Roughness dependent wettability of sputtered copper thin films: The effect of the local surface slope

Here, we investigated the static and the dynamic wetting behaviors of copper (Cu) thin films deposited by DC magnetron sputtering. The deposited films have random rough surfaces for which the rms roughness amplitude σ, the lateral correlation length ξ, and the roughness exponent α were obtained from...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Journal of applied physics 2019-06, Vol.125 (24)
Hauptverfasser:	Foadi, Farnaz, ten Brink, Gert H., Mohammadizadeh, Mohammad Reza, Palasantzas, George
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied physics Atomic force microscopy Contact angle Copper Exponents Image acquisition Magnetron sputtering Roughening Surface roughness Thin films Time dependence Water drops Wettability Wetting
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!