Photoassisted electron emission from metal-oxide-semiconductor cathodes based on nanocrystalline silicon

Photoassisted electron emission from metal-oxide-semiconductor cathodes based on nanocrystalline silicon

This paper investigates the effect of optical pulses on the electron emission properties of metal-oxide-semiconductor (MOS) cathodes based on nanocrystalline silicon (nc-Si). The emission current is enhanced by about two orders of magnitude by the irradiation of 405 nm laser light. The increase of t...

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Veröffentlicht in:Journal of applied physics 2013-04, Vol.113 (15)
Hauptverfasser: Shimawaki, H., Neo, Y., Mimura, H., Wakaya, F., Takai, M.
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creator Shimawaki, H.
Neo, Y.
Mimura, H.
Wakaya, F.
Takai, M.
description This paper investigates the effect of optical pulses on the electron emission properties of metal-oxide-semiconductor (MOS) cathodes based on nanocrystalline silicon (nc-Si). The emission current is enhanced by about two orders of magnitude by the irradiation of 405 nm laser light. The increase of the emission current under irradiation was proportional to incident laser power. The differential quantum efficiency of the nc-Si based MOS diode itself was estimated to be 3 × 10−2. However, the value of the photoemission current was only 3 × 10−7 due to the short mean free path of hot electron for Pt used as the gate electrode. We obtained a pulsed electron beam from the cathode device by a pulsed laser. The result shows that MOS type cathodes have a suitable structure for optically generating a train of short electron bunches.
doi_str_mv 10.1063/1.4801887
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title Photoassisted electron emission from metal-oxide-semiconductor cathodes based on nanocrystalline silicon
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