Perspectives on domain engineering for dielectric energy storage thin films
Dielectric energy storage capacitors as emerging and imperative components require both high energy density and efficiency. Ferroelectric-based dielectric thin films with large polarizability, high breakdown strength, and miniaturization potential hold promises for competitive integrated and discret...
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Veröffentlicht in: | Applied physics letters 2022-04, Vol.120 (15) |
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creator | Liu, Yiqian Yang, Bingbing Lan, Shun Pan, Hao Nan, Ce-Wen Lin, Yuan-Hua |
description | Dielectric energy storage capacitors as emerging and imperative components require both high energy density and efficiency. Ferroelectric-based dielectric thin films with large polarizability, high breakdown strength, and miniaturization potential hold promises for competitive integrated and discrete energy storage devices. Since ferroelectric domains are central to polarization hysteresis loops and, hence, energy storage performances, domain engineering has been widely used in dielectric thin films. In this Perspective, we focus on the most state-of-the-art dielectric energy storage films in the framework of domain engineering. Generally applicable domain engineering strategies are overviewed, followed by articulative examples of their implementation in modulating domain sizes and symmetries that enhance the energy storage. Finally, we envision prospects of further improvements of dielectric thin films within domain engineering and beyond. |
doi_str_mv | 10.1063/5.0090739 |
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Ferroelectric-based dielectric thin films with large polarizability, high breakdown strength, and miniaturization potential hold promises for competitive integrated and discrete energy storage devices. Since ferroelectric domains are central to polarization hysteresis loops and, hence, energy storage performances, domain engineering has been widely used in dielectric thin films. In this Perspective, we focus on the most state-of-the-art dielectric energy storage films in the framework of domain engineering. Generally applicable domain engineering strategies are overviewed, followed by articulative examples of their implementation in modulating domain sizes and symmetries that enhance the energy storage. 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Finally, we envision prospects of further improvements of dielectric thin films within domain engineering and beyond.</description><subject>Applied physics</subject><subject>Dielectric strength</subject><subject>Energy storage</subject><subject>Engineering</subject><subject>Ferroelectric domains</subject><subject>Ferroelectric materials</subject><subject>Ferroelectricity</subject><subject>Flux density</subject><subject>Hysteresis loops</subject><subject>Miniaturization</subject><subject>Thin films</subject><issn>0003-6951</issn><issn>1077-3118</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2022</creationdate><recordtype>article</recordtype><recordid>eNp90E1LAzEQBuAgCtbqwX-w4Elh6yTZbJqjFL-woAc9hzQ7u6a0mzXZFvrvTdmiB8HTMMzDzPAScklhQqHkt2ICoEBydURGFKTMOaXTYzICAJ6XStBTchbjMrWCcT4iL28YYoe2d1uMmW-zyq-NazNsG9ciBtc2We1DVjlcJRWcTSMMzS6LvQ-mwaz_TLx2q3U8Jye1WUW8ONQx-Xi4f5895fPXx-fZ3Ty3nMk-nzLBGAXLUNBKFkoJzksUBaeGCrOQ6XuDlQGjamUX1dTyEqRNI4rAKgl8TK6GvV3wXxuMvV76TWjTSc3KQhXAZLFX14OywccYsNZdcGsTdpqC3melhT5klezNYKN1vemdb3_w1odfqLuq_g__3fwNvXV24Q</recordid><startdate>20220411</startdate><enddate>20220411</enddate><creator>Liu, Yiqian</creator><creator>Yang, Bingbing</creator><creator>Lan, Shun</creator><creator>Pan, Hao</creator><creator>Nan, Ce-Wen</creator><creator>Lin, Yuan-Hua</creator><general>American Institute of Physics</general><scope>AAYXX</scope><scope>CITATION</scope><scope>8FD</scope><scope>H8D</scope><scope>L7M</scope><orcidid>https://orcid.org/0000-0003-0440-4048</orcidid><orcidid>https://orcid.org/0000-0001-9620-3440</orcidid><orcidid>https://orcid.org/0000-0002-3261-4053</orcidid></search><sort><creationdate>20220411</creationdate><title>Perspectives on domain engineering for dielectric energy storage thin films</title><author>Liu, Yiqian ; Yang, Bingbing ; Lan, Shun ; Pan, Hao ; Nan, Ce-Wen ; Lin, Yuan-Hua</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c327t-8252210c2e51d74995336e5431a15ab7073aeda0a9f9cbd8c3607c15a1e02d703</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2022</creationdate><topic>Applied physics</topic><topic>Dielectric strength</topic><topic>Energy storage</topic><topic>Engineering</topic><topic>Ferroelectric domains</topic><topic>Ferroelectric materials</topic><topic>Ferroelectricity</topic><topic>Flux density</topic><topic>Hysteresis loops</topic><topic>Miniaturization</topic><topic>Thin films</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Liu, Yiqian</creatorcontrib><creatorcontrib>Yang, Bingbing</creatorcontrib><creatorcontrib>Lan, Shun</creatorcontrib><creatorcontrib>Pan, Hao</creatorcontrib><creatorcontrib>Nan, Ce-Wen</creatorcontrib><creatorcontrib>Lin, Yuan-Hua</creatorcontrib><collection>CrossRef</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Applied physics letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Liu, Yiqian</au><au>Yang, Bingbing</au><au>Lan, Shun</au><au>Pan, Hao</au><au>Nan, Ce-Wen</au><au>Lin, Yuan-Hua</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Perspectives on domain engineering for dielectric energy storage thin films</atitle><jtitle>Applied physics letters</jtitle><date>2022-04-11</date><risdate>2022</risdate><volume>120</volume><issue>15</issue><issn>0003-6951</issn><eissn>1077-3118</eissn><coden>APPLAB</coden><abstract>Dielectric energy storage capacitors as emerging and imperative components require both high energy density and efficiency. 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subjects | Applied physics Dielectric strength Energy storage Engineering Ferroelectric domains Ferroelectric materials Ferroelectricity Flux density Hysteresis loops Miniaturization Thin films |
title | Perspectives on domain engineering for dielectric energy storage thin films |
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