Vertical conduction mechanism of the epitaxial graphene/n-type 4H-SiC heterojunction at cryogenic temperatures

Vertical diodes of epitaxial graphene on n − 4H-SiC were investigated. The graphene Raman spectra exhibited a higher intensity in the G-line than the 2D-line, indicative of a few-layer graphene film. Rectifying properties improved at low temperatures as the reverse leakage decreased over six orders...

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Veröffentlicht in:Applied physics letters 2012-05, Vol.100 (19), p.193506-193506-4
Hauptverfasser: Tadjer, M. J., Anderson, T. J., Hobart, K. D., Nyakiti, L. O., Wheeler, V. D., Myers-Ward, R. L., Gaskill, D. K., Eddy, C. R., Kub, F. J., Calle, F.
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Sprache:eng
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Zusammenfassung:Vertical diodes of epitaxial graphene on n − 4H-SiC were investigated. The graphene Raman spectra exhibited a higher intensity in the G-line than the 2D-line, indicative of a few-layer graphene film. Rectifying properties improved at low temperatures as the reverse leakage decreased over six orders of magnitude without freeze-out in either material. Carrier concentration of ∼10 16 cm −3 in the SiC remained stable down to 15 K, while accumulation charge decreased and depletion width increased in forward bias. The low barrier height of 0.08eV and absence of recombination-induced emission indicated majority carrier field emission as the dominant conduction mechanism.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.4712621