Photodissociation near a rough metal surface : effect of reaction fields

The modification of the photochemical dissociation rate of molecules in the presence of a rough metal surface is explored. Classical electromagnetic calculations are presented for the photodissociation rate of a point dipole near a rough surface modeled as a hemispheroidal bump on a semi-infinite fl...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:The Journal of chemical physics 1990-12, Vol.93 (12), p.9106-9112
Hauptverfasser: DAS, P. C, PURI, A, GEORGE, T. F
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 9112
container_issue 12
container_start_page 9106
container_title The Journal of chemical physics
container_volume 93
creator DAS, P. C
PURI, A
GEORGE, T. F
description The modification of the photochemical dissociation rate of molecules in the presence of a rough metal surface is explored. Classical electromagnetic calculations are presented for the photodissociation rate of a point dipole near a rough surface modeled as a hemispheroidal bump on a semi-infinite flat plane. A correction is introduced by accounting for the reaction fields due to the dipole–substrate system radiating photons and coupling to delocalized surface plasmons. The effects of the shape and size of the bump, and the separation of the molecule from the bump on the rate of photodissociation of the molecule, are studied numerically.
doi_str_mv 10.1063/1.459201
format Article
fullrecord <record><control><sourceid>pascalfrancis_cross</sourceid><recordid>TN_cdi_crossref_primary_10_1063_1_459201</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>19831826</sourcerecordid><originalsourceid>FETCH-LOGICAL-c255t-1a4dfbdb902a8e20d965b8fb32870fe138588b2e86f8e3afd3ba062364b389053</originalsourceid><addsrcrecordid>eNpF0E1LAzEUheEgCtYq-BOyEdxMvUlm0sSdFLVCQRe6Hm4y99qRaVOS6cJ_70cFV2fzcBavEJcKZgqsuVGzuvEa1JGYKHC-mlsPx2ICoFXlLdhTcVbKBwCoua4nYvmyTmPq-lJS7HHs01ZuCbNEmdP-fS03NOIgyz4zRpK3kpgpjjKxzITx13NPQ1fOxQnjUOjib6fi7eH-dbGsVs-PT4u7VRV104yVwrrj0AUPGh1p6LxtguNgtJsDkzKucS5ocpYdGeTOBASrja2DcR4aMxXXh9-YUymZuN3lfoP5s1XQ_hRoVXso8E2vDnSHJeLAGbexL__eO6OctuYLXYhZ-Q</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Photodissociation near a rough metal surface : effect of reaction fields</title><source>AIP Digital Archive</source><creator>DAS, P. C ; PURI, A ; GEORGE, T. F</creator><creatorcontrib>DAS, P. C ; PURI, A ; GEORGE, T. F</creatorcontrib><description>The modification of the photochemical dissociation rate of molecules in the presence of a rough metal surface is explored. Classical electromagnetic calculations are presented for the photodissociation rate of a point dipole near a rough surface modeled as a hemispheroidal bump on a semi-infinite flat plane. A correction is introduced by accounting for the reaction fields due to the dipole–substrate system radiating photons and coupling to delocalized surface plasmons. The effects of the shape and size of the bump, and the separation of the molecule from the bump on the rate of photodissociation of the molecule, are studied numerically.</description><identifier>ISSN: 0021-9606</identifier><identifier>EISSN: 1089-7690</identifier><identifier>DOI: 10.1063/1.459201</identifier><identifier>CODEN: JCPSA6</identifier><language>eng</language><publisher>Woodbury, NY: American Institute of Physics</publisher><subject>Applied sciences ; Chemistry ; Exact sciences and technology ; General and physical chemistry ; Metals. Metallurgy ; Surface physical chemistry</subject><ispartof>The Journal of chemical physics, 1990-12, Vol.93 (12), p.9106-9112</ispartof><rights>1991 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c255t-1a4dfbdb902a8e20d965b8fb32870fe138588b2e86f8e3afd3ba062364b389053</citedby><cites>FETCH-LOGICAL-c255t-1a4dfbdb902a8e20d965b8fb32870fe138588b2e86f8e3afd3ba062364b389053</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,27901,27902</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&amp;idt=19831826$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>DAS, P. C</creatorcontrib><creatorcontrib>PURI, A</creatorcontrib><creatorcontrib>GEORGE, T. F</creatorcontrib><title>Photodissociation near a rough metal surface : effect of reaction fields</title><title>The Journal of chemical physics</title><description>The modification of the photochemical dissociation rate of molecules in the presence of a rough metal surface is explored. Classical electromagnetic calculations are presented for the photodissociation rate of a point dipole near a rough surface modeled as a hemispheroidal bump on a semi-infinite flat plane. A correction is introduced by accounting for the reaction fields due to the dipole–substrate system radiating photons and coupling to delocalized surface plasmons. The effects of the shape and size of the bump, and the separation of the molecule from the bump on the rate of photodissociation of the molecule, are studied numerically.</description><subject>Applied sciences</subject><subject>Chemistry</subject><subject>Exact sciences and technology</subject><subject>General and physical chemistry</subject><subject>Metals. Metallurgy</subject><subject>Surface physical chemistry</subject><issn>0021-9606</issn><issn>1089-7690</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1990</creationdate><recordtype>article</recordtype><recordid>eNpF0E1LAzEUheEgCtYq-BOyEdxMvUlm0sSdFLVCQRe6Hm4y99qRaVOS6cJ_70cFV2fzcBavEJcKZgqsuVGzuvEa1JGYKHC-mlsPx2ICoFXlLdhTcVbKBwCoua4nYvmyTmPq-lJS7HHs01ZuCbNEmdP-fS03NOIgyz4zRpK3kpgpjjKxzITx13NPQ1fOxQnjUOjib6fi7eH-dbGsVs-PT4u7VRV104yVwrrj0AUPGh1p6LxtguNgtJsDkzKucS5ocpYdGeTOBASrja2DcR4aMxXXh9-YUymZuN3lfoP5s1XQ_hRoVXso8E2vDnSHJeLAGbexL__eO6OctuYLXYhZ-Q</recordid><startdate>19901215</startdate><enddate>19901215</enddate><creator>DAS, P. C</creator><creator>PURI, A</creator><creator>GEORGE, T. F</creator><general>American Institute of Physics</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>19901215</creationdate><title>Photodissociation near a rough metal surface : effect of reaction fields</title><author>DAS, P. C ; PURI, A ; GEORGE, T. F</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c255t-1a4dfbdb902a8e20d965b8fb32870fe138588b2e86f8e3afd3ba062364b389053</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1990</creationdate><topic>Applied sciences</topic><topic>Chemistry</topic><topic>Exact sciences and technology</topic><topic>General and physical chemistry</topic><topic>Metals. Metallurgy</topic><topic>Surface physical chemistry</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>DAS, P. C</creatorcontrib><creatorcontrib>PURI, A</creatorcontrib><creatorcontrib>GEORGE, T. F</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><jtitle>The Journal of chemical physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>DAS, P. C</au><au>PURI, A</au><au>GEORGE, T. F</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Photodissociation near a rough metal surface : effect of reaction fields</atitle><jtitle>The Journal of chemical physics</jtitle><date>1990-12-15</date><risdate>1990</risdate><volume>93</volume><issue>12</issue><spage>9106</spage><epage>9112</epage><pages>9106-9112</pages><issn>0021-9606</issn><eissn>1089-7690</eissn><coden>JCPSA6</coden><abstract>The modification of the photochemical dissociation rate of molecules in the presence of a rough metal surface is explored. Classical electromagnetic calculations are presented for the photodissociation rate of a point dipole near a rough surface modeled as a hemispheroidal bump on a semi-infinite flat plane. A correction is introduced by accounting for the reaction fields due to the dipole–substrate system radiating photons and coupling to delocalized surface plasmons. The effects of the shape and size of the bump, and the separation of the molecule from the bump on the rate of photodissociation of the molecule, are studied numerically.</abstract><cop>Woodbury, NY</cop><pub>American Institute of Physics</pub><doi>10.1063/1.459201</doi><tpages>7</tpages></addata></record>
fulltext fulltext
identifier ISSN: 0021-9606
ispartof The Journal of chemical physics, 1990-12, Vol.93 (12), p.9106-9112
issn 0021-9606
1089-7690
language eng
recordid cdi_crossref_primary_10_1063_1_459201
source AIP Digital Archive
subjects Applied sciences
Chemistry
Exact sciences and technology
General and physical chemistry
Metals. Metallurgy
Surface physical chemistry
title Photodissociation near a rough metal surface : effect of reaction fields
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-07T20%3A51%3A02IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-pascalfrancis_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Photodissociation%20near%20a%20rough%20metal%20surface%20:%20effect%20of%20reaction%20fields&rft.jtitle=The%20Journal%20of%20chemical%20physics&rft.au=DAS,%20P.%20C&rft.date=1990-12-15&rft.volume=93&rft.issue=12&rft.spage=9106&rft.epage=9112&rft.pages=9106-9112&rft.issn=0021-9606&rft.eissn=1089-7690&rft.coden=JCPSA6&rft_id=info:doi/10.1063/1.459201&rft_dat=%3Cpascalfrancis_cross%3E19831826%3C/pascalfrancis_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true