An electronic structure reinterpretation of the organic semiconductor/electrode interface based on argon gas cluster ion beam sputtering investigations

The effects of the Ar gas cluster ion beam (GCIB) sputtering process on the structural and chemical properties of organic material and the energy-level alignment at the organic semiconductor/electrode interface are studied. The Ar GCIB sputtering process causes no damage to the molecular orientation...

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Veröffentlicht in:	Journal of applied physics 2013-07, Vol.114 (1)
Hauptverfasser:	Yun, Dong-Jin, Chung, JaeGwan, Jung, Changhoon, Kim, Ki-Hong, Baek, WoonJoong, Han, Hyouksoo, Anass, Benayad, Park, Gyeong-Su, Park, Sung-Hoon
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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