Photodissociation near a rough metal surface : effect of reaction fields

The modification of the photochemical dissociation rate of molecules in the presence of a rough metal surface is explored. Classical electromagnetic calculations are presented for the photodissociation rate of a point dipole near a rough surface modeled as a hemispheroidal bump on a semi-infinite fl...

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Veröffentlicht in:	The Journal of chemical physics 1990-12, Vol.93 (12), p.9106-9112
Hauptverfasser:	DAS, P. C, PURI, A, GEORGE, T. F
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Chemistry Exact sciences and technology General and physical chemistry Metals. Metallurgy Surface physical chemistry
Online-Zugang:	Volltext
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