Highly dispersed Co deposited on Al 2 O 3 particles via CoCp 2  + H 2 ALD

Highly dispersed cobalt atoms were deposited on porous alumina particles using atomic layer deposition (ALD) with a CoCp /H chemistry at approximately 7 wt%. H did not completely reduce the cyclopentadienyl organic ligands bound to deposited Co atoms at ALD reaction conditions. A sharp decline in Co...

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Veröffentlicht in:	Nanotechnology 2020-04, Vol.31 (17), p.175703
Hauptverfasser:	Clary, Jacob M, Van Norman, Staci A, Funke, Hans H, Su, Dong, Musgrave, Charles B, Weimer, Alan W
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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