Properties of nanoporous silica thin films determined by high-resolution x-ray reflectivity and small-angle neutron scattering

A new methodology based on a novel combination of a high-resolution specular x-ray reflectivity and small-angle neutron scattering has been developed to evaluate the structural properties of low-dielectric-constant porous silica thin films about one micrometer thick supported on silicon wafer substr...

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Veröffentlicht in:	Journal of applied physics 2000-02, Vol.87 (3), p.1193-1200
Hauptverfasser:	Wu, Wen-li, Wallace, William E., Lin, Eric K., Lynn, Gary W., Glinka, Charles J., Ryan, E. Todd, Ho, Huei-Min
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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