Surface relaxation of strained semiconductor heterostructures revealed by finite-element calculations and transmission electron microscopy
Surface relaxation of a cross-section strained In 0.13 Ga 0.87 As layer buried in GaAs is studied by finite-element calculations and transmission electron microscopy (TEM). Strain fields in the In 0.13 Ga 0.87 As layer and in the cladding layers are calculated by the finite-element method and they a...
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Veröffentlicht in: | Philosophical magazine. A, Physics of condensed matter. Defects and mechanical properties Physics of condensed matter. Defects and mechanical properties, 1998-10, Vol.78 (4), p.879-891 |
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Sprache: | eng |
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