Tailoring the soft magnetic properties of sputtered multilayers by microstructure engineering for high frequency applications

Soft magnetic Ni78.5Fe21.5, Co91.5Ta4.5Zr4 and Fe52Co28B20 thin films laminated with SiO2, Al2O3, AlN, and Ta2O5 dielectric interlayers were deposited on 8” Si wafers using DC, pulsed DC and RF cathodes in the industrial, high-throughput Evatec LLS-EVO-II magnetron sputtering system. A typical multi...

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Veröffentlicht in:	AIP advances 2017-05, Vol.7 (5), p.056414-056414-7
Hauptverfasser:	Falub, Claudiu V., Rohrmann, Hartmut, Bless, Martin, Meduňa, Mojmír, Marioni, Miguel, Schneider, Daniel, Richter, Jan H., Padrun, Marco
Format:	Artikel
Sprache:	eng
Schlagworte:	Aluminum oxide Aspect ratio Atomic force microscopy Bilayers Cathode sputtering Coercivity Collimation Collimators Interlayers Kerr magnetooptical effect Laminates Magnetic anisotropy Magnetic materials Magnetic properties Magnetism Magnetron sputtering Multilayers Process parameters Silicon dioxide Tantalum Tantalum oxides Texturing Thin films Wafers
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