Water Adsorption in Interfacial Silane Layers by Neutron Reflection: 2. Epoxy + Silane Finish on Silicon Wafers

The interaction of water with an interphase composed of a common commercial glass cloth silane finish and an epoxy resin is explored by neutron reflection. The silane finish was applied to the oxide surfaces of polished silicon wafers. The epoxy resin (diglycidyl ether of bisphenol A with dicyandiam...

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Veröffentlicht in:The Journal of adhesion 1999-01, Vol.69 (1-2), p.139-163
Hauptverfasser: Kent, M. S., McNamara, W. F., Baca, P. M., Wright, W., Domeier, L. A., Wong, Apollo P. Y., Wu, W. L.
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container_end_page 163
container_issue 1-2
container_start_page 139
container_title The Journal of adhesion
container_volume 69
creator Kent, M. S.
McNamara, W. F.
Baca, P. M.
Wright, W.
Domeier, L. A.
Wong, Apollo P. Y.
Wu, W. L.
description The interaction of water with an interphase composed of a common commercial glass cloth silane finish and an epoxy resin is explored by neutron reflection. The silane finish was applied to the oxide surfaces of polished silicon wafers. The epoxy resin (diglycidyl ether of bisphenol A with dicyandiamide curing agent) was then roll-coated over the silane finish and cured. Profiles of D 2 O in the interphase were measured by neutron reflection after varying periods of exposure to air saturated with D 2 O at 22°C and at 80°C. A significant uptake of D 2 O into the interphase region is observed after exposure at 80°C for 3 days. The D 2 O profile in the interphase can be described by a two-layer model composed of a thin (∼15 Å) layer with ∼50 vol% D 2 O next to the silicon oxide surface and a second layer corresponding to the remainder of the silane-epoxy mixed layer with a much lower D 2 O level. No excess D 2 O is detected (detection limit ∼3%) in the interface region under the same conditions if the silane finish is not present. For samples conditioned at 22°C, no D 2 O is detected in the silane interphase after exposure for 18 days, but a significant uptake is observed after exposure for 6 months. The profile in the latter case can again be described by a two-layer model with a thin D 2 O-rich layer near the silicon oxide surface. The nature of the interaction of D 2 O with the interphase is further probed by exposing samples to vacuum following humidity conditioning. After evacuation for ∼1 month, near complete removal of interfacial water is observed for samples conditioned at 80°C for 3 days and also at 22°C for 6 months. These observations are interpreted in terms of a reversible chemical interaction (hydrolysis) between water and the silane finish.
doi_str_mv 10.1080/00218469908015923
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source Taylor & Francis Journals Complete
subjects Adsorption and desorption kinetics
evaporation and condensation
Applied sciences
Condensed matter: structure, mechanical and thermal properties
Electronics
Exact sciences and technology
Miscellaneous
Physics
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Semiconductor-device characterization, design, and modeling
Solid-fluid interfaces
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
title Water Adsorption in Interfacial Silane Layers by Neutron Reflection: 2. Epoxy + Silane Finish on Silicon Wafers
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