Numerical investigation of plasma properties in Ar/SiH4 inductively coupled plasmas considering electron energy distribution functions

In thin film deposition, Ar/SiH4 mixtures are widely used to make polysilicon (poly-Si) and hydrogenated amorphous silicon (a-SiH) layers. Despite extensive research conducted on this mixture, little research has focused on the variations in plasma properties, radicals, and ions that occur during pl...

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Veröffentlicht in:	Journal of applied physics 2024-09, Vol.136 (9)
Hauptverfasser:	Kim, Ji-Hoon, Yoon, Min-Young, Kim, Gwan, Kwon, Deuk-Chul, Lee, Hyo-Chang, Kim, Jung-Hyung, Choe, Hee-Hwan
Format:	Artikel
Sprache:	eng
Schlagworte:	Amorphous silicon Boltzmann transport equation Control equipment Distribution functions Electron energy distribution Electrons External pressure Frequency variation Gas pressure Inductively coupled plasma Mathematical analysis Mixtures Plasma Plasma jets Polysilicon Simulation models Thin films
Online-Zugang:	Volltext
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