Conduction in RuO 2 -based thick films

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:International journal of electronics 1995-01, Vol.78 (1), p.113-119
Hauptverfasser: BOBRAN, KRZYSZTOF, KUSY, ANDRZEJ, STADLER, ADAM WITOLD, WILCZYNSKI, GRZEGORZ
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 119
container_issue 1
container_start_page 113
container_title International journal of electronics
container_volume 78
creator BOBRAN, KRZYSZTOF
KUSY, ANDRZEJ
STADLER, ADAM WITOLD
WILCZYNSKI, GRZEGORZ
description
doi_str_mv 10.1080/00207219508926143
format Article
fullrecord <record><control><sourceid>crossref</sourceid><recordid>TN_cdi_crossref_primary_10_1080_00207219508926143</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_1080_00207219508926143</sourcerecordid><originalsourceid>FETCH-LOGICAL-c903-e3c1fca3530e25d87d16e8d6fd18557563b3508b33c02d308048c3f681faa32f3</originalsourceid><addsrcrecordid>eNpljztPwzAYRS0EEqHwA9g8sRm-R-04I4qAIlWqhLpHjh_C0CYobgf-PalgY7rDvbo6R4hbhHsECw8ABDVho8E2ZHDJZ6JCNqQYDJyL6tSreVBfiqtSPgCADVAl7tpxCEd_yOMg8yDfjhtJUvWuxCAP79l_ypR3-3ItLpLblXjzlwuxfX7atiu13ry8to9r5RtgFdlj8o41QyQdbB3QRBtMCmi1rrXhnmfAntkDBZ65l9ZzMhaTc0yJFwJ_b_00ljLF1H1Nee-m7w6hO3l2_zz5B8nCQjU</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Conduction in RuO 2 -based thick films</title><source>Taylor &amp; Francis Journals Complete</source><creator>BOBRAN, KRZYSZTOF ; KUSY, ANDRZEJ ; STADLER, ADAM WITOLD ; WILCZYNSKI, GRZEGORZ</creator><creatorcontrib>BOBRAN, KRZYSZTOF ; KUSY, ANDRZEJ ; STADLER, ADAM WITOLD ; WILCZYNSKI, GRZEGORZ</creatorcontrib><identifier>ISSN: 0020-7217</identifier><identifier>EISSN: 1362-3060</identifier><identifier>DOI: 10.1080/00207219508926143</identifier><language>eng</language><ispartof>International journal of electronics, 1995-01, Vol.78 (1), p.113-119</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c903-e3c1fca3530e25d87d16e8d6fd18557563b3508b33c02d308048c3f681faa32f3</citedby><cites>FETCH-LOGICAL-c903-e3c1fca3530e25d87d16e8d6fd18557563b3508b33c02d308048c3f681faa32f3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids></links><search><creatorcontrib>BOBRAN, KRZYSZTOF</creatorcontrib><creatorcontrib>KUSY, ANDRZEJ</creatorcontrib><creatorcontrib>STADLER, ADAM WITOLD</creatorcontrib><creatorcontrib>WILCZYNSKI, GRZEGORZ</creatorcontrib><title>Conduction in RuO 2 -based thick films</title><title>International journal of electronics</title><issn>0020-7217</issn><issn>1362-3060</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1995</creationdate><recordtype>article</recordtype><recordid>eNpljztPwzAYRS0EEqHwA9g8sRm-R-04I4qAIlWqhLpHjh_C0CYobgf-PalgY7rDvbo6R4hbhHsECw8ABDVho8E2ZHDJZ6JCNqQYDJyL6tSreVBfiqtSPgCADVAl7tpxCEd_yOMg8yDfjhtJUvWuxCAP79l_ypR3-3ItLpLblXjzlwuxfX7atiu13ry8to9r5RtgFdlj8o41QyQdbB3QRBtMCmi1rrXhnmfAntkDBZ65l9ZzMhaTc0yJFwJ_b_00ljLF1H1Nee-m7w6hO3l2_zz5B8nCQjU</recordid><startdate>199501</startdate><enddate>199501</enddate><creator>BOBRAN, KRZYSZTOF</creator><creator>KUSY, ANDRZEJ</creator><creator>STADLER, ADAM WITOLD</creator><creator>WILCZYNSKI, GRZEGORZ</creator><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>199501</creationdate><title>Conduction in RuO 2 -based thick films</title><author>BOBRAN, KRZYSZTOF ; KUSY, ANDRZEJ ; STADLER, ADAM WITOLD ; WILCZYNSKI, GRZEGORZ</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c903-e3c1fca3530e25d87d16e8d6fd18557563b3508b33c02d308048c3f681faa32f3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1995</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>BOBRAN, KRZYSZTOF</creatorcontrib><creatorcontrib>KUSY, ANDRZEJ</creatorcontrib><creatorcontrib>STADLER, ADAM WITOLD</creatorcontrib><creatorcontrib>WILCZYNSKI, GRZEGORZ</creatorcontrib><collection>CrossRef</collection><jtitle>International journal of electronics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>BOBRAN, KRZYSZTOF</au><au>KUSY, ANDRZEJ</au><au>STADLER, ADAM WITOLD</au><au>WILCZYNSKI, GRZEGORZ</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Conduction in RuO 2 -based thick films</atitle><jtitle>International journal of electronics</jtitle><date>1995-01</date><risdate>1995</risdate><volume>78</volume><issue>1</issue><spage>113</spage><epage>119</epage><pages>113-119</pages><issn>0020-7217</issn><eissn>1362-3060</eissn><doi>10.1080/00207219508926143</doi><tpages>7</tpages></addata></record>
fulltext fulltext
identifier ISSN: 0020-7217
ispartof International journal of electronics, 1995-01, Vol.78 (1), p.113-119
issn 0020-7217
1362-3060
language eng
recordid cdi_crossref_primary_10_1080_00207219508926143
source Taylor & Francis Journals Complete
title Conduction in RuO 2 -based thick films
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-06T03%3A29%3A33IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-crossref&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Conduction%20in%20RuO%202%20-based%20thick%20films&rft.jtitle=International%20journal%20of%20electronics&rft.au=BOBRAN,%20KRZYSZTOF&rft.date=1995-01&rft.volume=78&rft.issue=1&rft.spage=113&rft.epage=119&rft.pages=113-119&rft.issn=0020-7217&rft.eissn=1362-3060&rft_id=info:doi/10.1080/00207219508926143&rft_dat=%3Ccrossref%3E10_1080_00207219508926143%3C/crossref%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true