Multilayer Neutron Polarizing Mirrors Working Under a Low External Magnetic Field Less Than 100 Gausses
We have developed multilayer neutron polarizing mirrors which are controlled under an external magnetic field less than 100 gausses. Multilayers of Permalloy-Ge and Fe-Ge have been evaporated on Si wafers in the magnetic field of about 130 gausses parallel to the surface of the wafer. The polarizing...
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Veröffentlicht in: | Journal of neutron research 1997-04, Vol.5 (3), p.123-132 |
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creator | Kawai, Takeshi Ebisawa, Toru Tasaki, Seiji Eguchi, Yoshiaki Hino, Masahiro Achiwa, Norio |
description | We have developed multilayer neutron polarizing mirrors which are controlled under an external magnetic field less than 100 gausses. Multilayers of Permalloy-Ge and Fe-Ge have been evaporated on Si wafers in the magnetic field of about 130 gausses parallel to the surface of the wafer. The polarizing efficiencies of Fe-Ge and Permalloy-Ge multilayer mirrors were 95% and 91% respectively under a low external magnetic field of 80 gausses. Under a very low external field of 50 gausses, the polarizing efficiency was 90% in case of Permalloy-Ge. A neutron pulse was obtained by applying a pulsed magnetic field of about 50 gausses parallel to the Permalloy-Ge polarizing mirror. The pulse rise time is the order of 100 μs in the present pulsed magnetic devices. |
doi_str_mv | 10.1080/10238169708200218 |
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Multilayers of Permalloy-Ge and Fe-Ge have been evaporated on Si wafers in the magnetic field of about 130 gausses parallel to the surface of the wafer. The polarizing efficiencies of Fe-Ge and Permalloy-Ge multilayer mirrors were 95% and 91% respectively under a low external magnetic field of 80 gausses. Under a very low external field of 50 gausses, the polarizing efficiency was 90% in case of Permalloy-Ge. A neutron pulse was obtained by applying a pulsed magnetic field of about 50 gausses parallel to the Permalloy-Ge polarizing mirror. The pulse rise time is the order of 100 μs in the present pulsed magnetic devices.</description><identifier>ISSN: 1023-8166</identifier><identifier>EISSN: 1477-2655</identifier><identifier>DOI: 10.1080/10238169708200218</identifier><language>eng</language><publisher>London, England: SAGE Publications</publisher><ispartof>Journal of neutron research, 1997-04, Vol.5 (3), p.123-132</ispartof><rights>IOS Press. 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Multilayers of Permalloy-Ge and Fe-Ge have been evaporated on Si wafers in the magnetic field of about 130 gausses parallel to the surface of the wafer. The polarizing efficiencies of Fe-Ge and Permalloy-Ge multilayer mirrors were 95% and 91% respectively under a low external magnetic field of 80 gausses. Under a very low external field of 50 gausses, the polarizing efficiency was 90% in case of Permalloy-Ge. A neutron pulse was obtained by applying a pulsed magnetic field of about 50 gausses parallel to the Permalloy-Ge polarizing mirror. 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Multilayers of Permalloy-Ge and Fe-Ge have been evaporated on Si wafers in the magnetic field of about 130 gausses parallel to the surface of the wafer. The polarizing efficiencies of Fe-Ge and Permalloy-Ge multilayer mirrors were 95% and 91% respectively under a low external magnetic field of 80 gausses. Under a very low external field of 50 gausses, the polarizing efficiency was 90% in case of Permalloy-Ge. A neutron pulse was obtained by applying a pulsed magnetic field of about 50 gausses parallel to the Permalloy-Ge polarizing mirror. The pulse rise time is the order of 100 μs in the present pulsed magnetic devices.</abstract><cop>London, England</cop><pub>SAGE Publications</pub><doi>10.1080/10238169708200218</doi><tpages>10</tpages></addata></record> |
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title | Multilayer Neutron Polarizing Mirrors Working Under a Low External Magnetic Field Less Than 100 Gausses |
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