Etching damage and its recovery by soft X-ray irradiation observed in soft X-ray absorption spectra of TiO2 thin film

Damage characteristics of TiO2 thin films etched by N2 plasma were analyzed using soft X-ray absorption spectroscopy. Changes in the spectra at the Ti-L2,3 near-edge X-ray absorption fine structure (NEXAFS) resulting from etching damage were observed more in the bulk region rather than in the sample...

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Veröffentlicht in:	Journal of applied physics 2013-03, Vol.113 (12)
Hauptverfasser:	Niibe, Masahito, Sano, Keiji, Kotaka, Takuya, Kawakami, Retsuo, Tominaga, Kikuo, Nakano, Yoshitaka
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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