Disorder-free sputtering method on graphene

Deposition of various materials onto graphene without causing any disorder is highly desirable for graphene applications. Especially, sputtering is a versatile technique to deposit various metals and insulators for spintronics, and indium tin oxide to make transparent devices. However, the sputterin...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	AIP advances 2012-09, Vol.2 (3), p.032121-032121-6
Hauptverfasser:	Qiu, Xue Peng, Shin, Young Jun, Niu, Jing, Kulothungasagaran, Narayanapillai, Kalon, Gopinadhan, Qiu, Caiyu, Yu, Ting, Yang, Hyunsoo
Format:	Artikel
Sprache:	eng
Schlagworte:	Damage DEPOSITION DEPOSITS Devices Disorders GRAPHENE INDIUM Indium tin oxide Insulators MATERIALS SCIENCE NANOSCIENCE AND NANOTECHNOLOGY SPUTTERING SUBSTRATES TIN OXIDES
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!