Strain sensitivity of highly magnetostrictive amorphous films for use in microstrain sensors

Strain sensitivity of highly magnetostrictive amorphous films for use in microstrain sensors

Strain sensitivity of amorphous (Fe90Co10)78Si12B10 sputtered film was studied in detail, so as to examine the potential of film for highly sensitive microstrain gauges. The film exhibited the figure of merit F=(Δμ/μ)/ε (change in film permeability μ per unit strain ε) of 1.2×105, the value of which...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Journal of applied physics 1999-04, Vol.85 (8), p.5465-5467
Hauptverfasser: Shin, Kwang-Ho, Inoue, Mitsuteru, Arai, Ken-Ichi
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 5467
container_issue 8
container_start_page 5465
container_title Journal of applied physics
container_volume 85
creator Shin, Kwang-Ho
Inoue, Mitsuteru
Arai, Ken-Ichi
description Strain sensitivity of amorphous (Fe90Co10)78Si12B10 sputtered film was studied in detail, so as to examine the potential of film for highly sensitive microstrain gauges. The film exhibited the figure of merit F=(Δμ/μ)/ε (change in film permeability μ per unit strain ε) of 1.2×105, the value of which is comparable to that of amorphous ribbons. Reflecting the large value of F, the high-frequency impedance of the film was also subjected to change due to strain: the change in impedance of 46% was observed at 100 MHz applying a strain of 300×10−6. It is also demonstrated that utilizing the strain-dependent impedance, a small strain of 0.2×10−6 can be detected with the film.
doi_str_mv 10.1063/1.369977
format Article
fullrecord <record><control><sourceid>crossref</sourceid><recordid>TN_cdi_crossref_primary_10_1063_1_369977</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_1063_1_369977</sourcerecordid><originalsourceid>FETCH-LOGICAL-c291t-ce4a6bb6aade2f2ca19ad4e665ff0348ee68b71411176a9ff290c548b324ba6d3</originalsourceid><addsrcrecordid>eNo1kE1LxDAYhIMoWFfBn5Cjl655mzQfR1n8ggUP6k0oaZpsI22zJFmh_94uq5eZwwwPwyB0C2QNhNN7WFOulBBnqAAiVSnqmpyjgpAKSqmEukRXKX0TAiCpKtDXe47aTzjZKfnsf3yecXC497t-mPGod5PNIeXozRJarMcQ9304JOz8MC4aIj4kixfC6E08Nv9pIaZrdOH0kOzNn6_Q59Pjx-al3L49v24etqWpFOTSWKZ523KtO1u5ymhQumOW89o5Qpm0lstWAAMAwbVyrlLE1Ey2tGKt5h1dobsT97ggReuaffSjjnMDpDm-0kBzeoX-AmBrV1E</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Strain sensitivity of highly magnetostrictive amorphous films for use in microstrain sensors</title><source>AIP Journals Complete</source><source>AIP Digital Archive</source><creator>Shin, Kwang-Ho ; Inoue, Mitsuteru ; Arai, Ken-Ichi</creator><creatorcontrib>Shin, Kwang-Ho ; Inoue, Mitsuteru ; Arai, Ken-Ichi</creatorcontrib><description>Strain sensitivity of amorphous (Fe90Co10)78Si12B10 sputtered film was studied in detail, so as to examine the potential of film for highly sensitive microstrain gauges. The film exhibited the figure of merit F=(Δμ/μ)/ε (change in film permeability μ per unit strain ε) of 1.2×105, the value of which is comparable to that of amorphous ribbons. Reflecting the large value of F, the high-frequency impedance of the film was also subjected to change due to strain: the change in impedance of 46% was observed at 100 MHz applying a strain of 300×10−6. It is also demonstrated that utilizing the strain-dependent impedance, a small strain of 0.2×10−6 can be detected with the film.</description><identifier>ISSN: 0021-8979</identifier><identifier>EISSN: 1089-7550</identifier><identifier>DOI: 10.1063/1.369977</identifier><language>eng</language><ispartof>Journal of applied physics, 1999-04, Vol.85 (8), p.5465-5467</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c291t-ce4a6bb6aade2f2ca19ad4e665ff0348ee68b71411176a9ff290c548b324ba6d3</citedby><cites>FETCH-LOGICAL-c291t-ce4a6bb6aade2f2ca19ad4e665ff0348ee68b71411176a9ff290c548b324ba6d3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27922,27923</link.rule.ids></links><search><creatorcontrib>Shin, Kwang-Ho</creatorcontrib><creatorcontrib>Inoue, Mitsuteru</creatorcontrib><creatorcontrib>Arai, Ken-Ichi</creatorcontrib><title>Strain sensitivity of highly magnetostrictive amorphous films for use in microstrain sensors</title><title>Journal of applied physics</title><description>Strain sensitivity of amorphous (Fe90Co10)78Si12B10 sputtered film was studied in detail, so as to examine the potential of film for highly sensitive microstrain gauges. The film exhibited the figure of merit F=(Δμ/μ)/ε (change in film permeability μ per unit strain ε) of 1.2×105, the value of which is comparable to that of amorphous ribbons. Reflecting the large value of F, the high-frequency impedance of the film was also subjected to change due to strain: the change in impedance of 46% was observed at 100 MHz applying a strain of 300×10−6. It is also demonstrated that utilizing the strain-dependent impedance, a small strain of 0.2×10−6 can be detected with the film.</description><issn>0021-8979</issn><issn>1089-7550</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1999</creationdate><recordtype>article</recordtype><recordid>eNo1kE1LxDAYhIMoWFfBn5Cjl655mzQfR1n8ggUP6k0oaZpsI22zJFmh_94uq5eZwwwPwyB0C2QNhNN7WFOulBBnqAAiVSnqmpyjgpAKSqmEukRXKX0TAiCpKtDXe47aTzjZKfnsf3yecXC497t-mPGod5PNIeXozRJarMcQ9304JOz8MC4aIj4kixfC6E08Nv9pIaZrdOH0kOzNn6_Q59Pjx-al3L49v24etqWpFOTSWKZ523KtO1u5ymhQumOW89o5Qpm0lstWAAMAwbVyrlLE1Ey2tGKt5h1dobsT97ggReuaffSjjnMDpDm-0kBzeoX-AmBrV1E</recordid><startdate>19990415</startdate><enddate>19990415</enddate><creator>Shin, Kwang-Ho</creator><creator>Inoue, Mitsuteru</creator><creator>Arai, Ken-Ichi</creator><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>19990415</creationdate><title>Strain sensitivity of highly magnetostrictive amorphous films for use in microstrain sensors</title><author>Shin, Kwang-Ho ; Inoue, Mitsuteru ; Arai, Ken-Ichi</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c291t-ce4a6bb6aade2f2ca19ad4e665ff0348ee68b71411176a9ff290c548b324ba6d3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1999</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Shin, Kwang-Ho</creatorcontrib><creatorcontrib>Inoue, Mitsuteru</creatorcontrib><creatorcontrib>Arai, Ken-Ichi</creatorcontrib><collection>CrossRef</collection><jtitle>Journal of applied physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Shin, Kwang-Ho</au><au>Inoue, Mitsuteru</au><au>Arai, Ken-Ichi</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Strain sensitivity of highly magnetostrictive amorphous films for use in microstrain sensors</atitle><jtitle>Journal of applied physics</jtitle><date>1999-04-15</date><risdate>1999</risdate><volume>85</volume><issue>8</issue><spage>5465</spage><epage>5467</epage><pages>5465-5467</pages><issn>0021-8979</issn><eissn>1089-7550</eissn><abstract>Strain sensitivity of amorphous (Fe90Co10)78Si12B10 sputtered film was studied in detail, so as to examine the potential of film for highly sensitive microstrain gauges. The film exhibited the figure of merit F=(Δμ/μ)/ε (change in film permeability μ per unit strain ε) of 1.2×105, the value of which is comparable to that of amorphous ribbons. Reflecting the large value of F, the high-frequency impedance of the film was also subjected to change due to strain: the change in impedance of 46% was observed at 100 MHz applying a strain of 300×10−6. It is also demonstrated that utilizing the strain-dependent impedance, a small strain of 0.2×10−6 can be detected with the film.</abstract><doi>10.1063/1.369977</doi><tpages>3</tpages></addata></record>
fulltext fulltext
identifier ISSN: 0021-8979
ispartof Journal of applied physics, 1999-04, Vol.85 (8), p.5465-5467
issn 0021-8979
1089-7550
language eng
recordid cdi_crossref_primary_10_1063_1_369977
source AIP Journals Complete; AIP Digital Archive
title Strain sensitivity of highly magnetostrictive amorphous films for use in microstrain sensors
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-13T13%3A32%3A34IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-crossref&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Strain%20sensitivity%20of%20highly%20magnetostrictive%20amorphous%20films%20for%20use%20in%20microstrain%20sensors&rft.jtitle=Journal%20of%20applied%20physics&rft.au=Shin,%20Kwang-Ho&rft.date=1999-04-15&rft.volume=85&rft.issue=8&rft.spage=5465&rft.epage=5467&rft.pages=5465-5467&rft.issn=0021-8979&rft.eissn=1089-7550&rft_id=info:doi/10.1063/1.369977&rft_dat=%3Ccrossref%3E10_1063_1_369977%3C/crossref%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true