Effect of heat treatment on the nanoporosity of silica PECVD films elucidated by low-energy positron annihilation and ellipsometric porosimetry

The nanoporosity of silica thin films, prepared through plasma enhanced chemical vapor deposition with different flow rates of tetraethyl orthosilicate, was investigated by means of vapor-adsorption ellipsometric porosimetry (EP) and pulsed, low-energy positron annihilation lifetime spectroscopy (PA...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Journal of applied physics 2017-11, Vol.122 (18)
Hauptverfasser: Yoshimoto, Shigeru, Kumagai, Kazuhiro, Hosomi, Hiroyuki, Takeda, Masaaki, Tsuru, Toshinori, Ito, Kenji
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue 18
container_start_page
container_title Journal of applied physics
container_volume 122
creator Yoshimoto, Shigeru
Kumagai, Kazuhiro
Hosomi, Hiroyuki
Takeda, Masaaki
Tsuru, Toshinori
Ito, Kenji
description The nanoporosity of silica thin films, prepared through plasma enhanced chemical vapor deposition with different flow rates of tetraethyl orthosilicate, was investigated by means of vapor-adsorption ellipsometric porosimetry (EP) and pulsed, low-energy positron annihilation lifetime spectroscopy (PALS). The effect of heat treatment on the subnano-scaled pore structure was observed via changes in the porosity and the pore dimension, obtained from EP and PALS, respectively. The open porosity of the as-deposited films, elucidated from the methanol (MeOH) adsorption isotherms at 26 °C, was found to range up to 5%. After annealing, the open porosity was reduced to almost zero, whereas the film total porosity was not significantly changed. This suggests that bottlenecks connecting pores near the film surface were developed by heat treatment, so that those bottlenecks prevented the MeOH molecules from diffusing into the open pores. On the other hand, the PALS results indicated that subnano-scaled pores of the films were enlarged along with the heat treatment; as a result, their sizes, evaluated from the lifetimes of ortho-positronium, were in the range of 0.31 nm to 0.37 nm in radius. These results from EP and PALS signified that the heat treatment enhanced the structural non-uniformity with respect to nanoporosity of the silica films.
doi_str_mv 10.1063/1.5004187
format Article
fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_crossref_primary_10_1063_1_5004187</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>2116024130</sourcerecordid><originalsourceid>FETCH-LOGICAL-c393t-5a51be7b4c0eb6954957ff529768b821cdb1bad606796087ec8848664e3e6de53</originalsourceid><addsrcrecordid>eNp9kE1LxDAQhoMouK4e_AcBTwpdk7ZJk6Os6wcIelCvJU0nbpZuU5Os0l_hX7b7gR4ELzPM8Mw7My9Cp5RMKOHZJZ0wQnIqij00okTIpGCM7KMRISlNhCzkIToKYUEIpSKTI_Q1MwZ0xM7gOaiIox_iEtqh0-I4B9yq1nXOu2Bjv6aCbaxW-Gk2fb3GxjbLgKFZaVurCDWuety4zwRa8G897tZTfhBSbWvntlHRbop6GGlsF9wSorcab_XXRX-MDoxqApzs8hi93Myep3fJw-Pt_fTqIdGZzGLCFKMVFFWuCVRcslyywhiWyoKLSqRU1xWtVM0JLyQnogAtRC44zyEDXgPLxuhsq9t5976CEMuFW_l2WFmmlHKS5jQjA3W-pfRwYPBgys7bpfJ9SUm59ruk5c7vgb3YskHbuPn0B_5w_hcsu9r8B_9V_gZAz5DT</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2116024130</pqid></control><display><type>article</type><title>Effect of heat treatment on the nanoporosity of silica PECVD films elucidated by low-energy positron annihilation and ellipsometric porosimetry</title><source>AIP Journals Complete</source><source>Alma/SFX Local Collection</source><creator>Yoshimoto, Shigeru ; Kumagai, Kazuhiro ; Hosomi, Hiroyuki ; Takeda, Masaaki ; Tsuru, Toshinori ; Ito, Kenji</creator><creatorcontrib>Yoshimoto, Shigeru ; Kumagai, Kazuhiro ; Hosomi, Hiroyuki ; Takeda, Masaaki ; Tsuru, Toshinori ; Ito, Kenji</creatorcontrib><description>The nanoporosity of silica thin films, prepared through plasma enhanced chemical vapor deposition with different flow rates of tetraethyl orthosilicate, was investigated by means of vapor-adsorption ellipsometric porosimetry (EP) and pulsed, low-energy positron annihilation lifetime spectroscopy (PALS). The effect of heat treatment on the subnano-scaled pore structure was observed via changes in the porosity and the pore dimension, obtained from EP and PALS, respectively. The open porosity of the as-deposited films, elucidated from the methanol (MeOH) adsorption isotherms at 26 °C, was found to range up to 5%. After annealing, the open porosity was reduced to almost zero, whereas the film total porosity was not significantly changed. This suggests that bottlenecks connecting pores near the film surface were developed by heat treatment, so that those bottlenecks prevented the MeOH molecules from diffusing into the open pores. On the other hand, the PALS results indicated that subnano-scaled pores of the films were enlarged along with the heat treatment; as a result, their sizes, evaluated from the lifetimes of ortho-positronium, were in the range of 0.31 nm to 0.37 nm in radius. These results from EP and PALS signified that the heat treatment enhanced the structural non-uniformity with respect to nanoporosity of the silica films.</description><identifier>ISSN: 0021-8979</identifier><identifier>EISSN: 1089-7550</identifier><identifier>DOI: 10.1063/1.5004187</identifier><identifier>CODEN: JAPIAU</identifier><language>eng</language><publisher>Melville: American Institute of Physics</publisher><subject>Adsorption ; Ellipsometry ; Heat treating ; Heat treatment ; Organic chemistry ; Plasma enhanced chemical vapor deposition ; Porosity ; Positron annihilation ; Positronium ; Silicon dioxide ; Tetraethyl orthosilicate ; Thin films</subject><ispartof>Journal of applied physics, 2017-11, Vol.122 (18)</ispartof><rights>Author(s)</rights><rights>2017 Author(s). Published by AIP Publishing.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c393t-5a51be7b4c0eb6954957ff529768b821cdb1bad606796087ec8848664e3e6de53</citedby><cites>FETCH-LOGICAL-c393t-5a51be7b4c0eb6954957ff529768b821cdb1bad606796087ec8848664e3e6de53</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://pubs.aip.org/jap/article-lookup/doi/10.1063/1.5004187$$EHTML$$P50$$Gscitation$$H</linktohtml><link.rule.ids>314,776,780,790,4498,27901,27902,76126</link.rule.ids></links><search><creatorcontrib>Yoshimoto, Shigeru</creatorcontrib><creatorcontrib>Kumagai, Kazuhiro</creatorcontrib><creatorcontrib>Hosomi, Hiroyuki</creatorcontrib><creatorcontrib>Takeda, Masaaki</creatorcontrib><creatorcontrib>Tsuru, Toshinori</creatorcontrib><creatorcontrib>Ito, Kenji</creatorcontrib><title>Effect of heat treatment on the nanoporosity of silica PECVD films elucidated by low-energy positron annihilation and ellipsometric porosimetry</title><title>Journal of applied physics</title><description>The nanoporosity of silica thin films, prepared through plasma enhanced chemical vapor deposition with different flow rates of tetraethyl orthosilicate, was investigated by means of vapor-adsorption ellipsometric porosimetry (EP) and pulsed, low-energy positron annihilation lifetime spectroscopy (PALS). The effect of heat treatment on the subnano-scaled pore structure was observed via changes in the porosity and the pore dimension, obtained from EP and PALS, respectively. The open porosity of the as-deposited films, elucidated from the methanol (MeOH) adsorption isotherms at 26 °C, was found to range up to 5%. After annealing, the open porosity was reduced to almost zero, whereas the film total porosity was not significantly changed. This suggests that bottlenecks connecting pores near the film surface were developed by heat treatment, so that those bottlenecks prevented the MeOH molecules from diffusing into the open pores. On the other hand, the PALS results indicated that subnano-scaled pores of the films were enlarged along with the heat treatment; as a result, their sizes, evaluated from the lifetimes of ortho-positronium, were in the range of 0.31 nm to 0.37 nm in radius. These results from EP and PALS signified that the heat treatment enhanced the structural non-uniformity with respect to nanoporosity of the silica films.</description><subject>Adsorption</subject><subject>Ellipsometry</subject><subject>Heat treating</subject><subject>Heat treatment</subject><subject>Organic chemistry</subject><subject>Plasma enhanced chemical vapor deposition</subject><subject>Porosity</subject><subject>Positron annihilation</subject><subject>Positronium</subject><subject>Silicon dioxide</subject><subject>Tetraethyl orthosilicate</subject><subject>Thin films</subject><issn>0021-8979</issn><issn>1089-7550</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2017</creationdate><recordtype>article</recordtype><recordid>eNp9kE1LxDAQhoMouK4e_AcBTwpdk7ZJk6Os6wcIelCvJU0nbpZuU5Os0l_hX7b7gR4ELzPM8Mw7My9Cp5RMKOHZJZ0wQnIqij00okTIpGCM7KMRISlNhCzkIToKYUEIpSKTI_Q1MwZ0xM7gOaiIox_iEtqh0-I4B9yq1nXOu2Bjv6aCbaxW-Gk2fb3GxjbLgKFZaVurCDWuety4zwRa8G897tZTfhBSbWvntlHRbop6GGlsF9wSorcab_XXRX-MDoxqApzs8hi93Myep3fJw-Pt_fTqIdGZzGLCFKMVFFWuCVRcslyywhiWyoKLSqRU1xWtVM0JLyQnogAtRC44zyEDXgPLxuhsq9t5976CEMuFW_l2WFmmlHKS5jQjA3W-pfRwYPBgys7bpfJ9SUm59ruk5c7vgb3YskHbuPn0B_5w_hcsu9r8B_9V_gZAz5DT</recordid><startdate>20171114</startdate><enddate>20171114</enddate><creator>Yoshimoto, Shigeru</creator><creator>Kumagai, Kazuhiro</creator><creator>Hosomi, Hiroyuki</creator><creator>Takeda, Masaaki</creator><creator>Tsuru, Toshinori</creator><creator>Ito, Kenji</creator><general>American Institute of Physics</general><scope>AAYXX</scope><scope>CITATION</scope><scope>8FD</scope><scope>H8D</scope><scope>L7M</scope></search><sort><creationdate>20171114</creationdate><title>Effect of heat treatment on the nanoporosity of silica PECVD films elucidated by low-energy positron annihilation and ellipsometric porosimetry</title><author>Yoshimoto, Shigeru ; Kumagai, Kazuhiro ; Hosomi, Hiroyuki ; Takeda, Masaaki ; Tsuru, Toshinori ; Ito, Kenji</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c393t-5a51be7b4c0eb6954957ff529768b821cdb1bad606796087ec8848664e3e6de53</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2017</creationdate><topic>Adsorption</topic><topic>Ellipsometry</topic><topic>Heat treating</topic><topic>Heat treatment</topic><topic>Organic chemistry</topic><topic>Plasma enhanced chemical vapor deposition</topic><topic>Porosity</topic><topic>Positron annihilation</topic><topic>Positronium</topic><topic>Silicon dioxide</topic><topic>Tetraethyl orthosilicate</topic><topic>Thin films</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Yoshimoto, Shigeru</creatorcontrib><creatorcontrib>Kumagai, Kazuhiro</creatorcontrib><creatorcontrib>Hosomi, Hiroyuki</creatorcontrib><creatorcontrib>Takeda, Masaaki</creatorcontrib><creatorcontrib>Tsuru, Toshinori</creatorcontrib><creatorcontrib>Ito, Kenji</creatorcontrib><collection>CrossRef</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Journal of applied physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Yoshimoto, Shigeru</au><au>Kumagai, Kazuhiro</au><au>Hosomi, Hiroyuki</au><au>Takeda, Masaaki</au><au>Tsuru, Toshinori</au><au>Ito, Kenji</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Effect of heat treatment on the nanoporosity of silica PECVD films elucidated by low-energy positron annihilation and ellipsometric porosimetry</atitle><jtitle>Journal of applied physics</jtitle><date>2017-11-14</date><risdate>2017</risdate><volume>122</volume><issue>18</issue><issn>0021-8979</issn><eissn>1089-7550</eissn><coden>JAPIAU</coden><abstract>The nanoporosity of silica thin films, prepared through plasma enhanced chemical vapor deposition with different flow rates of tetraethyl orthosilicate, was investigated by means of vapor-adsorption ellipsometric porosimetry (EP) and pulsed, low-energy positron annihilation lifetime spectroscopy (PALS). The effect of heat treatment on the subnano-scaled pore structure was observed via changes in the porosity and the pore dimension, obtained from EP and PALS, respectively. The open porosity of the as-deposited films, elucidated from the methanol (MeOH) adsorption isotherms at 26 °C, was found to range up to 5%. After annealing, the open porosity was reduced to almost zero, whereas the film total porosity was not significantly changed. This suggests that bottlenecks connecting pores near the film surface were developed by heat treatment, so that those bottlenecks prevented the MeOH molecules from diffusing into the open pores. On the other hand, the PALS results indicated that subnano-scaled pores of the films were enlarged along with the heat treatment; as a result, their sizes, evaluated from the lifetimes of ortho-positronium, were in the range of 0.31 nm to 0.37 nm in radius. These results from EP and PALS signified that the heat treatment enhanced the structural non-uniformity with respect to nanoporosity of the silica films.</abstract><cop>Melville</cop><pub>American Institute of Physics</pub><doi>10.1063/1.5004187</doi><tpages>5</tpages></addata></record>
fulltext fulltext
identifier ISSN: 0021-8979
ispartof Journal of applied physics, 2017-11, Vol.122 (18)
issn 0021-8979
1089-7550
language eng
recordid cdi_crossref_primary_10_1063_1_5004187
source AIP Journals Complete; Alma/SFX Local Collection
subjects Adsorption
Ellipsometry
Heat treating
Heat treatment
Organic chemistry
Plasma enhanced chemical vapor deposition
Porosity
Positron annihilation
Positronium
Silicon dioxide
Tetraethyl orthosilicate
Thin films
title Effect of heat treatment on the nanoporosity of silica PECVD films elucidated by low-energy positron annihilation and ellipsometric porosimetry
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-06T17%3A56%3A42IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Effect%20of%20heat%20treatment%20on%20the%20nanoporosity%20of%20silica%20PECVD%20films%20elucidated%20by%20low-energy%20positron%20annihilation%20and%20ellipsometric%20porosimetry&rft.jtitle=Journal%20of%20applied%20physics&rft.au=Yoshimoto,%20Shigeru&rft.date=2017-11-14&rft.volume=122&rft.issue=18&rft.issn=0021-8979&rft.eissn=1089-7550&rft.coden=JAPIAU&rft_id=info:doi/10.1063/1.5004187&rft_dat=%3Cproquest_cross%3E2116024130%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=2116024130&rft_id=info:pmid/&rfr_iscdi=true