Investigating the role of hydrogen in silicon deposition using an energy-resolved mass spectrometer and a Langmuir probe in an Ar/H2 radio frequency magnetron discharge

The plasma parameters and ion energy distributions (IED) of the dominant species in an Ar-H2 discharge are investigated with an energy resolved mass spectrometer and a Langmuir probe. The plasmas are generated in a conventional magnetron chamber powered at 150 W, 13.56 MHz at hydrogen flow rates ran...

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Veröffentlicht in:	Physics of plasmas 2012-07, Vol.19 (7)
Hauptverfasser:	Mensah, S. L., Naseem, Hameed H., Abu-Safe, Husam, Gordon, M. H.
Format:	Artikel
Sprache:	eng
Schlagworte:	Density Deposition Discharge Flow rate Flux Fragments Langmuir-Blodgett films Plasmas
Online-Zugang:	Volltext
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