Micron order structural inhomogeneities in vitreous silica observed by etching technique
Etching of various vitreous silica samples over a long period (∼ 200 min) with hydrofluoric acid revealed a high contrast configuration of micron to sub-millimeter order boundaries similar to the grain boundaries of crystalline materials. In order to better understand this new result, various parame...
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| Veröffentlicht in: | Radiation effects and defects in solids 1998-10, Vol.147 (1-2), p.65-71 |
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| container_issue | 1-2 |
| container_start_page | 65 |
| container_title | Radiation effects and defects in solids |
| container_volume | 147 |
| creator | Ogata, D. Y. Shinohara, A. H. Torikai, D. Suzuki, C. K. |
| description | Etching of various vitreous silica samples over a long period (∼ 200 min) with hydrofluoric acid revealed a high contrast configuration of micron to sub-millimeter order boundaries similar to the grain boundaries of crystalline materials. In order to better understand this new result, various parameters, such as the vitreous silica preparation processes, the type of basic insume, the grain size of silica powder, the surface roughness, and the OH-content, were studied. They should no correlation with the configuration of "amorphous-grain". A possibility of an anistropic micro-strain configuration induced by heterogeneous distribution of defects and impurities in the vitreous silica structure is suggested to explain the appearance of such grain boundary-like contrast. |
| doi_str_mv | 10.1080/10420159808226388 |
| format | Article |
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A possibility of an anistropic micro-strain configuration induced by heterogeneous distribution of defects and impurities in the vitreous silica structure is suggested to explain the appearance of such grain boundary-like contrast.</description><subject>Amorphous silicon dioxide</subject><subject>Chemical etching</subject><subject>Structural inhomogeneities</subject><subject>Vitreous silica</subject><issn>1042-0150</issn><issn>1029-4953</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1998</creationdate><recordtype>article</recordtype><recordid>eNqFkEFLAzEQhYMoWKs_wFv-wOok2c1mwYsUtULFi4K3JckmbWSbaJKt9t-7pd6KeJoZeN883kPoksAVAQHXBEoKpGoECEo5E-IITQjQpiibih3v9pIWowBO0VlK7wAgSlFO0NuT0zF4HGJnIk45DjoPUfbY-VVYh6XxxmVn0njjjcvRhCHh5HqnJQ4qmbgxHVZbbLJeOb_E2eiVd5-DOUcnVvbJXPzOKXq9v3uZzYvF88Pj7HZRaFbyXDCteKVL0ghOOqoYB6F4bavKCklASc2F5tpakEBAVpLXXVdbTTVpjIKmY1NE9n_HGClFY9uP6NYyblsC7a6a9qCakan3jPM2xLX8CrHv2iy3fYg2Sq9dOqTa_J1H8uZfkv1t_AO39H4u</recordid><startdate>19981001</startdate><enddate>19981001</enddate><creator>Ogata, D. 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K.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Micron order structural inhomogeneities in vitreous silica observed by etching technique</atitle><jtitle>Radiation effects and defects in solids</jtitle><date>1998-10-01</date><risdate>1998</risdate><volume>147</volume><issue>1-2</issue><spage>65</spage><epage>71</epage><pages>65-71</pages><issn>1042-0150</issn><eissn>1029-4953</eissn><abstract>Etching of various vitreous silica samples over a long period (∼ 200 min) with hydrofluoric acid revealed a high contrast configuration of micron to sub-millimeter order boundaries similar to the grain boundaries of crystalline materials. In order to better understand this new result, various parameters, such as the vitreous silica preparation processes, the type of basic insume, the grain size of silica powder, the surface roughness, and the OH-content, were studied. They should no correlation with the configuration of "amorphous-grain". 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| ispartof | Radiation effects and defects in solids, 1998-10, Vol.147 (1-2), p.65-71 |
| issn | 1042-0150 1029-4953 |
| language | eng |
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| source | Taylor & Francis Journals Complete |
| subjects | Amorphous silicon dioxide Chemical etching Structural inhomogeneities Vitreous silica |
| title | Micron order structural inhomogeneities in vitreous silica observed by etching technique |
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