Radiation hardness of graphene and MoS2 field effect devices against swift heavy ion irradiation

We have investigated the deterioration of field effect transistors based on two-dimensional materials due to irradiation with swift heavy ions. Devices were prepared with exfoliated single layers of MoS2 and graphene, respectively. They were characterized before and after irradiation with 1.14 GeV U...

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Veröffentlicht in:Journal of applied physics 2013-06, Vol.113 (21)
Hauptverfasser: Ochedowski, O., Marinov, K., Wilbs, G., Keller, G., Scheuschner, N., Severin, D., Bender, M., Maultzsch, J., Tegude, F. J., Schleberger, M.
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container_issue 21
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container_title Journal of applied physics
container_volume 113
creator Ochedowski, O.
Marinov, K.
Wilbs, G.
Keller, G.
Scheuschner, N.
Severin, D.
Bender, M.
Maultzsch, J.
Tegude, F. J.
Schleberger, M.
description We have investigated the deterioration of field effect transistors based on two-dimensional materials due to irradiation with swift heavy ions. Devices were prepared with exfoliated single layers of MoS2 and graphene, respectively. They were characterized before and after irradiation with 1.14 GeV U28+ ions using three different fluences. By electrical characterization, atomic force microscopy, and Raman spectroscopy, we show that the irradiation leads to significant changes of structural and electrical properties. At the highest fluence of 4 × 1011 ions/cm2, the MoS2 transistor is destroyed, while the graphene based device remains operational, albeit with an inferior performance.
doi_str_mv 10.1063/1.4808460
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title Radiation hardness of graphene and MoS2 field effect devices against swift heavy ion irradiation
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