Low voltage thin film transistors based on solution-processed In2O3:W. A remarkably stable semiconductor under negative and positive bias stress

Thin film transistors (TFTs) based on metal oxide semiconductors have been attracting considerable attention over the last two decades as alternatives to a-Si due to their superior electrical performance coupled with optical transparency to visible light and mechanical flexibility. They have become...

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Veröffentlicht in:Applied physics letters 2020-04, Vol.116 (16)
Hauptverfasser: Paxinos, Kosta, Antoniou, Giorgos, Afouxenidis, Dimitrios, Mohamed, Ahmed, Dikko, Umar, Tsitsimpelis, Ioannis, Milne, William I., Nathan, Arokia, Adamopoulos, George
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container_issue 16
container_start_page
container_title Applied physics letters
container_volume 116
creator Paxinos, Kosta
Antoniou, Giorgos
Afouxenidis, Dimitrios
Mohamed, Ahmed
Dikko, Umar
Tsitsimpelis, Ioannis
Milne, William I.
Nathan, Arokia
Adamopoulos, George
description Thin film transistors (TFTs) based on metal oxide semiconductors have been attracting considerable attention over the last two decades as alternatives to a-Si due to their superior electrical performance coupled with optical transparency to visible light and mechanical flexibility. They have become highly desirable for applications in backplane electronics for active-matrix organic light-emitting diodes including flexible displays and other newly emerging areas. Indeed, the performance of oxide-based TFTs, i.e., the carrier mobility, exceeds that of amorphous a-Si-based TFTs, and their stability characteristics exceed those of organic semiconductors.
doi_str_mv 10.1063/1.5142699
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fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_crossref_primary_10_1063_1_5142699</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>2394438210</sourcerecordid><originalsourceid>FETCH-LOGICAL-c358t-948980a3559fda4fbe2a212c995cc21a4e86ce3a883a2b933d4486fbf3144a423</originalsourceid><addsrcrecordid>eNqdkEFv1DAQhS1EJZbCgX9giRNIWWyPk9rcqqq0lVbqhYpjNHGc4pK1F4-zqP-Cn4y3W4l7T6M3-uaN3mPsgxRrKTr4Itet1Kqz9hVbSXF21oCU5jVbCSGg6Wwr37C3RA9Vtgpgxf5u0h--T3PBe8_LzxD5FOYtLxkjBSopEx-Q_MhT5JTmpYQUm11OztNhexPVLXz9sebnPPst5l84zI-cSh2ek98Gl-K4uOrDlzj6zKO_xxL2nmMc-S5ReBJDQKpXuZq-YycTzuTfP89Tdvft8vvFdbO5vbq5ON80DlpTGquNNQKhbe00op4Gr1BJ5axtnVMStTed84DGAKrBAoxam24aJpBao1Zwyj4efWuY34un0j-kJcf6sldgtQajpKjUpyPlciLKfup3OdScj70U_aHwXvbPhVf285ElFwoeinoZvE_5P9jvxgn-ASfUkNM</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2394438210</pqid></control><display><type>article</type><title>Low voltage thin film transistors based on solution-processed In2O3:W. A remarkably stable semiconductor under negative and positive bias stress</title><source>AIP Journals Complete</source><source>Alma/SFX Local Collection</source><creator>Paxinos, Kosta ; Antoniou, Giorgos ; Afouxenidis, Dimitrios ; Mohamed, Ahmed ; Dikko, Umar ; Tsitsimpelis, Ioannis ; Milne, William I. ; Nathan, Arokia ; Adamopoulos, George</creator><creatorcontrib>Paxinos, Kosta ; Antoniou, Giorgos ; Afouxenidis, Dimitrios ; Mohamed, Ahmed ; Dikko, Umar ; Tsitsimpelis, Ioannis ; Milne, William I. ; Nathan, Arokia ; Adamopoulos, George</creatorcontrib><description>Thin film transistors (TFTs) based on metal oxide semiconductors have been attracting considerable attention over the last two decades as alternatives to a-Si due to their superior electrical performance coupled with optical transparency to visible light and mechanical flexibility. They have become highly desirable for applications in backplane electronics for active-matrix organic light-emitting diodes including flexible displays and other newly emerging areas. Indeed, the performance of oxide-based TFTs, i.e., the carrier mobility, exceeds that of amorphous a-Si-based TFTs, and their stability characteristics exceed those of organic semiconductors.</description><identifier>ISSN: 0003-6951</identifier><identifier>EISSN: 1077-3118</identifier><identifier>DOI: 10.1063/1.5142699</identifier><identifier>CODEN: APPLAB</identifier><language>eng</language><publisher>Melville: American Institute of Physics</publisher><subject>Applied physics ; Backplanes ; Carrier mobility ; Indium oxides ; Low voltage ; Metal oxide semiconductors ; Organic light emitting diodes ; Organic semiconductors ; Photovoltaic cells ; Semiconductor devices ; Semiconductors ; Thin film transistors ; Thin films ; Transistors</subject><ispartof>Applied physics letters, 2020-04, Vol.116 (16)</ispartof><rights>Author(s)</rights><rights>2020 Author(s). Published under license by AIP Publishing.</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c358t-948980a3559fda4fbe2a212c995cc21a4e86ce3a883a2b933d4486fbf3144a423</citedby><cites>FETCH-LOGICAL-c358t-948980a3559fda4fbe2a212c995cc21a4e86ce3a883a2b933d4486fbf3144a423</cites><orcidid>0000-0002-2535-007X</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://pubs.aip.org/apl/article-lookup/doi/10.1063/1.5142699$$EHTML$$P50$$Gscitation$$H</linktohtml><link.rule.ids>314,778,782,792,4500,27907,27908,76135</link.rule.ids></links><search><creatorcontrib>Paxinos, Kosta</creatorcontrib><creatorcontrib>Antoniou, Giorgos</creatorcontrib><creatorcontrib>Afouxenidis, Dimitrios</creatorcontrib><creatorcontrib>Mohamed, Ahmed</creatorcontrib><creatorcontrib>Dikko, Umar</creatorcontrib><creatorcontrib>Tsitsimpelis, Ioannis</creatorcontrib><creatorcontrib>Milne, William I.</creatorcontrib><creatorcontrib>Nathan, Arokia</creatorcontrib><creatorcontrib>Adamopoulos, George</creatorcontrib><title>Low voltage thin film transistors based on solution-processed In2O3:W. A remarkably stable semiconductor under negative and positive bias stress</title><title>Applied physics letters</title><description>Thin film transistors (TFTs) based on metal oxide semiconductors have been attracting considerable attention over the last two decades as alternatives to a-Si due to their superior electrical performance coupled with optical transparency to visible light and mechanical flexibility. They have become highly desirable for applications in backplane electronics for active-matrix organic light-emitting diodes including flexible displays and other newly emerging areas. Indeed, the performance of oxide-based TFTs, i.e., the carrier mobility, exceeds that of amorphous a-Si-based TFTs, and their stability characteristics exceed those of organic semiconductors.</description><subject>Applied physics</subject><subject>Backplanes</subject><subject>Carrier mobility</subject><subject>Indium oxides</subject><subject>Low voltage</subject><subject>Metal oxide semiconductors</subject><subject>Organic light emitting diodes</subject><subject>Organic semiconductors</subject><subject>Photovoltaic cells</subject><subject>Semiconductor devices</subject><subject>Semiconductors</subject><subject>Thin film transistors</subject><subject>Thin films</subject><subject>Transistors</subject><issn>0003-6951</issn><issn>1077-3118</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2020</creationdate><recordtype>article</recordtype><recordid>eNqdkEFv1DAQhS1EJZbCgX9giRNIWWyPk9rcqqq0lVbqhYpjNHGc4pK1F4-zqP-Cn4y3W4l7T6M3-uaN3mPsgxRrKTr4Itet1Kqz9hVbSXF21oCU5jVbCSGg6Wwr37C3RA9Vtgpgxf5u0h--T3PBe8_LzxD5FOYtLxkjBSopEx-Q_MhT5JTmpYQUm11OztNhexPVLXz9sebnPPst5l84zI-cSh2ek98Gl-K4uOrDlzj6zKO_xxL2nmMc-S5ReBJDQKpXuZq-YycTzuTfP89Tdvft8vvFdbO5vbq5ON80DlpTGquNNQKhbe00op4Gr1BJ5axtnVMStTed84DGAKrBAoxam24aJpBao1Zwyj4efWuY34un0j-kJcf6sldgtQajpKjUpyPlciLKfup3OdScj70U_aHwXvbPhVf285ElFwoeinoZvE_5P9jvxgn-ASfUkNM</recordid><startdate>20200420</startdate><enddate>20200420</enddate><creator>Paxinos, Kosta</creator><creator>Antoniou, Giorgos</creator><creator>Afouxenidis, Dimitrios</creator><creator>Mohamed, Ahmed</creator><creator>Dikko, Umar</creator><creator>Tsitsimpelis, Ioannis</creator><creator>Milne, William I.</creator><creator>Nathan, Arokia</creator><creator>Adamopoulos, George</creator><general>American Institute of Physics</general><scope>AAYXX</scope><scope>CITATION</scope><scope>8FD</scope><scope>H8D</scope><scope>L7M</scope><orcidid>https://orcid.org/0000-0002-2535-007X</orcidid></search><sort><creationdate>20200420</creationdate><title>Low voltage thin film transistors based on solution-processed In2O3:W. A remarkably stable semiconductor under negative and positive bias stress</title><author>Paxinos, Kosta ; Antoniou, Giorgos ; Afouxenidis, Dimitrios ; Mohamed, Ahmed ; Dikko, Umar ; Tsitsimpelis, Ioannis ; Milne, William I. ; Nathan, Arokia ; Adamopoulos, George</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c358t-948980a3559fda4fbe2a212c995cc21a4e86ce3a883a2b933d4486fbf3144a423</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2020</creationdate><topic>Applied physics</topic><topic>Backplanes</topic><topic>Carrier mobility</topic><topic>Indium oxides</topic><topic>Low voltage</topic><topic>Metal oxide semiconductors</topic><topic>Organic light emitting diodes</topic><topic>Organic semiconductors</topic><topic>Photovoltaic cells</topic><topic>Semiconductor devices</topic><topic>Semiconductors</topic><topic>Thin film transistors</topic><topic>Thin films</topic><topic>Transistors</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Paxinos, Kosta</creatorcontrib><creatorcontrib>Antoniou, Giorgos</creatorcontrib><creatorcontrib>Afouxenidis, Dimitrios</creatorcontrib><creatorcontrib>Mohamed, Ahmed</creatorcontrib><creatorcontrib>Dikko, Umar</creatorcontrib><creatorcontrib>Tsitsimpelis, Ioannis</creatorcontrib><creatorcontrib>Milne, William I.</creatorcontrib><creatorcontrib>Nathan, Arokia</creatorcontrib><creatorcontrib>Adamopoulos, George</creatorcontrib><collection>CrossRef</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Applied physics letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Paxinos, Kosta</au><au>Antoniou, Giorgos</au><au>Afouxenidis, Dimitrios</au><au>Mohamed, Ahmed</au><au>Dikko, Umar</au><au>Tsitsimpelis, Ioannis</au><au>Milne, William I.</au><au>Nathan, Arokia</au><au>Adamopoulos, George</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Low voltage thin film transistors based on solution-processed In2O3:W. A remarkably stable semiconductor under negative and positive bias stress</atitle><jtitle>Applied physics letters</jtitle><date>2020-04-20</date><risdate>2020</risdate><volume>116</volume><issue>16</issue><issn>0003-6951</issn><eissn>1077-3118</eissn><coden>APPLAB</coden><abstract>Thin film transistors (TFTs) based on metal oxide semiconductors have been attracting considerable attention over the last two decades as alternatives to a-Si due to their superior electrical performance coupled with optical transparency to visible light and mechanical flexibility. They have become highly desirable for applications in backplane electronics for active-matrix organic light-emitting diodes including flexible displays and other newly emerging areas. Indeed, the performance of oxide-based TFTs, i.e., the carrier mobility, exceeds that of amorphous a-Si-based TFTs, and their stability characteristics exceed those of organic semiconductors.</abstract><cop>Melville</cop><pub>American Institute of Physics</pub><doi>10.1063/1.5142699</doi><tpages>5</tpages><orcidid>https://orcid.org/0000-0002-2535-007X</orcidid><oa>free_for_read</oa></addata></record>
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source AIP Journals Complete; Alma/SFX Local Collection
subjects Applied physics
Backplanes
Carrier mobility
Indium oxides
Low voltage
Metal oxide semiconductors
Organic light emitting diodes
Organic semiconductors
Photovoltaic cells
Semiconductor devices
Semiconductors
Thin film transistors
Thin films
Transistors
title Low voltage thin film transistors based on solution-processed In2O3:W. A remarkably stable semiconductor under negative and positive bias stress
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-16T19%3A52%3A30IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Low%20voltage%20thin%20film%20transistors%20based%20on%20solution-processed%20In2O3:W.%20A%20remarkably%20stable%20semiconductor%20under%20negative%20and%20positive%20bias%20stress&rft.jtitle=Applied%20physics%20letters&rft.au=Paxinos,%20Kosta&rft.date=2020-04-20&rft.volume=116&rft.issue=16&rft.issn=0003-6951&rft.eissn=1077-3118&rft.coden=APPLAB&rft_id=info:doi/10.1063/1.5142699&rft_dat=%3Cproquest_cross%3E2394438210%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=2394438210&rft_id=info:pmid/&rfr_iscdi=true