Enhanced interface perpendicular magnetic anisotropy in Ta|CoFeB|MgO using nitrogen doped Ta underlayers

We show that the magnetic characteristics of Ta|CoFeB|MgO magnetic heterostructures are strongly influenced by doping the Ta underlayer with nitrogen. In particular, the saturation magnetization drops upon doping the Ta underlayer, suggesting that the doped underlayer acts as a boron diffusion barri...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Applied physics letters 2013-06, Vol.102 (24)
Hauptverfasser: Sinha, Jaivardhan, Hayashi, Masamitsu, Kellock, Andrew J., Fukami, Shunsuke, Yamanouchi, Michihiko, Sato, Hideo, Ikeda, Shoji, Mitani, Seiji, Yang, See-hun, Parkin, Stuart S. P., Ohno, Hideo
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue 24
container_start_page
container_title Applied physics letters
container_volume 102
creator Sinha, Jaivardhan
Hayashi, Masamitsu
Kellock, Andrew J.
Fukami, Shunsuke
Yamanouchi, Michihiko
Sato, Hideo
Ikeda, Shoji
Mitani, Seiji
Yang, See-hun
Parkin, Stuart S. P.
Ohno, Hideo
description We show that the magnetic characteristics of Ta|CoFeB|MgO magnetic heterostructures are strongly influenced by doping the Ta underlayer with nitrogen. In particular, the saturation magnetization drops upon doping the Ta underlayer, suggesting that the doped underlayer acts as a boron diffusion barrier. In addition, the thickness of the magnetic dead layer decreases with increasing nitrogen doping. Surprisingly, the interface magnetic anisotropy increases to ∼1.8 erg/cm2 when an optimum amount of nitrogen is introduced into the Ta underlayer. These results show that nitrogen doped Ta serves as a good underlayer for spintronic applications including magnetic tunnel junctions and domain wall devices.
doi_str_mv 10.1063/1.4811269
format Article
fullrecord <record><control><sourceid>crossref</sourceid><recordid>TN_cdi_crossref_primary_10_1063_1_4811269</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_1063_1_4811269</sourcerecordid><originalsourceid>FETCH-LOGICAL-c2459-aac2efab413a9c9e1b0b6ffcd0b6f07cacd39bdefe39857b54c330de3b29f1b73</originalsourceid><addsrcrecordid>eNotkD1PwzAURS0EEqUw8A-8MqT4xfmoR6haQCrqUubo2X5OjVonspuhUn88qeh0dXWvznAYewYxA1HJV5gVc4C8UjdsAqKuMwkwv2UTIYTMKlXCPXtI6XesZS7lhO2WYYfBkOU-HCk6NMR7ij0F682wx8gP2AY6esMx-NQdY9efxi_f4nnRrej9_N1u-JB8aHnw49pS4LbrR-AW-RAsxT2eKKZHdudwn-jpmlP2s1puF5_ZevPxtXhbZyYvSpUhmpwc6gIkKqMItNCVc8ZeQtQGjZVKW3Ik1bysdVkYKYUlqXPlQNdyyl7-uSZ2KUVyTR_9AeOpAdFcFDXQXBXJPxxtW-c</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Enhanced interface perpendicular magnetic anisotropy in Ta|CoFeB|MgO using nitrogen doped Ta underlayers</title><source>AIP Journals Complete</source><source>AIP Digital Archive</source><source>Alma/SFX Local Collection</source><creator>Sinha, Jaivardhan ; Hayashi, Masamitsu ; Kellock, Andrew J. ; Fukami, Shunsuke ; Yamanouchi, Michihiko ; Sato, Hideo ; Ikeda, Shoji ; Mitani, Seiji ; Yang, See-hun ; Parkin, Stuart S. P. ; Ohno, Hideo</creator><creatorcontrib>Sinha, Jaivardhan ; Hayashi, Masamitsu ; Kellock, Andrew J. ; Fukami, Shunsuke ; Yamanouchi, Michihiko ; Sato, Hideo ; Ikeda, Shoji ; Mitani, Seiji ; Yang, See-hun ; Parkin, Stuart S. P. ; Ohno, Hideo</creatorcontrib><description>We show that the magnetic characteristics of Ta|CoFeB|MgO magnetic heterostructures are strongly influenced by doping the Ta underlayer with nitrogen. In particular, the saturation magnetization drops upon doping the Ta underlayer, suggesting that the doped underlayer acts as a boron diffusion barrier. In addition, the thickness of the magnetic dead layer decreases with increasing nitrogen doping. Surprisingly, the interface magnetic anisotropy increases to ∼1.8 erg/cm2 when an optimum amount of nitrogen is introduced into the Ta underlayer. These results show that nitrogen doped Ta serves as a good underlayer for spintronic applications including magnetic tunnel junctions and domain wall devices.</description><identifier>ISSN: 0003-6951</identifier><identifier>EISSN: 1077-3118</identifier><identifier>DOI: 10.1063/1.4811269</identifier><language>eng</language><ispartof>Applied physics letters, 2013-06, Vol.102 (24)</ispartof><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c2459-aac2efab413a9c9e1b0b6ffcd0b6f07cacd39bdefe39857b54c330de3b29f1b73</citedby><cites>FETCH-LOGICAL-c2459-aac2efab413a9c9e1b0b6ffcd0b6f07cacd39bdefe39857b54c330de3b29f1b73</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>315,781,785,27929,27930</link.rule.ids></links><search><creatorcontrib>Sinha, Jaivardhan</creatorcontrib><creatorcontrib>Hayashi, Masamitsu</creatorcontrib><creatorcontrib>Kellock, Andrew J.</creatorcontrib><creatorcontrib>Fukami, Shunsuke</creatorcontrib><creatorcontrib>Yamanouchi, Michihiko</creatorcontrib><creatorcontrib>Sato, Hideo</creatorcontrib><creatorcontrib>Ikeda, Shoji</creatorcontrib><creatorcontrib>Mitani, Seiji</creatorcontrib><creatorcontrib>Yang, See-hun</creatorcontrib><creatorcontrib>Parkin, Stuart S. P.</creatorcontrib><creatorcontrib>Ohno, Hideo</creatorcontrib><title>Enhanced interface perpendicular magnetic anisotropy in Ta|CoFeB|MgO using nitrogen doped Ta underlayers</title><title>Applied physics letters</title><description>We show that the magnetic characteristics of Ta|CoFeB|MgO magnetic heterostructures are strongly influenced by doping the Ta underlayer with nitrogen. In particular, the saturation magnetization drops upon doping the Ta underlayer, suggesting that the doped underlayer acts as a boron diffusion barrier. In addition, the thickness of the magnetic dead layer decreases with increasing nitrogen doping. Surprisingly, the interface magnetic anisotropy increases to ∼1.8 erg/cm2 when an optimum amount of nitrogen is introduced into the Ta underlayer. These results show that nitrogen doped Ta serves as a good underlayer for spintronic applications including magnetic tunnel junctions and domain wall devices.</description><issn>0003-6951</issn><issn>1077-3118</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2013</creationdate><recordtype>article</recordtype><recordid>eNotkD1PwzAURS0EEqUw8A-8MqT4xfmoR6haQCrqUubo2X5OjVonspuhUn88qeh0dXWvznAYewYxA1HJV5gVc4C8UjdsAqKuMwkwv2UTIYTMKlXCPXtI6XesZS7lhO2WYYfBkOU-HCk6NMR7ij0F682wx8gP2AY6esMx-NQdY9efxi_f4nnRrej9_N1u-JB8aHnw49pS4LbrR-AW-RAsxT2eKKZHdudwn-jpmlP2s1puF5_ZevPxtXhbZyYvSpUhmpwc6gIkKqMItNCVc8ZeQtQGjZVKW3Ik1bysdVkYKYUlqXPlQNdyyl7-uSZ2KUVyTR_9AeOpAdFcFDXQXBXJPxxtW-c</recordid><startdate>20130617</startdate><enddate>20130617</enddate><creator>Sinha, Jaivardhan</creator><creator>Hayashi, Masamitsu</creator><creator>Kellock, Andrew J.</creator><creator>Fukami, Shunsuke</creator><creator>Yamanouchi, Michihiko</creator><creator>Sato, Hideo</creator><creator>Ikeda, Shoji</creator><creator>Mitani, Seiji</creator><creator>Yang, See-hun</creator><creator>Parkin, Stuart S. P.</creator><creator>Ohno, Hideo</creator><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20130617</creationdate><title>Enhanced interface perpendicular magnetic anisotropy in Ta|CoFeB|MgO using nitrogen doped Ta underlayers</title><author>Sinha, Jaivardhan ; Hayashi, Masamitsu ; Kellock, Andrew J. ; Fukami, Shunsuke ; Yamanouchi, Michihiko ; Sato, Hideo ; Ikeda, Shoji ; Mitani, Seiji ; Yang, See-hun ; Parkin, Stuart S. P. ; Ohno, Hideo</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c2459-aac2efab413a9c9e1b0b6ffcd0b6f07cacd39bdefe39857b54c330de3b29f1b73</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2013</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Sinha, Jaivardhan</creatorcontrib><creatorcontrib>Hayashi, Masamitsu</creatorcontrib><creatorcontrib>Kellock, Andrew J.</creatorcontrib><creatorcontrib>Fukami, Shunsuke</creatorcontrib><creatorcontrib>Yamanouchi, Michihiko</creatorcontrib><creatorcontrib>Sato, Hideo</creatorcontrib><creatorcontrib>Ikeda, Shoji</creatorcontrib><creatorcontrib>Mitani, Seiji</creatorcontrib><creatorcontrib>Yang, See-hun</creatorcontrib><creatorcontrib>Parkin, Stuart S. P.</creatorcontrib><creatorcontrib>Ohno, Hideo</creatorcontrib><collection>CrossRef</collection><jtitle>Applied physics letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Sinha, Jaivardhan</au><au>Hayashi, Masamitsu</au><au>Kellock, Andrew J.</au><au>Fukami, Shunsuke</au><au>Yamanouchi, Michihiko</au><au>Sato, Hideo</au><au>Ikeda, Shoji</au><au>Mitani, Seiji</au><au>Yang, See-hun</au><au>Parkin, Stuart S. P.</au><au>Ohno, Hideo</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Enhanced interface perpendicular magnetic anisotropy in Ta|CoFeB|MgO using nitrogen doped Ta underlayers</atitle><jtitle>Applied physics letters</jtitle><date>2013-06-17</date><risdate>2013</risdate><volume>102</volume><issue>24</issue><issn>0003-6951</issn><eissn>1077-3118</eissn><abstract>We show that the magnetic characteristics of Ta|CoFeB|MgO magnetic heterostructures are strongly influenced by doping the Ta underlayer with nitrogen. In particular, the saturation magnetization drops upon doping the Ta underlayer, suggesting that the doped underlayer acts as a boron diffusion barrier. In addition, the thickness of the magnetic dead layer decreases with increasing nitrogen doping. Surprisingly, the interface magnetic anisotropy increases to ∼1.8 erg/cm2 when an optimum amount of nitrogen is introduced into the Ta underlayer. These results show that nitrogen doped Ta serves as a good underlayer for spintronic applications including magnetic tunnel junctions and domain wall devices.</abstract><doi>10.1063/1.4811269</doi><oa>free_for_read</oa></addata></record>
fulltext fulltext
identifier ISSN: 0003-6951
ispartof Applied physics letters, 2013-06, Vol.102 (24)
issn 0003-6951
1077-3118
language eng
recordid cdi_crossref_primary_10_1063_1_4811269
source AIP Journals Complete; AIP Digital Archive; Alma/SFX Local Collection
title Enhanced interface perpendicular magnetic anisotropy in Ta|CoFeB|MgO using nitrogen doped Ta underlayers
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-15T04%3A50%3A36IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-crossref&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Enhanced%20interface%20perpendicular%20magnetic%20anisotropy%20in%20Ta%7CCoFeB%7CMgO%20using%20nitrogen%20doped%20Ta%20underlayers&rft.jtitle=Applied%20physics%20letters&rft.au=Sinha,%20Jaivardhan&rft.date=2013-06-17&rft.volume=102&rft.issue=24&rft.issn=0003-6951&rft.eissn=1077-3118&rft_id=info:doi/10.1063/1.4811269&rft_dat=%3Ccrossref%3E10_1063_1_4811269%3C/crossref%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true