High efficient plasma generation in an inductively coupled plasma using a passive resonant antenna

We developed a high efficiency plasma source in an inductively coupled discharge using a passive resonant antenna, which has the advantage that it could be retro-fitted to existing reactors with minimal change to the reactor. At the resonance, the source has a larger total equivalent resistance that...

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Veröffentlicht in:	Plasma sources science & technology 2019-10, Vol.28 (10), p.105018
Hauptverfasser:	Kim, Ju-Ho, Hong, Young-Hun, Chung, Chin-Wook
Format:	Artikel
Sprache:	eng
Schlagworte:	high efficient discharge inductively coupled plasma source plasma density resonant antenna
Online-Zugang:	Volltext
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