Atomic scale smoothing of nanoscale quartz mold using amorphous carbon films

Surface roughness control of end products is increasingly becoming significant, especially with the miniaturization trends in the semiconductor industry. Ultra-thin amorphous carbon (a-C) films offer a prime solution to optimize surface roughness due to their outstanding characteristics. In this study, hydrogenated a-C films are deposited on two-dimensional quartz plates and three-dimensional quartz molds to evaluate the growth mechanisms and changes in the surface roughness, which is supported by molecular dynamics simulations. Results reveal that surface roughness encounters multiple variations until it reaches stable values. These fluctuations are categorized into four different stages which provide a concrete understanding of various growing mechanisms at each stage. Different behavior of the atoms in the top layers is recorded in the cases of normal and grazing incidents of carbon atoms. Lower surface roughness values are obtained at low-angle deposition. Interestingly, surface smoothing is attained on the sidewalls of the nanotrench mold where the deposition occurs with high incident ion angles.