Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS)

High Power Impulse Magnetron Sputtering (HiPIMS) is a coating technology that combines magnetron sputtering with pulsed power concepts. By applying power in pulses of high amplitude and a relatively low duty cycle, large fractions of sputtered atoms and near-target gases are ionized. In contrast to...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Journal of applied physics 2017-05, Vol.121 (17)
1. Verfasser:	Anders, André
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied physics CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY Dense plasmas Electron emission Film growth Gas flow Gases Ion flux Magnetron sputtering Parameters Partial pressure Photovoltaic cells Thin films
Online-Zugang:	Volltext
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