Micromachined silicon cantilevers with integrated high-frequency magnetoimpedance sensors for simultaneous strain and magnetic field detection
Giant magnetoimpedance (GMI) measurements in the high-frequency regime utilizing a coplanar waveguide with an integrated Permalloy multilayer and micromachined on a silicon cantilever are reported. The fabrication process is described in detail. The aspect ratio of the magnetic multilayer in the mag...
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| Veröffentlicht in: | Applied physics letters 2017-12, Vol.111 (23) |
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| container_title | Applied physics letters |
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| creator | Buettel, G. Joppich, J. Hartmann, U. |
| description | Giant magnetoimpedance (GMI) measurements in the high-frequency regime utilizing a coplanar waveguide with an integrated Permalloy multilayer and micromachined on a silicon cantilever are reported. The fabrication process is described in detail. The aspect ratio of the magnetic multilayer in the magnetoresistive and magnetostrictive device was varied. Tensile strain and compressive strain were applied. Vector network analyzer measurements in the range from the skin effect to ferromagnetic resonance confirm the technological potential of GMI-based micro-electro-mechanical devices for strain and magnetic field sensing applications. The strain-impedance gauge factor was quantified by finite element strain calculations and reaches a maximum value of almost 200. |
| doi_str_mv | 10.1063/1.5003263 |
| format | Article |
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The fabrication process is described in detail. The aspect ratio of the magnetic multilayer in the magnetoresistive and magnetostrictive device was varied. Tensile strain and compressive strain were applied. Vector network analyzer measurements in the range from the skin effect to ferromagnetic resonance confirm the technological potential of GMI-based micro-electro-mechanical devices for strain and magnetic field sensing applications. The strain-impedance gauge factor was quantified by finite element strain calculations and reaches a maximum value of almost 200.</description><identifier>ISSN: 0003-6951</identifier><identifier>EISSN: 1077-3118</identifier><identifier>DOI: 10.1063/1.5003263</identifier><identifier>CODEN: APPLAB</identifier><language>eng</language><publisher>Melville: American Institute of Physics</publisher><subject>Applied physics ; Aspect ratio ; Compressive properties ; Coplanar waveguides ; Electromechanical devices ; Ferromagnetic resonance ; Ferromagnetism ; Ferrous alloys ; Finite element method ; Giant magnetoimpedance ; Magnetic alloys ; Magnetic fields ; Magnetoresistivity ; Magnetostriction ; Mechanical devices ; Micromachining ; Multilayers ; Network analysers ; Rangefinding ; Silicon ; Skin effect ; Strain gauges ; Tensile strain</subject><ispartof>Applied physics letters, 2017-12, Vol.111 (23)</ispartof><rights>Author(s)</rights><rights>2017 Author(s). 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The strain-impedance gauge factor was quantified by finite element strain calculations and reaches a maximum value of almost 200.</description><subject>Applied physics</subject><subject>Aspect ratio</subject><subject>Compressive properties</subject><subject>Coplanar waveguides</subject><subject>Electromechanical devices</subject><subject>Ferromagnetic resonance</subject><subject>Ferromagnetism</subject><subject>Ferrous alloys</subject><subject>Finite element method</subject><subject>Giant magnetoimpedance</subject><subject>Magnetic alloys</subject><subject>Magnetic fields</subject><subject>Magnetoresistivity</subject><subject>Magnetostriction</subject><subject>Mechanical devices</subject><subject>Micromachining</subject><subject>Multilayers</subject><subject>Network analysers</subject><subject>Rangefinding</subject><subject>Silicon</subject><subject>Skin effect</subject><subject>Strain gauges</subject><subject>Tensile strain</subject><issn>0003-6951</issn><issn>1077-3118</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2017</creationdate><recordtype>article</recordtype><recordid>eNp9kM9KAzEQxoMoWKsH3yDgSWFrsmmy3aMU_0HFi56XNJl0U3aTmqSVvoTPbEqLHgQvM8zwm2_4PoQuKRlRItgtHXFCWCnYERpQUlUFo3RyjAYkbwtRc3qKzmJc5pGXjA3Q14tVwfdStdaBxtF2VnmHlXTJdrCBEPGnTS22LsEiyJSZ1i7awgT4WINTW9zLhYPkbb8CLZ0CHMFFn--MD1mvX3dJOvDriGMK0josnT4cWYWNhU5jDQlUst6doxMjuwgXhz5E7w_3b9OnYvb6-Dy9mxWKlVUqSjovGRdVpfUcKBWcKj6ZEKATonPhOgcAwEtjmBBmXGWWC6oqPa6ZqI1kQ3S1110Fn33E1Cz9Orj8simzHiF1xceZut5TOaIYA5hmFWwvw7ahpNnF3dDmEHdmb_ZsVDbJnZcfeOPDL9istPkP_qv8Df5skPY</recordid><startdate>20171204</startdate><enddate>20171204</enddate><creator>Buettel, G.</creator><creator>Joppich, J.</creator><creator>Hartmann, U.</creator><general>American Institute of Physics</general><scope>AAYXX</scope><scope>CITATION</scope><scope>8FD</scope><scope>H8D</scope><scope>L7M</scope></search><sort><creationdate>20171204</creationdate><title>Micromachined silicon cantilevers with integrated high-frequency magnetoimpedance sensors for simultaneous strain and magnetic field detection</title><author>Buettel, G. ; Joppich, J. ; Hartmann, U.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c327t-21b235677ddbe11651c5880e180de185d263ee52ff366f47356561c7d49369fa3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2017</creationdate><topic>Applied physics</topic><topic>Aspect ratio</topic><topic>Compressive properties</topic><topic>Coplanar waveguides</topic><topic>Electromechanical devices</topic><topic>Ferromagnetic resonance</topic><topic>Ferromagnetism</topic><topic>Ferrous alloys</topic><topic>Finite element method</topic><topic>Giant magnetoimpedance</topic><topic>Magnetic alloys</topic><topic>Magnetic fields</topic><topic>Magnetoresistivity</topic><topic>Magnetostriction</topic><topic>Mechanical devices</topic><topic>Micromachining</topic><topic>Multilayers</topic><topic>Network analysers</topic><topic>Rangefinding</topic><topic>Silicon</topic><topic>Skin effect</topic><topic>Strain gauges</topic><topic>Tensile strain</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Buettel, G.</creatorcontrib><creatorcontrib>Joppich, J.</creatorcontrib><creatorcontrib>Hartmann, U.</creatorcontrib><collection>CrossRef</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Applied physics letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Buettel, G.</au><au>Joppich, J.</au><au>Hartmann, U.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Micromachined silicon cantilevers with integrated high-frequency magnetoimpedance sensors for simultaneous strain and magnetic field detection</atitle><jtitle>Applied physics letters</jtitle><date>2017-12-04</date><risdate>2017</risdate><volume>111</volume><issue>23</issue><issn>0003-6951</issn><eissn>1077-3118</eissn><coden>APPLAB</coden><abstract>Giant magnetoimpedance (GMI) measurements in the high-frequency regime utilizing a coplanar waveguide with an integrated Permalloy multilayer and micromachined on a silicon cantilever are reported. The fabrication process is described in detail. The aspect ratio of the magnetic multilayer in the magnetoresistive and magnetostrictive device was varied. Tensile strain and compressive strain were applied. Vector network analyzer measurements in the range from the skin effect to ferromagnetic resonance confirm the technological potential of GMI-based micro-electro-mechanical devices for strain and magnetic field sensing applications. The strain-impedance gauge factor was quantified by finite element strain calculations and reaches a maximum value of almost 200.</abstract><cop>Melville</cop><pub>American Institute of Physics</pub><doi>10.1063/1.5003263</doi><tpages>5</tpages></addata></record> |
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| ispartof | Applied physics letters, 2017-12, Vol.111 (23) |
| issn | 0003-6951 1077-3118 |
| language | eng |
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| source | AIP Journals Complete; Alma/SFX Local Collection |
| subjects | Applied physics Aspect ratio Compressive properties Coplanar waveguides Electromechanical devices Ferromagnetic resonance Ferromagnetism Ferrous alloys Finite element method Giant magnetoimpedance Magnetic alloys Magnetic fields Magnetoresistivity Magnetostriction Mechanical devices Micromachining Multilayers Network analysers Rangefinding Silicon Skin effect Strain gauges Tensile strain |
| title | Micromachined silicon cantilevers with integrated high-frequency magnetoimpedance sensors for simultaneous strain and magnetic field detection |
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