Stripping and cleaning of photoresist using low energy neutrals

Experimental studies of a broad-area hyperthermal neutral stream source for photoresist cleaning are reported. Low energy neutrals are generated from a high-density inductively coupled plasma by the surface reflection neutralization method. Rates of removal of photoresist polymers such as polymethyl...

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Veröffentlicht in:	Journal of Applied Physics 1999-09, Vol.86 (5), p.2419-2424
Hauptverfasser:	Tang, Xianmin, Nichols, C. A., Manos, D. M.
Format:	Artikel
Sprache:	eng
Schlagworte:	40 CHEMISTRY 70 PLASMA PHYSICS AND FUSION ETCHING PHOTOELECTRON SPECTROSCOPY PLASMA PMMA POLYMERS STRIPPING SURFACE CLEANING
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