, Peter ; Korolov, Ihor ; Schulenberg, David ; Rohr, Stefan ; Rauf, Shahid ; Schulze, Julian</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c355t-2db33518958bc6b9f9d81e9ee5d962f8ab5655585e9d355fc233de0972c759a93</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2023</creationdate><topic>CCP</topic><topic>metastable atoms</topic><topic>PIC/MCC-fluid hybrid simulation</topic><topic>TDLAS measurement</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Donkó, Zoltán</creatorcontrib><creatorcontrib>Hartmann, Peter</creatorcontrib><creatorcontrib>Korolov, Ihor</creatorcontrib><creatorcontrib>Schulenberg, David</creatorcontrib><creatorcontrib>Rohr, Stefan</creatorcontrib><creatorcontrib>Rauf, Shahid</creatorcontrib><creatorcontrib>Schulze, Julian</creatorcontrib><collection>IOP Publishing Free Content</collection><collection>IOPscience (Open Access)</collection><collection>CrossRef</collection><jtitle>Plasma sources science & technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Donkó, Zoltán</au><au>Hartmann, Peter</au><au>Korolov, Ihor</au><au>Schulenberg, David</au><au>Rohr, Stefan</au><au>Rauf, Shahid</au><au>Schulze, Julian</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Metastable argon atom kinetics in a low-pressure capacitively coupled radio frequency discharge</atitle><jtitle>Plasma sources science & technology</jtitle><stitle>PSST</stitle><addtitle>Plasma Sources Sci. Technol</addtitle><date>2023-06-01</date><risdate>2023</risdate><volume>32</volume><issue>6</issue><spage>65002</spage><pages>65002-</pages><issn>0963-0252</issn><eissn>1361-6595</eissn><coden>PSTEEU</coden><abstract>The kinetics of excited atoms in a low-pressure argon capacitively coupled plasma source are investigated by an extended particle-in-cell/Monte Carlo Collisions simulation code coupled with a diffusion-reaction-radiation code which considers a large number of excited states of Ar atoms. The spatial density distribution of Ar atoms in the 1s
5
state within the electrode gap and the gas temperature are also determined experimentally using tunable diode laser absorption spectroscopy. Processes involving the excited states, especially the four lower-lying 1s states are found to have significant effects on the ionization balance of the discharge. The level of agreement achieved between the computational and experimental results indicates that the discharge model is reasonably accurate and the computations based on this model allow the identification of the populating and de-populating processes of the excited states.</abstract><pub>IOP Publishing</pub><doi>10.1088/1361-6595/acd6b5</doi><tpages>16</tpages><orcidid>https://orcid.org/0000-0002-4086-8678</orcidid><orcidid>https://orcid.org/0000-0003-2384-1243</orcidid><orcidid>https://orcid.org/0000-0003-1369-6150</orcidid><orcidid>https://orcid.org/0000-0001-7929-5734</orcidid><orcidid>https://orcid.org/0000-0003-3572-1310</orcidid><orcidid>https://orcid.org/0000-0001-5689-6115</orcidid><oa>free_for_read</oa></addata></record> |
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| source | IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link |
| subjects | CCP metastable atoms PIC/MCC-fluid hybrid simulation TDLAS measurement |
| title | Metastable argon atom kinetics in a low-pressure capacitively coupled radio frequency discharge |
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